Influence of corona discharge on holographic recording of diffraction gratings in Cu–chalcogenide film structures

The influence of corona discharge on holographic recording of gratings in Cu–As2Se3 and Cu–As2S3 thin film structures was investigated. Applying of negative corona discharge during optical exposure leads to the increase of holographic sensibility of the investigated registration structures, and incr...

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Bibliographic Details
Published in:Journal of non-crystalline solids Vol. 438; pp. 7 - 9
Main Authors: Nastas, A.M., Iovu, M.S., Prisacar, A.M., Meshalkin, A.Yu, Sergeev, S.A.
Format: Journal Article
Language:English
Published: Elsevier B.V 15-04-2016
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Summary:The influence of corona discharge on holographic recording of gratings in Cu–As2Se3 and Cu–As2S3 thin film structures was investigated. Applying of negative corona discharge during optical exposure leads to the increase of holographic sensibility of the investigated registration structures, and increases the diffraction efficiency of recorded gratings. Accordingly, the relief of the diffraction gratings formed by chemical etching of such patterns, recorded under action of negative corona discharge, exhibits much higher values of diffraction efficiency in comparison with the case without corona. •The influence of corona discharge on holographic recording of gratings in Cu-As2Se3/As2S3 thin film structures was studied.•Applying of negative corona discharge during optical exposure leads to increasing of holographic sensibility.•Applying of positive corona discharge leads to decreasing of diffraction efficiency.
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content type line 23
ISSN:0022-3093
1873-4812
DOI:10.1016/j.jnoncrysol.2016.02.004