Search Results - "NAULLEAU, P. P"

Real space soft x-ray imaging at 10 nm spatial resolution by Chao, W, Fischer, P, Tyliszczak, T, Rekawa, S, Anderson, E, Naulleau, P

“…Using Fresnel zone plates made with our robust nanofabrication processes, we have successfully achieved 10 nm spatial resolution with soft x-ray microscopy…”
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Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning by Ashby, Paul D., Olynick, Deirdre L., Ogletree, D. Frank, Naulleau, Patrick P.

“…Extreme ultraviolet lithography (EUVL) is the leading technology for enabling miniaturization of computational components over the next decade. Next‐generation…”
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Quantitative phase retrieval with arbitrary pupil and illumination by Claus, Rene A, Naulleau, Patrick P, Neureuther, Andrew R, Waller, Laura

“…We present a general algorithm for combining measurements taken under various illumination and imaging conditions to quantitatively extract the amplitude and…”
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Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic by Naulleau, Patrick P., Goldberg, Kenneth A., Anderson, Erik, Cain, Jason P., Denham, Paul, Jackson, Keith, Morlens, Anne-Sophie, Rekawa, Seno, Salmassi, Farhad

“…In an effort to continue the rapid pace of extreme ultraviolet (EUV) learning, the focus of developmental EUV lithography has shifted from low numerical…”
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Extreme ultraviolet microscope characterization using photomask surface roughness by Gunjala, Gautam, Wojdyla, Antoine, Sherwin, Stuart, Shanker, Aamod, Benk, Markus P., Goldberg, Kenneth A., Naulleau, Patrick P., Waller, Laura

“…We demonstrate a method for characterizing the field-dependent aberrations of a full-field synchrotron-based extreme ultraviolet microscope. The statistical…”
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Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source by Le Gros, Mark A., McDermott, Gerry, Cinquin, Bertrand P., Smith, Elizabeth A., Do, Myan, Chao, Weilun L., Naulleau, Patrick P., Larabell, Carolyn A.

“…Beamline 2.1 (XM‐2) is a transmission soft X‐ray microscope in sector 2 of the Advanced Light Source at Lawrence Berkeley National Laboratory. XM‐2 was…”
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Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic by Naulleau, P., Goldberg, K.A., Cain, J.P., Anderson, E.H., Dean, K.R., Denham, P., Hoef, B., Jackson, K.H.

“…Extreme ultraviolet lithography is a leading candidate for volume production of nanoelectronics at the 32-nm node and beyond. In order to ensure adequate…”
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The role of temporal coherence in imaging with extreme ultraviolet lithography optics by Naulleau, Patrick P

“…Being based on reflective elements, extreme ultraviolet (EUV) lithography optics can support much larger spectral bandwidths then do modern refractive…”
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A design study for synchrotron-based high-numerical-aperture scanning illuminators by Naulleau, Patrick P, Denham, Paul E, Hoef, Brian, Rekawa, Senajith

“…Scanning illumination systems provide for a powerful and flexible means of controlling illumination coherence properties. In these systems, the desired…”
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Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime by Naulleau, Patrick P, Anderson, Erik H, Gullikson, Eric M, Bokor, Jeffrey

“…Improving the efficiency of soft X-ray and extreme ultraviolet (EUV) gratings by way of multilayer reflection coatings has been under investigation for many…”
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Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions by Attwood, D.T., Naulleau, P., Goldberg, K.A., Tejnil, E., Chang Chang, Beguiristain, R., Batson, P., Bokor, J., Gullikson, E.M., Koike, M., Medecki, H., Underwood, J.H.

