Search Results - "Mu, Fengwen"
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Interfacial Thermal Conductance across Room-Temperature-Bonded GaN/Diamond Interfaces for GaN-on-Diamond Devices
Published in ACS applied materials & interfaces (19-02-2020)“…The wide bandgap, high-breakdown electric field, and high carrier mobility makes GaN an ideal material for high-power and high-frequency electronics…”
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Room temperature GaN-diamond bonding for high-power GaN-on-diamond devices
Published in Scripta materialia (01-06-2018)“…Fabrication of GaN-on-diamond structure by bonding technology is becoming more and more attractive for high-power GaN devices. However, researches on low…”
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3
Graphene and Graphene-Based Nanomaterials for DNA Detection: A Review
Published in Molecules (Basel, Switzerland) (16-08-2018)“…DNA detection with high sensitivity and specificity has tremendous potential as molecular diagnostic agents. Graphene and graphene-based nanomaterials, such as…”
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High Thermal Boundary Conductance across Bonded Heterogeneous GaN–SiC Interfaces
Published in ACS applied materials & interfaces (11-09-2019)“…High-power GaN-based electronics are limited by high channel temperatures induced by self-heating, which degrades device performance and reliability…”
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GaN-Si direct wafer bonding at room temperature for thin GaN device transfer after epitaxial lift off
Published in Applied surface science (15-09-2017)“…[Display omitted] •GaN-Si direct wafer bonding with high bonding energy was accomplished at room temperature for the first time.•The phenomenon of…”
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Suppression of interface states between nitride-based gate dielectrics and ultrathin-barrier AlGaN/GaN heterostructure with in situ remote plasma pretreatments
Published in Applied physics letters (01-03-2021)“…A silicon nitride (SiNx) film deposited at 500 °C by plasma-enhanced atomic layer deposition (PEALD) is employed as the gate dielectric for GaN-based…”
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Direct wafer bonding of Ga2O3–SiC at room temperature
Published in Ceramics international (01-04-2019)“…Integration of Ga2O3 on SiC substrate with a high thermal conductivity is one of the promising solutions to reduce the self-heating of Ga2O3 devices. Direct…”
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Room Temperature Wafer Bonding of Glass Using Aluminum Oxide Intermediate Layer
Published in Advanced materials interfaces (01-03-2021)“…This paper presents a room temperature bonding technique of glass substrates with a transparent bonding interface. As a room temperature bonding method,…”
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Low-temperature bonding of surface-activated polyimide to Cu Foil in Pt-catalyzed formic acid atmosphere
Published in Journal of materials science. Materials in electronics (01-02-2022)“…In this study, a two-step process involving oxygen plasma surface activation and thermos-compression in Pt-catalyzed formic acid gas was used to bond Cu foil…”
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10
Low temperature Cu bonding with large tolerance of surface oxidation
Published in AIP advances (01-05-2019)“…A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide…”
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Direct Bonding Method for Completely Cured Polyimide by Surface Activation and Wetting
Published in Materials (30-03-2022)“…Polymer adhesives have emerged as a promising dielectric passivation layer in hybrid bonding for 3D integration, but they raise misalignment problems during…”
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12
Development of a numerical model for simulating stress corrosion cracking in spent nuclear fuel canisters
Published in Npj Materials degradation (26-05-2021)“…Prediction and detection of the chloride-induced stress corrosion cracking (CISCC) in Type 304 stainless steel spent nuclear fuel canisters are vital for the…”
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13
Direct wafer bonding of GaN-SiC for high power GaN-on-SiC devices
Published in Materialia (01-11-2018)“…GaN-on-SiC has been very attractive for high-power GaN device owing to the high thermal conductivity of SiC substrate. However, the transition layer with a…”
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14
Cu-Cu Thermocompression Bonding with a Self-Assembled Monolayer as Oxidation Protection for 3D/2.5D System Integration
Published in Micromachines (Basel) (30-06-2023)“…Cu-Cu direct interconnects are highly desirable for the microelectronic industry as they allow for significant reductions in the size and spacing of…”
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15
Silicon carbide wafer bonding by modified surface activated bonding method
Published in Japanese Journal of Applied Physics (01-03-2015)“…4H-SiC wafer bonding has been achieved by the modified surface activated bonding (SAB) method without any chemical-clean treatment and high temperature…”
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Efficient thermal dissipation in wafer-scale heterogeneous integration of single-crystalline β-Ga2O3 thin film on SiC
Published in Fundamental research (Beijing) (01-11-2021)“…The semiconductor, β-Ga2O3 is attractive for applications in high power electronic devices with low conduction loss due to its ultra-wide bandgap (∼4.9 eV) and…”
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Author Correction: Development of a numerical model for simulating stress corrosion cracking in spent nuclear fuel canisters
Published in Npj Materials degradation (05-10-2021)Get full text
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18
Wafer-scale heterogeneous integration InP on trenched Si with a bubble-free interface
Published in APL materials (01-05-2020)“…Heterogeneous integration of compound semiconductors on a Si platform leads to advanced device applications in the field of Si photonics and high frequency…”
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Heterogeneous GaN-Si integration via plasma activation direct bonding
Published in Journal of alloys and compounds (25-01-2021)“…Direct bonding of GaN and Si substrates at 125 °C under atmospheric conditions was investigated by different Plasma activation bonding (PAB) methods. The…”
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Robust Ag-Cu Sintering Bonding at 160 °C via Combining Ag2O Microparticle Paste and Pt-Catalyzed Formic Acid Vapor
Published in Metals (Basel ) (28-02-2020)“…With the assistance of Pt-catalyzed formic acid vapor, robust Ag-Cu bonding was realized at an ultra-low temperature of 160 °C under 3 MPa for 30 min via the…”
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