Three-Dimensional Soft Material Micropatterning via Grayscale Photolithography for Improved Hydrophobicity of Polydimethylsiloxane (PDMS)

Three-Dimensional Soft Material Micropatterning via Grayscale Photolithography for Improved Hydrophobicity of Polydimethylsiloxane (PDMS)

In this present work, we aim to improve the hydrophobicity of a polydimethylsiloxane (PDMS) surface. Various heights of 3D PDMS micropillars were fabricated via grayscale photolithography, and improved wettability was investigated. Two approaches of PDMS replication were demonstrated, both using a s...

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Bibliographic Details
Published in:Micromachines (Basel) Vol. 13; no. 1; p. 78
Main Authors: Hamid, Intan Sue Liana Abdul, Khi Khim, Beh, Mohamed Omar, Mohammad Faiz, Mohamad Zain, Khairu Anuar, Abd Rhaffor, Nuha, Sal Hamid, Sofiyah, Abd Manaf, Asrulnizam
Format: Journal Article
Language:English
Published: Switzerland MDPI AG 01-01-2022
MDPI
Subjects:
Arrays
Contact angle
Design
droplet
Glass substrates
Gray scale
grayscale lithography
hydrophobic
Hydrophobic surfaces
Hydrophobicity
micro 3D structure
Micropatterning
Photolithography
Polydimethylsiloxane
Polyethylene terephthalate
Water drops
Wettability
United States > US
Japan
micro 3D structure
contact angle
grayscale lithography
droplet
hydrophobic
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Summary:In this present work, we aim to improve the hydrophobicity of a polydimethylsiloxane (PDMS) surface. Various heights of 3D PDMS micropillars were fabricated via grayscale photolithography, and improved wettability was investigated. Two approaches of PDMS replication were demonstrated, both using a single master mold to obtain the micropillar arrays. The different heights of fabricated PDMS micropillars were characterized by scanning electron microscopy (SEM) and a surface profiler. The surface hydrophobicity was characterized by measuring the water contact angles. The fabrication of PDMS micropillar arrays was shown to be effective in modifying the contact angles of pure water droplets with the highest 157.3-degree water contact angle achieved by implementing a single mask grayscale lithography technique.
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content type line 23
ISSN:2072-666X
2072-666X
DOI:10.3390/mi13010078