Search Results - "Mitrovic, I."

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  1. 1

    Controlled modification of resonant tunneling in metal-insulator-insulator-metal structures by Mitrovic, I. Z., Weerakkody, A. D., Sedghi, N., Ralph, J. F., Hall, S., Dhanak, V. R., Luo, Z., Beeby, S.

    Published in Applied physics letters (01-01-2018)
    “…We present comprehensive experimental and theoretical work on tunnel-barrier rectifiers comprising bilayer (Nb2O5/Al2O3) insulator configurations with similar…”
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    Journal Article
  2. 2

    Impact of AlO y Interfacial Layer on Resistive Switching Performance of Flexible HfO ₓ /AlO y ReRAMs by Biswas, S., Paul, A. D., Das, P., Tiwary, P., Edwards, H. J., Dhanak, V. R., Mitrovic, I. Z., Mahapatra, R.

    Published in IEEE transactions on electron devices (01-08-2021)
    “…103). It introduces the oxygen vacancies in HfO x which controls the formation and rupture of filament and plays an important role in improving RS…”
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    Journal Article
  3. 3

    Compositional tuning of atomic layer deposited MgZnO for thin film transistors by Wrench, J. S., Brunell, I. F., Chalker, P. R., Jin, J. D., Shaw, A., Mitrovic, I. Z., Hall, S.

    Published in Applied physics letters (17-11-2014)
    “…Thin film transistors (TFTs) have been fabricated using magnesium zinc oxide (MgZnO) layers deposited by atomic layer deposition at 200 °C. The composition of…”
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    Journal Article
  4. 4

    Atomic layer deposition of Nb-doped ZnO for thin film transistors by Shaw, A., Wrench, J. S., Jin, J. D., Whittles, T. J., Mitrovic, I. Z., Raja, M., Dhanak, V. R., Chalker, P. R., Hall, S.

    Published in Applied physics letters (28-11-2016)
    “…We present physical and electrical characterization of niobium-doped zinc oxide (NbZnO) for thin film transistor (TFT) applications. The NbZnO films were…”
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    Journal Article
  5. 5

    Molecular analysis of metallo-beta-lactamase-producing Pseudomonas aeruginosa in Switzerland 2022–2023 by Findlay, Jacqueline, Raro, Otavio Hallal Ferreira, Poirel, Laurent, Nordmann, Patrice

    “…Objectives The occurrence of metallo-beta-lactamase-producing Pseudomonas aeruginosa (MBL-PA) isolates is increasing globally, including in Switzerland. The…”
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    Journal Article
  6. 6

    Influence of interlayer properties on the characteristics of high-k gate stacks by Engstrom, O., Mitrovic, I.Z., Hall, S.

    Published in Solid-state electronics (01-09-2012)
    “…► The shape of MOS high-k/IL interfaces influences electric data. ► CET data for IL become underestimated for gradual interfaces. ► Thinning gradual IL…”
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    Journal Article
  7. 7

    An environmentally friendly solution-processed ZrLaO gate dielectric for large-area applications in the harsh radiation environment by Fang, Y X, Xu, W.Y., Mitrovic, I Z, Yang, L, Zhao, C, Zhao, C Z

    “…In this work, an eco-friendly aqueous solution-processed ZrLaO dielectric is demonstrated for large-area application in the harsh radiation environment…”
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    Conference Proceeding
  8. 8

    Water-induced Combustion-processed Metal-oxide Synaptic Transistor by Liu, Qihan, Zhao, C, Liu, Y, Mitrovic, I Z, Xu, W Y, Yang, L, Wang, Z, Wei, W, Wu, Y, Yu, X

    “…In this study, we describe combustion-processed high-quality Li-AlO x thin films and their implementation in In- 2 O 3 synaptic transistors by a low…”
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    Conference Proceeding
  9. 9
  10. 10

    Effect of oxygen on tuning the TiNx metal gate work function on LaLuO3 by Mitrovic, I.Z., Przewlocki, H.M., Piskorski, K., Simutis, G., Dhanak, V.R., Sedghi, N., Hall, S.

    Published in Thin solid films (30-09-2012)
    “…This paper presents experimental evidence on effective work function tuning due to the presence of oxygen at the TiNx/LaLuO3 interface. Two complementary…”
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    Journal Article
  11. 11

    Ellipsometric analysis of mixed metal oxides thin films by Buiu, O., Davey, W., Lu, Y., Mitrovic, I.Z., Hall, S.

