Search Results - "Mongey, K.F."

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  1. 1

    Atmospheric pressure excimer lamp-assisted photoselective activation process for electroless plating by Macauley, D.J., Kelly, P.V., Mongey, K.F., Crean, G.M.

    Published in Applied surface science (1999)
    “…Photoselective activation technologies for electroless metallisation have significant potential in minimising the number of activation process steps. In this…”
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    Journal Article
  2. 2

    Comparison of processes for selective electroless copper plating on 96% alumina photo-selectively activated using chlorinated and non-chlorinated photochemical coatings: photoactivity and reliability studies by Macauley, D.J., Mongey, K.F., Kelly, P.V., Crean, G.M.

    Published in Surface & coatings technology (1998)
    “…Photo-activation processes using a wide variety of photochemical coatings as activation precursors have been reported in recent years. This work presents a…”
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    Journal Article
  3. 3

    Surface charge analysis characterisation of ultraviolet-induced damage in silicon nitride dielectrics by Korowicz, D.H., Kelly, P.V., Mongey, K.F., Crean, G.M.

    Published in Applied surface science (15-12-2000)
    “…We report the effect of deep ultraviolet (172nm wavelength, 7.2eV) irradiation from a Xe2∗ excimer lamp source on the electrical properties of PECVD Si3N4…”
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    Journal Article Conference Proceeding
  4. 4

    Effects of plasma on excimer lamp based selective activation processes for electroless plating by Macauley, D.J., Kelly, P.V., Mongey, K.F., Crean, G.M.

    Published in Applied surface science (1999)
    “…Several photoselective activation processes for electroless plating have been reported in recent years using excimer lamps to selectively photodecompose…”
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    Journal Article
  5. 5

    Photo-assisted metallisation: line resolution studies by Lafferty, E.J., Macauley, D.J., Mongey, K.F., Kelly, P.V., Crean, G.M.

    Published in Surface & coatings technology (01-03-1998)
    “…Photo-activation processes for electroless plating have the potential for linewidth resolution on a scale of the order of 10 μm or less, depending on the…”
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    Journal Article