Search Results - "Martino, João A."
-
1
Influence of 60-MeV Proton-Irradiation on Standard and Strained n- and p-Channel MuGFETs
Published in IEEE transactions on nuclear science (01-08-2012)“…In this work the proton irradiation influence on Multiple Gate MOSFETs (MuGFETs) performance is investigated. This analysis was performed through basic and…”
Get full text
Journal Article -
2
The Dependence of Retention Time on Gate Length in UTBOX FBRAM With Different Source/Drain Junction Engineering
Published in IEEE electron device letters (01-07-2012)“…The floating-body-RAM sense margin and retention-time dependence on the gate length is investigated in UTBOX devices using BJT programming combined with a…”
Get full text
Journal Article -
3
Impact of Schottky contacts on p-type back enhanced SOI MOSFETs
Published in Solid-state electronics (01-07-2020)“…A simple model is proposed for the Back Enhanced SOI MOSFET in triode region. This model is based on a conventional MOSFET model in series with resistors and…”
Get full text
Journal Article -
4
Analog Figures of Merit of Vertically Stacked Silicon Nanosheets nMOSFETs With Two Different Metal Gates for the Sub-7 nm Technology Node Operating at High Temperatures
Published in IEEE transactions on electron devices (01-07-2021)“…The analysis of vertically stacked nanosheet (NS) n-type transistors with two different metal gate-stacks (with a total thickness of 7.5 and 4.7 nm) is…”
Get full text
Journal Article -
5
GR-Noise Characterization of Ge pFinFETs With STI First and STI Last Processes
Published in IEEE electron device letters (01-09-2016)“…This letter characterizes the generation- recombination noise of Ge pFinFETs, for three different integration schemes: shallow trench isolation (STI) first…”
Get full text
Journal Article -
6
Proposal of a process design methodology of Fully depleted SOI nMOSFET using only three photolithograph steps for educational application
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01-09-2014)“…This paper presents, for the first time in Latin America, a simple process design methodology of Fully Depleted (FD) Silicon-On-Insulator (SOI) nMOSFET for…”
Get full text
Conference Proceeding -
7
Drain induced barrier thinning on TFETs with different source/drain engineering
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01-09-2014)“…The goal of this work is to study the effect of high drain voltage bias on short channel devices of tunnel field effect transistors (TFETs). This work will…”
Get full text
Conference Proceeding -
8
Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01-09-2014)“…This paper investigates the silicon film thickness influence on extensionless Ultra Thin Body and Buried Oxide (UTBB) FDSOI devices applied in a dynamic…”
Get full text
Conference Proceeding -
9
Graphene for advanced devices applications
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01-09-2014)“…In this work, the behavior of the different types of graphene transistors in relation to the number of stacked layers are investigated as well as the influence…”
Get full text
Conference Proceeding -
10
The effect of X-Ray radiation dose rate on Triple-Gate SOI FinFETs parameters
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01-09-2014)“…In this work, the effect of the X-Ray radiation dose rate on n and p Triple-Gate SOI FinFET device characteristics is investigated. The threshold voltage…”
Get full text
Conference Proceeding -
11
Semiconductor film band gap influence on retention time of UTBOX SOI 1T-DRAM using pulsed back gate bias
Published in 28th Symposium on Microelectronics Technology and Devices (SBMicro 2013) (01-09-2013)“…This paper aims to analyze the band gap and the pulsed back gate bias influence on the retention time of an UTBOX SOI applied as a 1T-DRAM memory cell. This…”
Get full text
Conference Proceeding -
12
Fully electron-beam-lithography SOI FinFET
Published in 28th Symposium on Microelectronics Technology and Devices (SBMicro 2013) (01-09-2013)“…This paper presents, for the first time in Latin America, a triple gate FinFET (also called 3D Transistor) fabrication process using only three lithograph…”
Get full text
Conference Proceeding -
13
Two-sided read window observed on UTBOX SOI 1T-DRAM
Published in 28th Symposium on Microelectronics Technology and Devices (SBMicro 2013) (01-09-2013)“…This paper analyzes the read windows of decananometer UTBOX SOI 1T-DRAM memory devices focusing on the mechanisms involved as a function of the applied gate…”
Get full text
Conference Proceeding -
14
Radiation effect on standard and strained triple-gate SOI FinFETs parasitic conduction
Published in 28th Symposium on Microelectronics Technology and Devices (SBMicro 2013) (01-09-2013)“…In this work, the X-ray irradiation influence on the back gate conduction and its impact on the drain current characteristic of Triple-Gate SOI FinFET are…”
Get full text
Conference Proceeding -
15
Experimental Analysis of MISHEMT Multiple Conductions from 200K to 450K
Published in 2022 36th Symposium on Microelectronics Technology (SBMICRO) (22-08-2022)“…In this work, the multiple conductions of a GaN based Metal-Insulator-Semiconductor High Electron Mobility Transistor (MISHEMT) when operating in a temperature…”
Get full text
Conference Proceeding -
16
Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms
Published in 2023 37th Symposium on Microelectronics Technology and Devices (SBMicro) (28-08-2023)“…The drain current in the Metal-Insulator-Semiconductor High Electron Mobility Transistor (MISHEMT) is studied as a function of AlGaN barrier layer thickness,…”
Get full text
Conference Proceeding -
17
Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs
Published in 2023 37th Symposium on Microelectronics Technology and Devices (SBMicro) (28-08-2023)“…In this paper the Omega-gate nanowire (NW) transistor applied for designing Operational Transconductance Amplifier (OTA) is studied, focusing mainly on the…”
Get full text
Conference Proceeding -
18
Uniaxially strained silicon influence on Two-stage Operational Transconductance Amplifiers designed with SOI FinFET's
Published in 2022 36th Symposium on Microelectronics Technology (SBMICRO) (22-08-2022)“…This paper analyzes the influence of uniaxially strained silicon on two-stage operational transconductance amplifiers (OTA) designed with SOI FinFETs. The OTA…”
Get full text
Conference Proceeding -
19
Trade-off between channel length and mechanical stress in the Operational Transconductance Amplifier designed with SOI FinFET
Published in 2023 37th Symposium on Microelectronics Technology and Devices (SBMicro) (28-08-2023)“…In this paper, the trade-off between transistor channel length and the presence (or not) of the uniaxially strained SOI FinFETs for designing Operational…”
Get full text
Conference Proceeding -
20
Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET
Published in 2023 37th Symposium on Microelectronics Technology and Devices (SBMicro) (28-08-2023)“…This paper studies experimentally the influence of the N+ doped source/drain regions on the back enhanced with separate contacts SOI MOSFET ( BE SOI SC MOSFET)…”
Get full text
Conference Proceeding