Search Results - "Nastasi, M.A."
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On the structure and chemistry of complex oxide nanofeatures in nanostructured ferritic alloy U14YWT
Published in Philosophical magazine (Abingdon, England) (01-06-2012)“…The remarkable radiation damage resistance of nanostructured ferritic alloys (NFAs) is attributed to the large numbers of matrix nanofeatures (NFs) of various…”
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Exciton localization and Stokes' shift in Zn1-xCdxO thin films depending on chemical composition
Published in Journal of crystal growth (18-01-2006)Get full text
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Ion beam radiation damage effects in rutile (TiO 2)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-05-1998)“…Radiation damage accumulation in the rutile phase of titanium dioxide (TiO 2) have been studied by Rutherford Backscattering Spectroscopy in channeling…”
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Ion beam and plasma technology development for surface modification at Los Alamos National Laboratory
Published in Materials chemistry and physics (01-07-1998)“…We are developing two high-throughput technologies for materials modification. The first is a repetitive intense ion beam source for materials modification…”
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Microstructure analysis of plasma immersion ion implanted diamond-like carbon coatings
Published in Surface & coatings technology (01-05-1998)“…This paper discusses the deposition of diamond-like carbon (DLC) coatings using Plasma Immersion Ion Implantation (PIII). Microstructure analysis indicates…”
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Intrinsic ultraviolet luminescence from Lu2O3, Lu2SiO5 and Lu2SiO5:Ce3
Published in Journal of luminescence (01-03-2004)Get full text
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Intrinsic ultraviolet luminescence from Lu 2O 3, Lu 2SiO 5 and Lu 2SiO 5:Ce 3
Published in Journal of luminescence (2004)“…Radioluminescence and thermally stimulated luminescence measurements on Lu 2O 3, Lu 2SiO 5 (LSO) and Lu 2SiO 5:Ce 3+ (LSO:Ce) reveal the presence of intrinsic…”
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Exciton localization and Stokes’ shift in Zn 1− x Cd x O thin films depending on chemical composition
Published in Journal of crystal growth (2006)“…Zn 1− x Cd x O films were grown on (0 0 0 1) sapphire substrates by pulsed laser deposition. Structural and optical properties of Zn 1− x Cd x O films were…”
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The magnetization of a grain boundary in nickel
Published in Nanostructured materials (1995)“…We report the measured atomic density and magnetic moment of a nickel twist grain boundary averaged over its lateral dimensions as a function of distance from…”
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Observations of Dislocations in Cu/Nb Nanolayer Composites After Deformation
Published in Journal of materials research (01-08-1997)“…Dislocations have been observed in deformed Cu/Nb nanolayer composites of wavelength 17 and 7 nm. The dislocations thread through the Cu/Nb interfaces even…”
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Radiation effects in corundum structure derivatives
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-05-1998)“…The radiation response of α-Al 2O 3 (R3̄c), FeTiO 3 ( R 3 ), MgTiO 3 ( R 3 ), and LiTaO 3 (R3c) was investigated using 200 keV Ar 2+ and 1 MeV Kr + and a…”
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Ion irradiation damage in ilmenite at 100 K
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-05-1997)“…A natural single crystal of ilmenite (FeTiO 3) was irradiated at 100 K with 200 keV Ar 2+. Rutherford backscattering spectroscopy and ion channeling with 2 MeV…”
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Design of a large-scale plasma source ion implantation experiment
Published in International Conference on Plasma Sciences (ICOPS) (1993)“…Summary form only given. The authors present the design of a large-scale plasma source ion implantation experiment recently assembled at Los Alamos, in which…”
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Recent Results From A Large-scale Plasma Source Ion Implantation Experiment
Published in Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) (1994)Get full text
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Initial operation of a large‐scale plasma source ion implantation experiment
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-03-1994)“…In plasma source ion implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions…”
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Conference Proceeding Journal Article