“…Undulator radiation, generated by relativistic electrons traversing a periodic magnet structure, can provide a continuously tunable source of very bright and…”
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Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates by Naulleau, Patrick P, Liddle, J.Alexander, Anderson, Erik H, Gullikson, Eric M, Mirkarimi, Paul, Salmassi, Farhad, Spiller, Eberhard

“…The use of multilayer reflection coatings has proven to be an effective means for improving the efficiency of soft X-ray and extreme ultraviolet gratings…”
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An in situ scanning-slit alignment system for Kirkpatrick–Baez optics by Naulleau, Patrick P, Batson, Phil, Denham, Paul, Richardson, David, Underwood, James

“…A crucial component to many synchrotron beamlines is the Kirkpatrick–Baez system typically used to condense the synchrotron source to a small illumination…”
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Recent developments in X-UV optics and X-UV diagnostics by ZEITOUN, Ph, BALCOU, Ph, HUBERT, S, HUNTER, J. R, IDIR, M, JACQUEMOT, S, KAZAMIAS, S, LE PAPE, S, LEVECQ, X, LEWIS, C. L. S, MARMORET, R, MERCERE, P, BUCOURT, S, MORLENS, A. S, NAULLEAU, P. P, RAVET, M. F, REMOND, C, ROCCA, J. J, SMITH, R. F, TROUSSEL, P, VALENTIN, C, VANBOSTAL, L, DELMOTTE, F, DOVILLAIRE, G, DOUILLET, D, DUNN, J, FAIVRE, G, FAJARDO, M, GOLDBERG, K. A

“…Metrology of XUV beams (X-ray lasers, high-harmonic generation and VUV free-electron lasers) is of crucial importance for the development of applications. We…”
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First lithographic results from the extreme ultraviolet Engineering Test Stand by Chapman, H. N., Ray-Chaudhuri, A. K., Tichenor, D. A., Replogle, W. C., Stulen, R. H., Kubiak, G. D., Rockett, P. D., Klebanoff, L. E., O’Connell, D., Leung, A. H., Jefferson, K. L., Wronosky, J. B., Taylor, J. S., Hale, L. C., Blaedel, K., Spiller, E. A., Sommargren, G. E., Folta, J. A., Sweeney, D. W., Gullikson, E. M., Naulleau, P., Goldberg, K. A., Bokor, J., Attwood, D. T., Mickan, U., Hanzen, R., Panning, E., Yan, P.-Y., Gwyn, C. W., Lee, S. H.

“…The extreme ultraviolet (EUV) Engineering Test Stand (ETS) is a step-and-scan lithography tool that operates at a wavelength of 13.4 nm. It has been developed…”
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Theoretical efficiency analysis of a condenser-embedded grating-based spectral purity filter for EUV lithography by Naulleau, Patrick P, Sweatt, William C, Tichenor, Daniel A

“…Being based on reflective optics, extreme ultraviolet (EUV) lithography systems are, in principle, relatively immune to chromatic errors. However, illumination…”
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Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source by Naulleau, Patrick P, Anderson, Christopher N, Anderson, Erik H, Andreson, Nord, Chao, Weilun, Choi, Changhoon, Goldberg, Kenneth A, Gullikson, Eric M, Kim, Seong-Sue, Lee, Donggun, Miyakawa, Ryan, Park, Jongju, Rekawa, Seno, Salmassi, Farhad

“…A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has…”
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Absolute sensitivity calibration of extreme ultraviolet photoresists by Naulleau, Patrick P, Gullikson, Eric M, Aquila, Andrew, George, Simi, Niakoula, Dimitra

“…One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity,…”
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22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool by Naulleau, Patrick P., Anderson, Christopher N., Chiu, Jerrin, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian, Hudyma, Russ, Jones, Gideon, Koh, Chawon, Fontaine, Bruno La, Ma, Andy, Montgomery, Warren, Niakoula, Dimitra, Park, Joo-on, Wallow, Tom, Wurm, Stefan

“…Microfield exposure tools continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. Here we present an update on the SEMATECH…”
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Spatial coherence properties of undulator radiation based on Thompson–Wolf two-pinhole measurement by Chang, Chang, Naulleau, Patrick, Anderson, Erik, Attwood, David

“…The Thompson–Wolf two-pinhole technique was used to characterize the spatial coherence properties of undulator radiation. Both vertical and horizontal…”
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