Search Results - "Martin, Russel A."
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51.1: Integrated Touch Sensing and Frontlighting Device and Display Applications
Published in SID International Symposium Digest of technical papers (01-06-2013)“…A novel device architecture is introduced which enables projected capacitive touch sensing and front illumination in a single substrate configuration. The…”
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Journal Article -
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20.4: Distinguished Paper: Optimizing the Brightness of Reflective Displays in Mobile Applications
Published in SID International Symposium Digest of technical papers (01-06-2011)“…Reflective display brightness is studied in mobile devices as a function of relevant ambient conditions, supplemental frontlight illumination, and display…”
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Bioimpedance Method for Human Body Hydration Assessment
Published in 2019 41st Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC) (01-07-2019)“…A high-precision wearable bioimpedance sensor developed at Imec was extensively tested. Unlike known bioimpedance sensors on the market, the new device enables…”
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Conference Proceeding Journal Article -
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Amorphous silicon shift register for addressing output drivers
Published in IEEE journal of solid-state circuits (01-05-1994)“…An amorphous silicon (a-Si) shift register is described. By integrating this shift register design with an array of a-Si drivers, the cost/complexity of the…”
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26.1: Invited Paper: Driving mirasol® Displays: Addressing Methods and Control Electronics
Published in SID International Symposium Digest of technical papers (01-06-2011)“…A mirasol display uses optical interference based MEMS pixels with inherent hysteresis and is therefore passively addressable with a near zero power hold…”
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Hot-electron-induced punchthrough (HEIP) effect in submicrometer PMOSFET's
Published in IEEE transactions on electron devices (01-04-1987)“…Degradation of device characterisitics due to hot-carrier injection in submicrometer PMOSFET has been investigated. We found that in submicrometer p-channel…”
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Latchup performance of retrograde and conventional n-well CMOS technologies
Published in IEEE transactions on electron devices (01-10-1987)“…The static and transient latchup performance of conventional and retrograde n-well CMOS technologies is compared. The retrograde n-well structures are shown to…”
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Punchthrough current for submicrometer MOSFETs in CMOS VLSI
Published in IEEE transactions on electron devices (01-02-1988)“…Simulated and measured data show that drain-induced barrier lowering (DIBL) in buried-channel MOSFETs is different from that in surface channel (SC) MOSFETs…”
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Optimized retrograde N-well for 1-μm CMOS technology
Published in IEEE journal of solid-state circuits (01-04-1986)Get full text
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A new LDD transistor with inverse-T gate structure
Published in IEEE electron device letters (01-04-1987)“…A new submicrometer inverse-T lightly doped drain (ITLDD) transistor structure for alleviating hot-electron effects is demonstrated. A thin extension of the…”
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Device isolation in high-density LOCOS-isolated CMOS
Published in IEEE transactions on electron devices (01-06-1987)“…Leakage paths between n- and p-channel devices in high packing density CMOS circuits fabricated using standard LOCOS isolation are investigated. Experimental…”
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Vertical isolation in shallow n-well CMOS circuits
Published in IEEE electron device letters (01-03-1987)“…This letter examines vertical punchthrough in a shallow conventional n-well suitable for use in high-packing-density VLSI CMOS circuits. It is shown that full…”
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Scaling CMOS Technologies with Constant Latch-Up Immunity
Published in 1986 Symposium on VLSI Technology. Digest of Technical Papers (01-05-1986)“…High performance CMOS circuits can be realized by scaling device dimensions into the sub-micron range. However, this also improves the performance of the…”
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Conference Proceeding -
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850V NMOS driver with active outputs
Published in 1984 International Electron Devices Meeting (1984)“…This paper describes a unique second generation fully integrated NMOS device operating at up to 850V. The 5.46×5.26 mm 2 chip consists of 16 pull-up/pull-down…”
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Conference Proceeding -
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Intrinsic capacitance of amorphous silicon and polysilicon thin film transistors
Published in International Technical Digest on Electron Devices Meeting (1989)“…Results on the capacitance of thin-film transistors (TFTs) as a function of gate and drain voltage are shown. Measurements of amorphous silicon (a-Si) TFTs are…”
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Conference Proceeding -
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Device design considerations of a novel high voltage amorphous silicon thin film transistor
Published in 1987 International Electron Devices Meeting (1987)“…The performance of a novel high voltage thin film transistor has been characterized in terms of its geometry and operating conditions. Excellent performance,…”
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Conference Proceeding -
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Enhancement of performance and reliability of amorphous silicon high voltage thin film transistors by use of field plates
Published in International Technical Digest on Electron Devices Meeting (1989)“…An enhancement to the amorphous silicon (a-Si) high-voltage thin-film transistor (HVTFT) is described. With the addition of a field plate over a portion of the…”
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Conference Proceeding -
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High voltage NMOS switching array with active pull-ups and low voltage addressing logic
Published in 1982 International Electron Devices Meeting (1982)“…This paper describes a unique, fully integrated NMOS device capable of operation at 500 volts. The chip consists of 16 active, pull-up devices, 16…”
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Conference Proceeding