Search Results - "Matay, L"

Micromachined membrane structures for pressure sensors based on AlGaN/GaN circular HEMT sensing device by Lalinský, T., Hudek, P., Vanko, G., Dzuba, J., Kutiš, V., Srnánek, R., Choleva, P., Vallo, M., Držík, M., Matay, L., Kostič, I.

“…[Display omitted] ► We designed a pressure sensor based on circular high electron mobility transistor. ► The 1.9μm thick AlGaN/GaN membrane is fabricated by…”
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Fabrication process development for a high sensitive electrochemical IDA sensor by Partel, S., Mayer, M., Hudek, P., Dinçer, C., Kieninger, J., Urban, G.A., Motzek, K., Matay, L.

“…[Display omitted] ► Mask aligner exposure simulation of interdigitated electrode arrays can reduce exposure test time and lead to reduce feature size. ► The…”
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GaAs based micromachined thermal converter for gas sensors by Lalinský, T., Držík, M., Jakovenko, J., Vanko, G., Mozolová, Ž., Haščík, Š., Chlpík, J., Hotový, I., Řeháček, V., Kostič, I., Matay, L., Husák, M.

“…The micromachining technology and an electro-thermo-mechanical performance analysis of GaAs based micromachined thermal converter (MTC) device to be designed…”
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Properties of nano-scaled disperse media investigated by refractometric measurements by Sarov, Y., Capek, I., Janíc˘ková, S., Kostic˘, I., Konec˘níková, A., Matay, L., Sarova, V.

“…This work presents the applications of the method of the disappearing diffraction pattern (one recently developed critical angle type method) for…”
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Advanced patterning techniques for nanodevice fabrication by KOSTIC, I, ANDOK, R, BARAK, V, CAPLOVIC, I, KONECNIKOVA, A, MATAY, L, HRKUT, P, RITOMSKY, A

“…The key elements in the fabrication of future devices are lithography and pattern transfer. The continuous advances in miniaturization and increasing…”
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Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask by Dreeskornfeld, L., Haindl, G., Kleineberg, U., Heinzmann, U., Shi, F., Volland, B., Rangelow, I.W., Majkova, E., Luby, S., Kostic, Matay, L., Hrkut, P., Hudek, P., Lee, Hsin-Yi

“…Recently, Mo/Si multilayer reflectors have been gaining industry interest as a promising choice for the next generation extreme ultraviolet mask material for…”
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Studies of dielectric characteristics of spin-coated polyimide films by Matay, L.

“…Dielectric properties of HTR-3 and PAAC-16 polyimide thin films with thickness ranging from 0.95 to 2.4 /spl mu/m have been measured in the frequency range…”
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T-shaped gates for heterostructure field effect transistors by Lalinský, T., Škriniarová, J., Kostič, I., Hart van der, A., Hrkút, P., Haščı́k, Š., Matay, L., Mozolová, Ž., Kordoš, P.

“…Two different approaches for the HFET's T-shaped gate fabrication are presented. Besides the conventional approach based on the three-layer resist structure a…”
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Polyimide-fixed GaAs Island structure prepared using plasma etching technique by Haščík, Š., Lalinský, T., Krnáč, M., Mozolová, Ž., Matay, L., Hrkút, P., Hotový, I.

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Assembling of nanoparticle arrays using microelectromagnetic matrix by Chitu, L., Luby, S., Majkova, E., Hrkut, P., Matay, L., Kostic, I., Satka, A.

“…Regular 2D-arrays from magnetic nanoparticle (NP) colloidal solutions were formed on the surface of a microelectromagnetic matrix chip with local…”
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Mechanically fixed and thermally insulated micromechanical structures for GaAs heterostructure based MEMS devices by Lalinsky´, T, Haš ík, S, Mozolová, ., Burian, E, Krná, M, Tomáška, M, Škriniarová, J, Drz ík, M, Kostic, I, Matay, L

“…A new micromachining technology of mechanically fixed and thermally insulated cantilevers, bridges and islands was developed to be used for design of GaAs…”
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Material optimization of the alignment marks for the EBDW lithography by Matay, L, Andok, R, Barák, V, Ritomský, A, Konečniková, A, Kostič, I, Partel, S, Hudek, P

“…We present results of material optimization for the alignment marks used in the Electron-Beam Direct-Write (EBDW) lithography. Such marks have been proposed…”
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Patterning of nanometer structures by using direct-write e-beam lithography for the sensor development by Ďurina, P, Štefečka, M, Roch, T, Noskovič, J, Trgala, M, Pidík, A, Kostič, I, Konečniková, A, Matay, L, Kúš, P, Plecenik, P

“…In this work, the optimalisation of e-beam parameters and the writing strategy have been performed. Various positive and negative e-beam resists have been…”
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RIE of the polyimide micromechanical structures by Matay, L., Kostic, I., Hrkut, P., Andok, R.

“…Polyimides are commercially available materials which are widely used in various aspects of microelectronics. In this work, we show the use of a polyimide as a…”
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T-shaped gate based on poly Si/polyimide supported layers by Lalinsky, T., Hrkut, P., Matay, L., Kostic, I., Hascik, S., Hudek, P.

“…A novel poly Si/polyimide dielectric bilayer system was designed to form a T-shaped gate on GaAs substrate using a two-step direct writing electron-beam…”
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The influence of patterned substrates on structure and magnetism of Au/Co multilayers by Angelakeris, M., Papaioannou, E.Th, Valassiades, O., Vouroutzis, N., Tsiaoussis, I., Mueller, Ch, Fumagalli, P., Kostic, I., Matay, L., Flevaris, N.K.

“…The structure and magnetism of Au/Co multilayers grown on patterned substrates are investigated. The structure and morphology are studied by means of X-ray…”
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Estimation of exposure parameters of chosen e-beam resists using variable shaped e-beam pattern generator by Andok, R., Matay, L., Kostic, I., Bencurova, A., Nemec, P., Konecnikova, A., Ritomsky, A.

“…In this article we present results from lithography experiments on PMMA (positive tone), and HSQ Fox-12 and SU-8 (negative tone) resists carried out on the ZBA…”
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New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool by Matay, L., Andok, R., Barak, V., Konecnikova, A., Kostic, I., Partel, S., Hudek, P.

“…The use of a new progressive method suitable for the exposure optimization is investigated for large and complex defect-free chips direct written by ZBA 21…”
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Microelectromagnetic matrix for local assembling of magnetic nanoparticles by Luby, S., Chitu, L., Majkova, E., Senderak, R., Kosticb, I., Hrkut, P., Matay, L., Hascik, S., Lalinsky, T., Capek, L., Satka, A.

“…Microelectromagnetic matrix fabricated by lithography patterning on Si chip for the manipulation and assembling of nanoparticles (NP) by local magnetic field…”
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