Search Results - "Nakabayashi, Masaaki"
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A ferroelectric capacitor with an asymmetric double-layered ferroelectric structure comprising a liquid-delivery MOCVD Pb(Zr, Ti)O3 layer and a sputter-deposited La-doped Pb(Zr, Ti)O3 for highly reliable FeRAM
Published in Applied physics letters (04-11-2024)“…We have developed a double-layered ferroelectric capacitor comprising a liquid-delivery metal–organic chemical vapor deposition-based Pb(Zr, Ti)O3 (PZT) lower…”
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1-Adamantyl-tert-butyltetrathiolane 2,3-Dioxide: First Isolable vic-Disulfoxide and Efficient Precursor of S2O
Published in Journal of the American Chemical Society (01-09-1999)Get full text
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Development of a Pb(Zr,Ti)O 3 capacitor employing an IrO x /Ir bottom electrode for highly reliable ferroelectric random access memories
Published in Japanese Journal of Applied Physics (01-08-2024)“…A highly {111}-oriented metal-organic CVD Pb(Zr,Ti)O 3 (PZT) is successfully developed using IrO x /Ir instead of Ir as the bottom electrode. The {111} PZT…”
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Development of a Pb(Zr,Ti)O3 capacitor employing an IrOx/Ir bottom electrode for highly reliable ferroelectric random access memories
Published in Japanese Journal of Applied Physics (01-08-2024)“…A highly {111}-oriented metal-organic CVD Pb(Zr,Ti)O3 (PZT) is successfully developed using IrOx/Ir instead of Ir as the bottom electrode. The {111} PZT…”
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Enhanced Thermal Stability in Perpendicular Top-Pinned Magnetic Tunnel Junction With Synthetic Antiferromagnetic Free Layers
Published in IEEE transactions on magnetics (01-07-2013)“…Synthetic antiferromagnetic (SAF) free layers consisting of [Co (0.3 nm)/Pd (0.7 nm)] n /Ru/Ta/CoFeB were investigated for use in the free layers of top-pinned…”
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Journal Article Conference Proceeding -
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Reduction of Offset Field in Top-Pinned MTJ With Synthetic Antiferromagnetic Free Layer
Published in IEEE transactions on magnetics (01-11-2014)“…We found that the offset field (H off ) of a top-pinned magnetic tunnel junction (MTJ) with a CoPd/Ru/Ta/CoFeB-synthetic antiferromagnetic (SAF) free layer can…”
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Photo chemical vapor deposition of metal oxide films relating to Bi-Sr-Ca-Cu-O superconductor
Published in Japanese Journal of Applied Physics (01-04-1991)“…Oxide films relating to high- T c superconducting Bi-Sr-Ca-Cu-O system were prepared by an oxidative photochemical vapor deposition using a low pressure…”
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1-Adamantyl- tert -butyltetrathiolane 2,3-Dioxide: First Isolable v ic -Disulfoxide and Efficient Precursor of S 2 O
Published in Journal of the American Chemical Society (01-09-1999)Get full text
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Oxidation of tetrathiolanes: isolation of a vic-disulfoxide, 5-(1-adamantyl)-5- tert-butyltetrathiolane 2,3-dioxide and its decomposition to the dithiirane 1-oxide and ‘S 2O’
Published in Journal of organometallic chemistry (2000)“…Oxidation of 5-(1-adamantyl)-5- tert-butyltetrathiolane ( 3a) with dimethyldioxirane (DMD) at −78 or −20°C gave (1 R*,3 S*)- and (1 R*,3 R*)-3-(1-adamantyl)-3-…”
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1-Adamantyl-tert-butyltetrathiolane 2,3-Dioxide: First Isolable v ic-Disulfoxide and Efficient Precursor of S2O
Published in Journal of the American Chemical Society (01-09-1999)Get full text
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Chemical stability of CVD source materials for high- T c superconducting films
Published in Journal of materials research (01-06-1992)“…The stability of chemical vapor deposition (CVD) source materials for high- T c superconducting films was examined by 1 H-NMR (nuclear magnetic resonance), 13…”
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Stress stabilization of β‐tantalum and its crystal structure
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-11-1993)“…We studied the relationship between Ta crystal structures and the stress stability of Ta under heating. The stress in Ta which was sputter deposited on SiC was…”
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Chemical stability of CVD source materials for high-Tc superconducting films
Published in Journal of materials research (01-06-1992)“…The stability of chemical vapor deposition (CVD) source materials for high-Tc superconducting films was examined by 1H-NMR (nuclear magnetic resonance),…”
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Fluorine Doping and Superconductivity of Nd 2 CuO 4 Thin Films
Published in Japanese Journal of Applied Physics (01-09-1990)“…Fluorine was doped into sputter-deposited Nd 2 CuO 4 films to induce superconductivity in the films. The films annealed in the presence of NF 3 gas were…”
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Ti-capping technique as a breakthrough for achieving low threshold voltage, high mobility, and high reliability of pMOSFET with metal gate and high-k dielectrics technologies
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01-12-2009)“…We have proposed inhibition mechanism of common Al-capping technique for pMOSFET threshold-voltage (V th ) control for the first time, and have established…”
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Conference Proceeding -
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Fluorine doping and superconductivity of Nd2CuO4 thin films
Published in Japanese journal of applied physics (01-09-1990)Get full text
Journal Article