Search Results - "Manfrinato, Vitor R"
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Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
Published in Nano letters (10-04-2013)“…We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5…”
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2
Anisotropic Etching and Nanoribbon Formation in Single-Layer Graphene
Published in Nano letters (08-07-2009)“…We demonstrate anisotropic etching of single-layer graphene by thermally activated nickel nanoparticles. Using this technique, we obtain sub-10-nm nanoribbons…”
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3
Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
Published in Nano letters (09-08-2017)“…Patterning materials efficiently at the smallest length scales is a longstanding challenge in nanotechnology. Electron-beam lithography (EBL) is the primary…”
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4
High-Energy Surface and Volume Plasmons in Nanopatterned Sub-10 nm Aluminum Nanostructures
Published in Nano letters (13-07-2016)“…In this work, we use electron energy-loss spectroscopy to map the complete plasmonic spectrum of aluminum nanodisks with diameters ranging from 3 to 120 nm…”
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Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design
Published in Advanced functional materials (01-12-2019)“…Patterning of materials at single nanometer resolution allows engineering of quantum confinement effects, as these effects are significant at these length…”
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6
Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function
Published in Nano letters (13-08-2014)“…One challenge existing since the invention of electron-beam lithography (EBL) is understanding the exposure mechanisms that limit the resolution of EBL. To…”
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1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019)
Published in Advanced functional materials (01-12-2019)“…In article number 1903429, Vitor R. Manfrinato, Fernando E. Camino, and co‐workers achieve 1‐nm resolution Si patterning using aberration‐corrected…”
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8
Neon Ion Beam Lithography (NIBL)
Published in Nano letters (12-10-2011)“…Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not…”
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9
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published in Journal of visualized experiments (14-09-2018)“…We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by…”
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10
The Orientations of Large Aspect-Ratio Coiled-Coil Proteins Attached to Gold Nanostructures
Published in Small (Weinheim an der Bergstrasse, Germany) (01-03-2016)“…Methods for patterning biomolecules on a substrate at the single molecule level have been studied as a route to sensors with single‐molecular sensitivity or as…”
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11
Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist
Published in Microelectronic engineering (01-10-2011)“…We fabricated 9–30 nm half-pitch nested Ls and 13–15 nm half-pitch dot arrays, using 2 keV electron-beam lithography with hydrogen silsesquioxane (HSQ) as the…”
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12
Patterning Si at the 1 nm Length Scale with Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design
Published in Advanced functional materials (08-07-2019)“…Patterning of materials at single nanometer resolution allows engineering of quantum confinement effects, as these effects are significant at these length…”
Get full text
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13
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published in Journal of visualized experiments (14-09-2018)Get full text
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14
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
Published in Nano letters (19-03-2013)Get full text
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15
Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function
Published in Nano letters (30-06-2014)“…One challenge existing since the invention of electron-beam lithography (EBL) is understanding the exposure mechanisms that limit the resolution of EBL. To…”
Get full text
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16
Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function
Published in Nano letters (30-06-2014)Get full text
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17
Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist
Published in Microelectronic engineering (01-10-2011)Get full text
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18
Neon Ion Beam Lithography (NIBL)
Published in Nano letters (12-10-2011)Get full text
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19
Single-molecule study on the orientation of coiled-coil proteins attached to gold nanostructures
Published 08-08-2015“…Methods for patterning biomolecules on a substrate at the single molecule level have been studied as a route to sensors with single-molecular sensitivity or as…”
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20
Designs for a Quantum Electron Microscope
Published 20-10-2015“…One of the astounding consequences of quantum mechanics is that it allows the detection of a target using an incident probe, with only a low probability of…”
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