Germanium Multiple-Gate Field-Effect Transistors Formed on Germanium-on-Insulator Substrate
We demonstrate the integration of high performance p-channel Germanium Multiple-Gate Field-Effect Transistors (MuGFETs) on a Germanium-on-Insulator substrate. Detailed process conditions are documented in this paper. The effects of Ge fin doping concentration on the electrical performance of Ge MuGF...
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Published in: | IEEE transactions on electron devices Vol. 60; no. 6; pp. 1852 - 1860 |
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Main Authors: | , , , , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York, NY
IEEE
01-06-2013
Institute of Electrical and Electronics Engineers |
Subjects: | |
Online Access: | Get full text |
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Summary: | We demonstrate the integration of high performance p-channel Germanium Multiple-Gate Field-Effect Transistors (MuGFETs) on a Germanium-on-Insulator substrate. Detailed process conditions are documented in this paper. The effects of Ge fin doping concentration on the electrical performance of Ge MuGFETs are discussed, and this could be useful for further device optimization. It is found that a higher fin doping leads to better control of short-channel efforts of Ge MuGFETs but degrades the on-state current and transconductance. High on-state current for Ge MuGFETs is reported in this paper. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2013.2258924 |