Search Results - "NANVER, Lis K"

Refine Results
  1. 1

    X-ray Nanodiffraction on a Single SiGe Quantum Dot inside a Functioning Field-Effect Transistor by Hrauda, Nina, Zhang, Jianjun, Wintersberger, Eugen, Etzelstorfer, Tanja, Mandl, Bernhard, Stangl, Julian, Carbone, Dina, Holý, Vaclav, Jovanović, Vladimir, Biasotto, Cleber, Nanver, Lis K, Moers, Jürgen, Grützmacher, Detlev, Bauer, Günther

    Published in Nano letters (13-07-2011)
    “…For advanced electronic, optoelectronic, or mechanical nanoscale devices a detailed understanding of their structural properties and in particular the strain…”
    Get full text
    Journal Article
  2. 2

    Random Telegraph Signal Phenomena in Ultra Shallow p+n Silicon Avalanche Diodes by Agarwal, Vishal, Annema, Anne-Johan, Dutta, Satadal, Hueting, Raymond J. E., Nanver, Lis K., Nauta, Bram

    “…An extensive time domain analysis of the random telegraph signal (RTS) phenomena in silicon avalanche diodes is presented. Experiments show two distinct types…”
    Get full text
    Journal Article
  3. 3

    Silicon Drift Detectors with the Drift Field Induced by PureB-Coated Trenches by Knežević, Tihomir, Nanver, Lis, Suligoj, Tomislav

    Published in Photonics (01-12-2016)
    “…Junction formation in deep trenches is proposed as a new means of creating a built-in drift field in silicon drift detectors (SDDs). The potential performance…”
    Get full text
    Journal Article
  4. 4

    Limits on Thinning of Boron Layers With/Without Metal Contacting in PureB Si (Photo)Diodes by Knezevic, Tihomir, Liu, Xingyu, Hardeveld, Erwin, Suligoj, Tomislav, Nanver, Lis K.

    Published in IEEE electron device letters (01-06-2019)
    “…A little more than a monolayer-thick pure-boron (PureB) layer was deposited on silicon at 250 °C by chemical vapor deposition (CVD), forming junctions with low…”
    Get full text
    Journal Article
  5. 5

    Low-Temperature Electrical Performance of PureB Photodiodes Revealing Al-Metallization-Related Degradation of Dark Currents by Knezevic, Tihomir, Suligoj, Tomislav, Capan, Ivana, Nanver, Lis K.

    Published in IEEE transactions on electron devices (01-06-2021)
    “…Pure boron (PureB) deposition as the anode region of Si photodiodes creates negative fixed charge at the boron/silicon interface, which is responsible for…”
    Get full text
    Journal Article
  6. 6

    Broadband PureB Ge-on-Si Photodiodes by Nanver, Lis K., Hassan, Vinayak V., Attariabad, Asma, Rosson, Nicholas, Arena, Chantal J.

    Published in IEEE electron device letters (01-06-2024)
    “…Broadband PureB Ge-on-Si photodiodes were fabricated by in-situ capping of n-type Ge-islands grown by chemical-vapor deposition on Si with a 10-nm-thick pure…”
    Get full text
    Journal Article
  7. 7

    Optoelectrical Operation Stability of Broadband PureGaB Ge-on-Si Photodiodes with Anomalous Al-Mediated Sidewall Contacting by Krakers, Max, Knežević, Tihomir, Nanver, Lis K.

    Published in Journal of electronic materials (01-12-2021)
    “…An anomalous aluminum-mediated material transport process was investigated in sets of Ge-on-Si photodiodes with broadband optoelectrical characteristics…”
    Get full text
    Journal Article
  8. 8

    Identifying nano-Schottky diode currents in silicon diodes with 2D interfacial layers by Knezevic, Tihomir, Nanver, Lis K

    “…In silicon technology, Schottky diodes mainly exhibit high current levels, and attempts are regularly made to reduce these by introducing 2D layers between the…”
    Get full text
    Conference Proceeding
  9. 9

    Nanometer-thin pure boron CVD layers as material barrier to Au or Cu metallization of Si by Shivakumar, D. Thammaiah, Knežević, Tihomir, Nanver, Lis K.

