Search Results - "Minea, T. M."

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  1. 1

    Carbon nanotube growth mechanism switches from tip- to base-growth with decreasing catalyst particle size by Gohier, A., Ewels, C.P., Minea, T.M., Djouadi, M.A.

    Published in Carbon (New York) (01-08-2008)
    “…The growth of carbon nanotubes by a plasma assisted catalytic chemical vapor deposition was investigated using cobalt, nickel and iron catalyst particles of…”
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    Journal Article
  2. 2

    On the anisotropy and thermalization of the metal sputtered atoms in a low-pressure magnetron discharge by Poucques, L. de, Vitelaru, C, Minea, T. M, Bretagne, J, Popa, G

    Published in Europhysics letters (01-04-2008)
    “…Space-resolved velocity distributions of titanium atoms sputtered in a direct-current (dc) magnetron discharge working at low pressure (0.4 Pa) were…”
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    Journal Article
  3. 3
  4. 4

    Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD by Gohier, A., Minea, T.M., Point, S., Mevellec, J.-Y., Jimenez, J., Djouadi, M.A., Granier, A.

    Published in Diamond and related materials (2009)
    “…The early stages of single-walled (SWCNT) and multi-walled carbon nanotube (MWCNT) growth were investigated by chemical vapour deposition (CVD) and plasma…”
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    Journal Article
  5. 5

    Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling by Minea, T.M., Costin, C., Revel, A., Lundin, D., Caillault, L.

    Published in Surface & coatings technology (25-09-2014)
    “…The ionization efficiency of High Power Impulse Magnetron Sputtering (HiPIMS) discharges is the key parameter leading to (i) gas ion production and…”
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    Journal Article Conference Proceeding
  6. 6

    Angular and Local Spectroscopic Analysis to Probe the Vertical Alignment of N-doped Well-separated Carbon Nanotubes by Minea, T. M, Bouchet-Fabre, B, Lazar, S, Point, S, Zandbergen, H. W

    Published in The journal of physical chemistry. B (17-08-2006)
    “…Vertically aligned well-separated N-doped multiwalled carbon nanotubes (CNTs) were grown on a silicon substrate by plasma enhanced chemical vapor deposition…”
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    Journal Article
  7. 7

    Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR by Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, Ph, Laffon, C., Angleraud, B., Tessier, P.Y., Minea, T.M.

    Published in Diamond and related materials (01-09-2009)
    “…The impact of the temperature on the local structure of carbon nitride coating a-C 1-x N x:H was investigated by spectroscopic analysis. A set of carbon…”
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    Journal Article
  8. 8

    Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth by Minea, T.M., Point, S., Gohier, A., Granier, A., Godon, C., Alvarez, F.

    Published in Surface & coatings technology (01-10-2005)
    “…In this paper, we studied the effect of oxygen on the catalyst activity and related influence on the nanotubes (CNTs) growth by low-pressure/high-density…”
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    Journal Article Conference Proceeding
  9. 9

    Oriented carbon nanostructures containing nitrogen obtained by ion beam assisted deposition by Paredez, P, Figueroa, C A, Zagonel, L F, Reichert, F R, Ribeiro, C R M, Point, S, Godon, C, Minea, T M, Alvarez, F

    Published in Journal of nanoscience and nanotechnology (01-02-2005)
    “…In this paper, we report the deposition of graphite multilayer containing nitrogen covering nanometric nickel particles. In-situ photoelectron emission…”
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    Journal Article
  10. 10

    On Recycling in High Power Impulse Magnetron Sputtering Discharges by Gudmundsson, J. T., Lundin, D., Raadu, M. A., Petty, T. J., Minea, T. M., Brenning, N.

    “…The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma assisted physical vapor deposition (PVD) methods. Then a high…”
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    Conference Proceeding
  11. 11

    Model for power coupled to RF planar magnetrons. Experimental validation and application to CNx thin film deposition by Minea, T.M., Angleraud, B., Mubumbila, N., Tessier, P.-Y., Turban, G.

