Germanium Multiple-Gate Field-Effect Transistors Formed on Germanium-on-Insulator Substrate

We demonstrate the integration of high performance p-channel Germanium Multiple-Gate Field-Effect Transistors (MuGFETs) on a Germanium-on-Insulator substrate. Detailed process conditions are documented in this paper. The effects of Ge fin doping concentration on the electrical performance of Ge MuGF...

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Bibliographic Details
Published in:IEEE transactions on electron devices Vol. 60; no. 6; pp. 1852 - 1860
Main Authors: Bin Liu, Xiao Gong, Chunlei Zhan, Genquan Han, Hock-Chun Chin, Moh-Lung Ling, Jie Li, Yongdong Liu, Jiangtao Hu, Daval, N., Veytizou, C., Delprat, D., Bich-Yen Nguyen, Yee-Chia Yeo
Format: Journal Article
Language:English
Published: New York, NY IEEE 01-06-2013
Institute of Electrical and Electronics Engineers
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Summary:We demonstrate the integration of high performance p-channel Germanium Multiple-Gate Field-Effect Transistors (MuGFETs) on a Germanium-on-Insulator substrate. Detailed process conditions are documented in this paper. The effects of Ge fin doping concentration on the electrical performance of Ge MuGFETs are discussed, and this could be useful for further device optimization. It is found that a higher fin doping leads to better control of short-channel efforts of Ge MuGFETs but degrades the on-state current and transconductance. High on-state current for Ge MuGFETs is reported in this paper.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2013.2258924