Search Results - "Mantei, T."

Emotion and space: lateralized emotional word detection depends on line bisection bias by Tamagni, C, Mantei, T, Brugger, P

“…Abstract There is converging evidence, from various independent areas of neuroscience, for a functional specialization of the left and right cerebral…”
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Lymphangioma of the tongue by Meichtry, S C, Mantei, T

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Plasma-enhanced deposition of hard silicon nitride-like coatings from hexamethyldisiloxane and ammonia by Xiao, Z.G., Mantei, T.D.

“…Hard silicon nitride-like coatings have been grown in a high-density microwave electron cyclotron resonance discharge, using hexamethyldisiloxane (HMDSO) as…”
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Pulse-modulated plasma-enhanced chemical vapor deposition of SiO2 coatings from octamethylcyclotetrasiloxane by Qi, Yu, Mantei, T.D

“…Silicon dioxide coatings can be grown at low substrate temperatures in a pulse-modulated microwave electron cyclotron resonance (ECR) oxygen plasma with…”
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Deposition of hard metal nitride-like coatings in an electron cyclotron resonance discharge by Xiao, Z.G., Mantei, T.D.

“…Hard titanium, zirconium and chromium nitride-like coatings were grown in a high-density microwave electron cyclotron resonance discharge. The organometallic…”
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Extending two-element capacitance extraction method toward ultraleaky gate oxides using a short-channel length by Jung-Suk Goo, Mantei, T., Wieczorek, K., En, W.G., Icel, A.B.

“…This letter demonstrates that the conventional two-element lumped model can provide valid capacitance-voltage (C-V ) characteristics for gate oxides with large…”
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Impact of physical and electrical thickness scaling on the reliability of plasma-nitrided gate dielectrics in a 90 nm SOI manufacturing technology by Geilenkeuser, R., Wieczorek, K., Mantei, T., Graetsch, F., Herrmann, L., Weidner, J.-O.

“…Appropriate balancing of the polysilicon dopant concentration and the physical gate dielectric thickness is required so as to accomplish a minimized…”
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Comparison of silicon dioxide layers grown from three polymethylsiloxane precursors in a high-density oxygen plasma by Qi, Y., Xiao, Z. G., Mantei, T. D.

“…We have compared the elemental composition, growth rates, and hardness of silicon dioxide layers grown from hexamethyldisiloxane (HMDSO),…”
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Application-driven development of plasma source technology by Hopwood, J., Mantei, T. D.

“…This article reviews major developments in etch- and deposition-driven plasma source technology over the past decades. We first review the radio-frequency…”
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Plasma-assisted growth of bilayer silicon-containing coatings for hardness and corrosion resistance by Xiao, Z. G., Mantei, T. D.

“…Hard corrosion-resistant bilayer coatings were grown in a high-density microwave electron cyclotron resonance discharge. The bilayer coatings consist of a…”
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Performance and modeling of a permanent magnet electron cyclotron resonance plasma source by Saproo, A., Mantei, T. D.

“…A plasma etch reactor with a permanent magnet electron cyclotron resonance (ECR) source and multipolar process chamber has been characterized with plasma…”
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Low temperature and low pressure diamond synthesis in a microwave electron cyclotron resonance discharge by CHANG, J. J, MANTEI, T. D, RAMA VUPPULADHADIUM, JACKSON, H. E

“…High quality diamond films have been grown at low temperature (540–650 °C) and low pressure (2–20 Torr) in a microwave electron cyclotron resonance CH4-O2-H2…”
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Diamond deposition in a permanent magnet microwave electron cyclotron resonance discharge by Mantei, T. D., Chang, J. J.

“…Diamond deposition has been investigated in a magnetoactive microwave discharge, in which a collisionally damped electron cyclotron resonance (ECR) is…”
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Anisotropic highly selective electron cyclotron resonance plasma etching of polysilicon by Gadgil, P. K., Dane, D., Mantei, T. D.

“…High polysilicon etch rates have been obtained in combination with high etch selectivities with respect to SiO2 and photoresist in a microwave electron…”
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UV laser deposition of metal films by photogenerated free radicals by Montgomery, R. K., Mantei, T. D.

“…A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a…”
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Low-temperature plasma deposition of dielectric coatings from organosilicon precursors by Lin, C.-T., Li, F., Mantei, T. D.

“…Silicon dioxide coatings have been grown with deposition rates up to 0.7 μm/min and substrate temperatures from 80 to 140 °C in a high-density microwave…”
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Parametric modeling and measurement of silicon etching in a high density chlorine plasma by Dane, D., Mantei, T. D.

“…The plasma parameter scaling of silicon etching in a high density chlorine discharge has been measured and described by an ion assisted etch model. The…”
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Optimization of diamond growth with statistical experiment design in an electron cyclotron resonance plasma by Ring, Z., Mantei, T. D., Choo, A. G., Jackson, H. E.

“…Multivariable statistically designed experiments have been used to optimize diamond growth in a H2-CH4-O2 magnetoactive plasma at 1–3 Torr total pressure. The…”
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Characterization of a permanent magnet electron cyclotron resonance plasma source by Mantei, T. D., Dhole, S.

“…Experimental details and results are presented for a permanent magnet electron cyclotron resonance plasma source matched to a multipolar confined process…”
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Selective and uniform high rate etching of polysilicon in a magnetically confined microwave discharge by Gadgil, P., Dane, D., Mantei, T. D.

“…An electron cyclotron resonance plasma reactor with multipolar magnetic confinement has been characterized for potential applications in polysilicon gate…”
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