Search Results - "Moser, N.A."

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  1. 1

    Effective Suppression of IV Knee Walk-Out in AlGaN/GaN HEMTs for Pulsed-IV Pulsed-RF With a Large Signal Network Analyzer by Seok Joo Doo, Roblin, P., Jessen, G.H., Fitch, R.C., Gillespie, J.K., Moser, N.A., Crespo, A., Simpson, G., Jon King

    “…IV knee walk-out in AlGaN/GaN high electron mobility transistors (HEMTs) on a Sapphire substrate is analyzed using dynamic radio frequency (RF) load-lines…”
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    Journal Article
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    Hysteresis-free MOSCAP made with Al2O3/(010)β-Ga2O3 interface using a combination of surface cleaning, etching and post-deposition annealing by Islam, A.E., Leedy, K.D., Moser, N.A., Ganguli, S., Liddy, K.J., Green, A.J., Chabak, K.D.

    Published in 2021 Device Research Conference (DRC) (20-06-2021)
    “…Development of electronic-grade gate dielectrics with negligible hysteresis, low interface defect density (N IT ), reduced gate leakage and high breakdown…”
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    Conference Proceeding
  4. 4

    High performance 0.14 μm gate-length AlGaN/GaN power HEMTs on SiC by Jessen, G.H., Fitch, R.C., Gillespie, J.K., Via, G.D., Moser, N.A., Yannuzzi, M.J., Crespo, A., Sewell, J.S., Dettmer, R.W., Jenkins, T.J., Davis, R.F., Yang, J., Khan, M.A., Binari, S.C.

    Published in IEEE electron device letters (01-11-2003)
    “…High electron mobility transistors (HEMTs) were fabricated from AlGaN/GaN on semi-insulating SiC substrates with excellent performance and high yield. The…”
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    Journal Article
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    Gate optimization of AlGaN/GaN HEMTs using WSi, Ir, Pd, and Ni Schottky contacts by Jessen, G.H., Fitch, R.C., Gillespie, J.K., Via, G.D., Moser, N.A., Yannuzzi, M.J., Crespo, A., Dettmer, R.W., Jenkins, T.J.

    “…High electron mobility transistors (HEMTs) were fabricated from AlGaN/GaN on semi-insulating SiC substrates with WSi, Ir, Pd, and Ni Schottky contacts. The…”
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    Conference Proceeding