    Published in Thin solid films (03-11-2008)
    “…The optical dielectric function of hafnium oxide and hafnium silicate thin films was extracted from spectroscopic ellipsometry measurements. The dielectric…”
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    Journal Article Conference Proceeding
  12. 12

    Spectroellipsometric assessment of HfO2 thin films by BUIU, O, LU, Y, MITROVIC, I. Z, HALL, S, CHALKER, P, POTTER, R. J

    Published in Thin solid films (25-10-2006)
    “…Present paper looks into the possibilities and limitations of near ultraviolet-visible range spectroscopic ellipsometry in investigating HfO2 thin films…”
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    Conference Proceeding Journal Article
  13. 13

    Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition by Mather, S., Sedghi, N., Althobaiti, M., Mitrovic, I.Z., Dhanak, V., Chalker, P.R., Hall, S.

    Published in Microelectronic engineering (01-09-2013)
    “…[Display omitted] •Ge gate MOS devices were investigated due to its applicability to sub 16nm node pMOST technology.•GeO2/Al2O3/HfO2 gate stacks were grown by…”
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    Journal Article
  14. 14

    Development of modified pyrophyllite carbon paste electrode for carbendazim detection by Mitrović Rajić, Anđela I., Milićević, Jelena S., Grbović Novaković, Jasmina D.

    Published in Materials and manufacturing processes (03-10-2023)
    “…This study aims to design the pyrophyllite-adapted carbon paste electrode (pCPE) and test it for potential use in wastewater purification systems. Structural…”
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    Journal Article
  15. 15

    Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements by Fang, Y.X., Zhao, C., Mitrovic, I.Z., Hall, S., Yang, L., Zhao, C.Z.

    Published in Microelectronic engineering (15-09-2019)
    “…In this work, the effects of biased irradiation on solution-processed and atomic layer deposited (ALD) AlOx thin films MOS capacitors were investigated by an…”
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    Journal Article
  16. 16

    Interface engineering of Ge using thulium oxide: Band line-up study by Mitrovic, I.Z., Althobaiti, M., Weerakkody, A.D., Sedghi, N., Hall, S., Dhanak, V.R., Chalker, P.R., Henkel, C., Dentoni Litta, E., Hellström, P.-E., Östling, M.

    Published in Microelectronic engineering (01-09-2013)
    “…•Thulium oxide layers on germanium were investigated.•The valence band offset was found to be 2.95eV.•The band gap of thulium oxide was found to be 5.3eV from…”
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    Journal Article
  17. 17

    Estimate of dielectric density using spectroscopic ellipsometry by Davey, W., Buiu, O., Werner, M., Mitrovic, I.Z., Hall, S., Chalker, P.

    Published in Microelectronic engineering (01-07-2009)
    “…The optical dielectric functions for hafnium oxide and hafnium silicate films were extracted from spectroscopic ellipsometry measurements and the density then…”
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    Journal Article Conference Proceeding
  18. 18

    Extraction of the sub-band gap density of states of Nb doped ZnO thin film transistors using C-V measurements by Shaw, A., Jin, J.D., Mitrovic, I.Z., Hall, S., Wrench, J.S., Chalker, P.R.

    Published in Microelectronic engineering (25-06-2017)
    “…The sub-band gap density of states (DOS) of Nb doped ZnO thin film transistors were extracted using a multi-frequency capacitance-voltage (C-V) method. The…”
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    Journal Article
  19. 19

    Current transport mechanisms in (HfO2)x(SiO2) 1−x/SiO2gate stacks by Mitrovic, I.Z., Lu, Y., Buiu, O., Hall, S.

    Published in Microelectronic engineering (01-09-2007)
    “…This paper investigates current transport mechanisms in MOCVD grown (HfO2)x(SiO2)1-x/SiO2 (0.3x 1) gate stacks using the temperature dependence of leakage…”
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    Journal Article
  20. 20

    Scaling potential and MOSFET integration of thermally stable Gd silicate dielectrics by Gottlob, H.D.B., Schmidt, M., Stefani, A., Lemme, M.C., Kurz, H., Mitrovic, I.Z., Davey, W.M., Hall, S., Werner, M., Chalker, P.R., Cherkaoui, K., Hurley, P.K., Piscator, J., Engström, O., Newcomb, S.B.

    Published in Microelectronic engineering (01-07-2009)
    “…We investigate the potential of gadolinium silicate (GdSiO) as a thermally stable high- k gate dielectric in a gate first integration scheme. There silicon…”
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    Journal Article Conference Proceeding