Search Results - "Naumann, Franziska"

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films by Haeberle, Jörg, Henkel, Karsten, Gargouri, Hassan, Naumann, Franziska, Gruska, Bernd, Arens, Michael, Tallarida, Massimo, Schmeißer, Dieter

“…We report on results on the preparation of thin (<100 nm) aluminum oxide (Al2O3) films on silicon substrates using thermal atomic layer deposition (T-ALD) and…”
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Metacognitive Therapy for Adjustment Disorder in a Patient With Newly Diagnosed Pulmonary Arterial Hypertension: A Case Report by Winter, Lotta, Naumann, Franziska, Olsson, Karen, Fuge, Jan, Hoeper, Marius M, Kahl, Kai G

“…Adjustment disorders (ADs) belong to the worldwide most diagnosed mental disorders and are particularly frequent in patients with an underlying physical…”
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Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition by Kot, Małgorzata, Henkel, Karsten, Das, Chittaranjan, Brizzi, Simone, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gargouri, Hassan, Schmeißer, Dieter

“…A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium…”
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Analysis of nitrogen species in titanium oxynitride ALD films by Sowińska, Małgorzata, Brizzi, Simone, Das, Chittaranjan, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gargouri, Hassan, Henkel, Karsten, Schmeißer, Dieter

“…Titanium oxynitride films are prepared by plasma enhanced atomic layer deposition method using two different precursors and nitrogen sources. Synchrotron…”
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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study by Sowińska, Małgorzata, Henkel, Karsten, Schmeißer, Dieter, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gruska, Bernd, Gargouri, Hassan

“…The process parameters' impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titanium oxynitride…”
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition by Mahmoodinezhad, Ali, Janowitz, Christoph, Naumann, Franziska, Plate, Paul, Gargouri, Hassan, Henkel, Karsten, Schmeißer, Dieter, Flege, Jan Ingo

“…Gallium oxide (Ga2O3) thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) applying a capacitively coupled plasma source where…”
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AlN and AlN/Al2O3 seed layers from atomic layer deposition for epitaxial growth of AlN on sapphire by Hagedorn, Sylvia, Knauer, Arne, Weyers, Markus, Naumann, Franziska, Gargouri, Hassan

“…The annealing of amorphous AlN and AlN/Al2O3 seed layers from atomic layer deposition (ALD) on sapphire substrates and their application as starting layers for…”
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Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma by Mahmoodinezhad, Ali, Morales, Carlos, Naumann, Franziska, Plate, Paul, Meyer, Robert, Janowitz, Christoph, Henkel, Karsten, Kot, Małgorzata, Zoellner, Marvin Hartwig, Wenger, Christian, Flege, Jan Ingo

“…Indium oxide (InxOy) thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium and oxygen plasma in a low-temperature…”
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Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study by Kot, Małgorzata, Łobaza, Justyna, Naumann, Franziska, Gargouri, Hassan, Henkel, Karsten, Schmeißer, Dieter

“…The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is…”
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In-gap states in titanium dioxide and oxynitride atomic layer deposited films by Henkel, Karsten, Das, Chittaranjan, Kot, Małgorzata, Schmeißer, Dieter, Naumann, Franziska, Kärkkänen, Irina, Gargouri, Hassan

“…Valence band (VB) spectra of titanium dioxide (TiO2) and oxynitride (TiOxNy) films prepared by different atomic layer deposition (ALD) processes are compared…”
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Bottom-Up Design of a Supercycle Recipe for Atomic Layer Deposition of Tunable Indium Gallium Zinc Oxide Thin Films by Morales, Carlos, Plate, Paul, Marth, Ludwig, Naumann, Franziska, Kot, Małgorzata, Janowitz, Christoph, Kus, Peter, Zoellner, Marvin Hartwig, Wenger, Christian, Henkel, Karsten, Flege, Jan Ingo

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Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources by Kot, Małgorzata, Henkel, Karsten, Naumann, Franziska, Gargouri, Hassan, Lupina, Lidia, Wilker, Viola, Kus, Peter, Poz´arowska, Emilia, Garain, Samiran, Rouissi, Zied, Schmeißer, Dieter

“…A comparative study of thin aluminum nitride (AlN) films deposited by plasma-enhanced atomic layer deposition in the SENTECH SI ALD LL system applying either a…”
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GaN‐Based Vertical n‐Channel MISFETs on Free Standing Ammonothermal GaN Substrates by Treidel, Eldad Bahat, Hilt, Oliver, Stöver, Julian, Hoffmann, Veit, Brunner, Frank, Ickert, Karina, Hochheim, Stefan, Naumann, Franziska, Gargouri, Hassan, Martinez, Bryan, Weyers, Markus, Würfl, Joachim

“…In this work, a vertical n‐channel MISFET homoepitaxially grown on ammonothermal n‐type GaN substrates by MOVPE is demonstrated. The MIS gate module consists…”
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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al 2 O 3 -films by Haeberle, Jörg, Henkel, Karsten, Gargouri, Hassan, Naumann, Franziska, Gruska, Bernd, Arens, Michael, Tallarida, Massimo, Schmeißer, Dieter

“…We report on results on the preparation of thin (<100 nm) aluminum oxide (Al 2 O 3 ) films on silicon substrates using thermal atomic layer deposition (T-ALD)…”
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Metacognitive Therapy for Adjustment Disorder in a Patient With Newly Diagnosed Pulmonary Arterial Hypertension: A Case Report by Winter, Lotta, Naumann, Franziska, Olsson, Karen, Fuge, Jan, Hoeper, Marius M, Kahl, Kai G

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