Search Results - "Matsunobe, T."

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  1. 1

    Infrared analysis of depth profiles in UV-photochemical degradation of polymers by Nagai, N., Matsunobe, T., Imai, T.

    Published in Polymer degradation and stability (01-05-2005)
    “…Photochemical degradation of commercially available polymers after ultra-violet irradiation was investigated using the infrared ATR method with the view of…”
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    Journal Article
  2. 2

    Characterization of fluorine-doped silicon dioxide films by Raman spectroscopy and Electron-spin resonance by Matsuda, K., Yamaguchi, Y., Morita, N., Matsunobe, T., Yoshikawa, M.

    Published in Thin solid films (01-06-2007)
    “…We have measured Raman and Electron-spin resonance (ESR) spectra of fluorine-doped SiO 2 films deposited by two different methods. In high-density plasma (HDP)…”
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    Journal Article
  3. 3

    Defect characterization of Si-doped GaN films by a scanning near-field optical microscope-induced photoluminescence by Yoshikawa, M., Sugie, R., Murakami, M., Matsunobe, T., Matsuda, K., Ishida, H.

    Published in Applied physics letters (17-04-2006)
    “…We developed a tapping-mode-scanning near-field optical microscope to measure near-field photoluminescence (SNOM-PL) with nanometer spatial resolution using an…”
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    Journal Article
  4. 4
  5. 5

    Characterization of fluorine-doped silicon dioxide film by Raman spectroscopy by Yoshikawa, M., Iwagami, K., Morita, N., Matsunobe, T., Ishida, H.

    Published in Thin solid films (21-11-1997)
    “…We have measured Raman spectra of fluorine-doped SiO 2 (SiOF) films and quartz glass. From a comparison between Raman spectra of the SiO 2 film and quartz…”
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    Journal Article
  6. 6

    Epitaxial growth of α-copper phthalocyanine crystal on Si(001) substrate by organic molecular beam deposition by Nonaka, T., Nakagawa, Y., Mori, Y., Hirai, M., Matsunobe, T., Nakamura, M., Takahagi, T., Ishitani, A., Lin, H., Koumoto, K.

    Published in Thin solid films (01-02-1995)
    “…Copper phthalocyanine (CuPc) films were grown on Si(001) substrates at temperatures between 483 K and 150 K by organic molecular beam deposition under…”
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    Journal Article