    Published in Surface & coatings technology (01-09-2003)
    “…We focus here on the particular case of radio frequency (RF-13.56 MHz) planar magnetrons from fundamental point of view, which is supported by experiments. The…”
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    Journal Article
  12. 12

    Evolution of the two-dimensional axisymmetric charged particle density in a radio frequency planar magnetron via a PIC-MCC simulation by Minea, T.M., Bretagne, J., Gousset, G.

    Published in IEEE transactions on plasma science (01-02-1999)
    “…A two-dimensional (2-D) time resolved PIC-MCC simulation implemented on a parallel machine is developed for the modeling of an RF planar magnetron discharge…”
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    Journal Article
  13. 13

    Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition by Gohier, A., Minea, T.M., Djouadi, M.A, Jiménez, J., Granier, A.

    “…Single-wall, double walled or few walled nanotubes (FWNT) are grown by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) at…”
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    Journal Article Conference Proceeding
  14. 14

    Limits of the PECVD process for single wall carbon nanotubes growth by Gohier, A., Minea, T.M., Djouadi, A.M., Granier, A., Dubosc, M.

    Published in Chemical physics letters (03-04-2006)
    “…This Letter explores the capabilities of plasma enhanced chemical vapor deposition to grow vertical oriented single wall, double wall or multi walled carbon…”
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    Journal Article
  15. 15

    ERDA and Structural Characterization of Oriented Multiwalled Carbon Nanotubes by Gohier, A, Point, S, Djouadi, M. A, Granier, A, Minea, T. M, Kreissig, U, Abrasonis, G, Kolitsch, A, Möller, W

    Published in Journal of physical chemistry. C (19-07-2007)
    “…Oriented multiwalled carbon nanotubes have been synthesized by distributed electron cyclotron resonance plasma enhanced chemical vapor deposition. Elastic…”
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    Journal Article
  16. 16

    Single- and few-walled carbon nanotubes grown at temperatures as low as 450 degrees c: electrical and field emission characterization by Gohier, A, Djouadi, M A, Dubosc, M, Granier, A, Minea, T M, Sirghi, L, Rossi, F, Paredez, P, Alvarez, F

    Published in Journal of nanoscience and nanotechnology (01-09-2007)
    “…Single-wall (SW-) and few-walled (FW-) carbon nanotubes (CNTs) were synthesized on aluminum/ cobalt coated silicon at temperatures as low as 450 degrees C by…”
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    Journal Article
  17. 17

    On the electron energy distribution function in the high power impulse magnetron sputtering discharge by Rudolph, Martin, Revel, A, Lundin, D, Hajihoseini, H, Brenning, N, Raadu, M. A, Anders, A, Minea, T. M, Gudmundsson, J. T

    Published 19-03-2021
    “…We apply the Ionization Region Model (IRM) and the Orsay Boltzmann equation for ELectrons coupled with Ionization and eXcited states kinetics (OBELIX) model to…”
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    Journal Article
  18. 18

    Target ion and neutral spread in high power impulse magnetron sputtering by Hajihoseini, H., Brenning, N., Rudolph, M., Raadu, M. A., Lundin, D., Fischer, J., Minea, T. M., Gudmundsson, J. T.

    “…In magnetron sputtering, only a fraction of the sputtered target material leaving the ionization region is directed toward the substrate. This fraction may be…”
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    Journal Article
  19. 19

    PIC-MCC simulation of a r.f. planar magnetron discharge and comparison with experiment by Minea, T.M., Bretagne, J., Gousset, G., Magne, L., Pagnon, D., Touzeau, M.

    Published in Surface & coatings technology (01-09-1999)
    “…A two-dimensional time-resolved PIC-MCC simulation was developed for the self-consistent modelling of planar r.f. magnetron reactor. Computation results such…”
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    Journal Article
  20. 20

    Nanoaperture formation at metal covered tips by microspark optimizedfor near-field optical probes by Chaigneau, M., Louarn, G., Minea, T. M.

    Published in Applied physics letters (03-03-2008)
    “…A simple and reproducible method for nanoaperture opening of metal film covered tapered optical fibers is reported as the last step of the manufacturing…”
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    Journal Article