Search Results - "Nützel, J"

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    Photoluminescence study of the crossover from two-dimensional to three-dimensional growth for Ge on Si(100) by Schittenhelm, P., Gail, M., Brunner, J., Nützel, J. F., Abstreiter, G.

    Published in Applied physics letters (28-08-1995)
    “…Narrow Ge layers embedded in Si are investigated using photoluminescence (PL) spectroscopy. With increasing layer thickness a growth mode changeover from…”
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    Journal Article
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    Phosphorous doping in low temperature silicon molecular beam epitaxy by FRIESS, E, NÜTZEL, J, ABSTREITER, G

    Published in Applied physics letters (04-05-1992)
    “…Phosphorus doping with silicon molecular beam epitaxy was studied using a novel design of a solid doping source based on evaporation of highly doped silicon…”
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    Journal Article
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    Object nets for the design and verification of distributed and embedded applications by Nützel, Jürgen, Däne, Bernd, Fengler, Wolfgang

    Published in Lecture notes in computer science (01-01-1998)
    “…In this paper we present an object-oriented method for the design, verification and implementation of embedded and distributed systems. The method is called…”
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    Book Chapter Conference Proceeding
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    Luminescence studies of confined excitons in pseudomorphic Si/SiGe quantum wells grown by solid source molecular beam epitaxy by Brunner, J., Nützel, J., Gail, M., Menczigar, U., Abstreiter, G.

    “…Band gap luminescence from pseudomorphic Si/Si1−x Ge x /Si quantum wells grown by solid source molecular beam epitaxy is studied for a composition range from…”
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    Conference Proceeding Journal Article
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    Electroluminescence of erbium–oxygen-doped silicon diodes grown by molecular beam epitaxy by Stimmer, J., Reittinger, A., Nützel, J. F., Abstreiter, G., Holzbrecher, H., Buchal, Ch

    Published in Applied physics letters (03-06-1996)
    “…We have fabricated erbium–oxygen-doped silicon light emitting diodes with molecular beam epitaxy by simultaneously evaporating erbium and silicon and providing…”
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    Journal Article
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    Growth and properties of high-mobility two-dimensional hole gases in Ge on relaxed Si/SiGe, Ge/SiGe buffers and Ge substrates by Nützel, J.F., Engelhardt, C.M., Wiesner, R., Többen, D., Holzmann, M., Abstreiter, G.

    Published in Journal of crystal growth (1995)
    “…High-mobility two-dimensional hole channels were grown pseudomorphically on Ge substrates and strained on relaxed graded buffers both on Si and for the first…”
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    Journal Article Conference Proceeding
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    Second-harmonic generation in asymmetric Si/SiGe quantum wells by Seto, M., Helm, M., Moussa, Z., Boucaud, P., Julien, F. H., Lourtioz, J.-M., Nützel, J. F., Abstreiter, G.

    Published in Applied physics letters (05-12-1994)
    “…The observation of infrared second-harmonic generation in asymmetric Si/SiGe p-doped quantum wells is reported. The generated signal stems entirely from…”
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    Journal Article
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    Transverse magnetic and transverse electric polarized inter-subband absorption and photoconductivity in p -type SiGe quantum wells by Fromherz, T., Kruck, P., Helm, M., Bauer, G., Nützel, J. F., Abstreiter, G.

    Published in Applied physics letters (17-06-1996)
    “…We have investigated the polarization dependence of subband absorption and photoconductivity in Si/SiGe quantum wells. For samples with a hole concentration of…”
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    Journal Article
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    Medium-wavelength, normal-incidence, p -type Si/SiGe quantum well infrared photodetector with background limited performance up to 85 K by Kruck, P., Helm, M., Fromherz, T., Bauer, G., Nützel, J. F., Abstreiter, G.

    Published in Applied physics letters (25-11-1996)
    “…The detector characteristics of a pseudomorphic p-type Si0.64Ge0.36/Si quantum well infrared photodetector are reported. The device exhibits a photoresponse…”
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    Journal Article
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    Segregation of n-dopants on SiGe surfaces by Nützel, J.F., Holzmann, M., Schittenhelm, P., Abstreiter, G.

    Published in Applied surface science (01-08-1996)
    “…We have investigated the surface segregation of phosphorus in comparison to antimony on Si and SiGe(001) in molecular beam epitaxy. The segregation was…”
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    Journal Article Conference Proceeding
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    RHEED investigations of surface diffusion on Si(001) by Nützel, J.F., Brichzin, P., Abstreiter, G.

    Published in Applied surface science (01-08-1996)
    “…We have performed RHEED measurements over a wide range of growth temperatures and rates on Si(001) substrates. The measurements of the equilibrium intensity,…”
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    Journal Article Conference Proceeding
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    Room temperature electroluminescence of Er-implanted silicon diodes grown by MBE by Jaumann, M., Stimmer, J., Schittenhelm, P., Nützel, J.F., Abstreiter, G., Neufeld, E., Holländer, B., Buchal, Ch

    Published in Applied surface science (01-08-1996)
    “…We investigated the room temperature electroluminescence of Er doped silicon diodes codoped with O or F as a function of dopant concentration and annealing…”
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    Journal Article Conference Proceeding
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    Potato System and signed media format - an alternative approach to online music business by Nutzel, J., Grimm, R.

    “…Thanks to modern compression techniques and increased bandwidth, the distribution of digital music via Internet has become affordable and easy. Many…”
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    Conference Proceeding
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    Second-order susceptibilities related to valence-band transitions in asymmetric Si/SiGe quantum wells by Kruck, P, Seto, M, Helm, M, Moussa, Z, Boucaud, P, Julien, F H, Lourtioz, J-M, Nutzel, J F, Abstreiter, G

    Published in Solid-state electronics (01-01-1996)
    “…The observation of second-harmonic generation in compositionally stepped p-type Si/SiGe multiple quantum wells is reported. The second-order nonlinear…”
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    Journal Article
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    Fabrication of n - and p -channel in-plane-gate transistors from Si/SiGe/Ge heterostructures by focused laser beam writing by Holzmann, M., Baumgartner, P., Engel, C., Nützel, J. F., Abstreiter, G., Schäffler, F.

    Published in Applied physics letters (20-05-1996)
    “…Focused laser beam writing is applied for thermally activated diffusion of dopants into strained Si/Ge modulation-doped heterostructures. Lateral p- and n-type…”
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    Journal Article