Search Results - "Miyawaki, Yudai"

CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

“…The gas phase fragmentations of perfluoro-propyl-vinyl ether (PPVE, C5F10O) are studied experimentally. Dominant fragmentations of PPVE are found to be the…”
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Highly Selective Etching of SiO2 over Si3N4 and Si in Capacitively Coupled Plasma Employing C5HF7 Gas by Miyawaki, Yudai, Kondo, Yusuke, Sekine, Makoto, Ishikawa, Kenji, Hayashi, Toshio, Takeda, Keigo, Kondo, Hiroki, Yamazaki, Atsuyo, Ito, Azumi, Matsumoto, Hirokazu, Hori, Masaru

“…In a dual-frequency-excited parallel plate capacitively coupled plasma employing a heptafluoro-cyclo-pentene (C 5 HF 7 ) gas with addition of O 2 and dilution…”
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Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes by Fukasawa, Masanaga, Matsugai, Hiroyasu, Honda, Takahiro, Miyawaki, Yudai, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Nagahata, Kazunori, Uesawa, Fumikatsu, Hori, Masaru, Tatsumi, Tetsuya

“…The wavelength dependence of SiN x :H/Si interface defect generation caused by vacuum ultraviolet (VUV)/UV radiation from plasma etching processes was…”
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Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation by Fukasawa, Masanaga, Miyawaki, Yudai, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Matsugai, Hiroyasu, Honda, Takayoshi, Minami, Masaki, Uesawa, Fumikatsu, Hori, Masaru, Tatsumi, Tetsuya

“…Photon-enhanced etching of SiN x :H films caused by the interaction between vacuum ultraviolet (VUV)/ultraviolet (UV) radiation and radicals in the…”
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Etching Enhancement Followed by Nitridation on Low-$k$ SiOCH Film in Ar/C5F10O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

“…The etching rates of low-dielectric-constant (low-$k$), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C 5 F 10 O plasma etching in…”
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Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation by Fukasawa, Masanaga, Miyawaki, Yudai, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Matsugai, Hiroyasu, Honda, Takayoshi, Minami, Masaki, Uesawa, Fumikatsu, Hori, Masaru, Tatsumi, Tetsuya

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Reactive Ion Etching of Carbon Nanowalls by Kondo, Shingo, Kondo, Hiroki, Miyawaki, Yudai, Sasaki, Hajime, Kano, Hiroyuki, Hiramatsu, Mineo, Hori, Masaru

“…Two-dimensionally standing graphene sheets, i.e., carbon nanowalls (CNWs), were synthesized on a Si substrate employing a capacitively coupled fluorocarbon…”
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Silicon nitride etching performance of CH2F2 plasma diluted with argon or krypton by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

“…Etching rates of silicon nitrides (SiN), SiO2, and poly-Si films for CH2F2 plasmas diluted with rare gases are presented by comparing the effects of flow rates…”
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Silicon nitride etching performance of CH sub(2)F sub(2) plasma diluted with argon or krypton by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

“…Etching rates of silicon nitrides (SiN), SiO sub(2), and poly-Si films for CH sub(2)F sub(2) plasmas diluted with rare gases are presented by comparing the…”
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Silicon nitride etching performance of CH 2 F 2 plasma diluted with argon or krypton by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

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CF 3 + fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C 5 F 10 O, in gas phase by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

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CF sub(3) super(+) fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C sub(5)F sub(10)O, in gas phase by Kondo, Yusuke, Ishikawa, Kenji, Hayashi, Toshio, Miyawaki, Yudai, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

“…The gas phase fragmentations of perfluoro-propyl-vinyl ether (PPVE, C sub(5)F sub(10)O) are studied experimentally. Dominant fragmentations of PPVE are found…”
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Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C 5 F 10 O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

“…The etching rates of low-dielectric-constant (low- k ), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C 5 F 10 O plasma etching in…”
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Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C sub(5)F sub(10)O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

“…The etching rates of low-dielectric-constant (low-k), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C sub(5)F sub(10)O plasma etching in…”
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Reactive Ion Etching of Carbon Nanowalls by Kondo, Shingo, Kondo, Hiroki, Miyawaki, Yudai, Sasaki, Hajime, Kano, Hiroyuki, Hiramatsu, Mineo, Hori, Masaru

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Highly Selective Etching of SiO sub(2) over Si sub(3)N sub(4) and Si in Capacitively Coupled Plasma Employing C sub(5)HF sub(7) Gas by Miyawaki, Yudai, Kondo, Yusuke, Sekine, Makoto, Ishikawa, Kenji, Hayashi, Toshio, Takeda, Keigo, Kondo, Hiroki, Yamazaki, Atsuyo, Ito, Azumi, Matsumoto, Hirokazu, Hori, Masaru

“…In a dual-frequency-excited parallel plate capacitively coupled plasma employing a heptafluoro-cyclo-pentene (C sub(5)HF sub(7)) gas with addition of O sub(2)…”
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Highly Selective Etching of SiO 2 over Si 3 N 4 and Si in Capacitively Coupled Plasma Employing C 5 HF 7 Gas by Miyawaki, Yudai, Kondo, Yusuke, Sekine, Makoto, Ishikawa, Kenji, Hayashi, Toshio, Takeda, Keigo, Kondo, Hiroki, Yamazaki, Atsuyo, Ito, Azumi, Matsumoto, Hirokazu, Hori, Masaru

“…In a dual-frequency-excited parallel plate capacitively coupled plasma employing a heptafluoro-cyclo-pentene (C 5 HF 7 ) gas with addition of O 2 and dilution…”
Get full text