    “…Metallization layers of aluminum, gold, or copper are shown to be protected from interactions with silicon substrates by thin boron layers grown by…”
    Get full text
    Journal Article
  10. 10

    CMOS-Compatible PureGaB Ge-on-Si APD Pixel Arrays by Sammak, Amir, Aminian, Mahdi, Nanver, Lis K., Charbon, Edoardo

    Published in IEEE transactions on electron devices (01-01-2016)
    “…Pure gallium and pure boron (PureGaB) Ge-on-Si photodiodes were fabricated in a CMOS compatible process and operated in linear and avalanche mode. Three…”
    Get full text
    Journal Article
  11. 11

    On the Mechanisms Governing Aluminum-Mediated Solid-Phase Epitaxy of Silicon by Civale, Yann, Vastola, Guglielmo, Nanver, Lis K., Mary-Joy, Rani, Kim, Jae-Ryoung

    Published in Journal of electronic materials (01-10-2009)
    “…Mechanisms governing the aluminum-mediated solid-phase epitaxy of Si on patterned crystalline Si substrates have been identified by studying the deposited…”
    Get full text
    Journal Article
  12. 12

    Arsenic-Doped High-Resistivity-Silicon Epitaxial Layers for Integrating Low-Capacitance Diodes by Sakic, Agata, Scholtes, Tom L M, Boer, Wiebe de, Golshani, Negin, Derakhshandeh, Jaber, Nanver, Lis K

    Published in Materials (06-12-2011)
    “…An arsenic doping technique for depositing up to 40-μm-thick high-resistivity layers is presented for fabricating diodes with low RC constants that can be…”
    Get full text
    Journal Article
  13. 13

    Nanometer-Thin Pure Boron Layers as Mask for Silicon Micromachining by Xingyu Liu, Nanver, Lis K., Scholtes, Tom L. M.

    Published in Journal of microelectromechanical systems (01-12-2017)
    “…The properties of nanometer-thin pure boron layers deposited by chemical vapor deposition were investigated for use as a barrier against tetramethyl ammonium…”
    Get full text
    Journal Article
  14. 14

    UV-Sensitive Low Dark-Count PureB Single-Photon Avalanche Diode by Lin Qi, Mok, K. R. C., Aminian, Mahdi, Charbon, Edoardo, Nanver, Lis K.

    Published in IEEE transactions on electron devices (01-11-2014)
    “…A single-photon avalanche diode with high sensitivity in the ultraviolet (UV) wavelength range has been fabricated on Si using pure boron chemical vapor…”
    Get full text
    Journal Article
  15. 15

    Robust UV/VUV/EUV PureB Photodiode Detector Technology With High CMOS Compatibility by Nanver, Lis K., Lin Qi, Mohammadi, Vahid, Mok, K. R. M., de Boer, Wiebe B., Golshani, Negin, Sammak, Amir, Scholtes, Thomas L. M., Gottwald, Alexander, Kroth, Udo, Scholze, Frank

    “…This paper gives an assessment of old and new data relevant to the optical and electrical performance of PureB photodiodes for application in the wavelength…”
    Get full text
    Journal Article
  16. 16

    Data Transmission Capabilities of Silicon Avalanche Mode Light-Emitting Diodes by Agarwal, Vishal, Annema, Anne-Johan, Hueting, Raymond J.E., Dutta, Satadal, Nanver, Lis K., Nauta, Bram

    Published in IEEE transactions on electron devices (01-11-2018)
    “…The data transmission capabilities of silicon avalanche mode light-emitting diodes (AMLEDs) were investigated, and the results are correlated with the…”
    Get full text
    Journal Article
  17. 17

    Chemical Vapor Deposition of α-Boron Layers on Silicon for Controlled Nanometer-Deep p+n Junction Formation by Sarubbi, Francesco, Scholtes, Tom L. M., Nanver, Lis K.

    Published in Journal of electronic materials (01-02-2010)
    “…Nanometer-thick amorphous boron ( α -B) layers were formed on (100) Si during exposure to diborane (B 2 H 6 ) in a chemical vapor deposition (CVD) system,…”
    Get full text
    Journal Article
  18. 18

    Indirect optical crosstalk reduction by highly-doped backside layer in single-photon avalanche diode arrays by Osrečki, Željko, Knežević, Tihomir, Nanver, Lis K., Suligoj, Tomislav

    Published in Optical and quantum electronics (01-03-2018)
    “…A method of reducing indirect optical crosstalk in single-photon avalanche diode arrays is investigated by TCAD simulations. The reduction is accomplished by…”
    Get full text
    Journal Article
  19. 19
  20. 20

    Ultra-high aspect-ratio FinFET technology by Jovanović, Vladimir, Suligoj, Tomislav, Poljak, Mirko, Civale, Yann, Nanver, Lis K.

    Published in Solid-state electronics (01-09-2010)
    “…FinFETs with ultra-large height-to-width ratio have been processed on (1 1 0) bulk silicon wafers by employing crystallographic etching of silicon with TMAH,…”
    Get full text
    Journal Article Conference Proceeding