Search Results - "Maciel, H.S."

Nanostructured thin films based on TiO2 and/or SiC for use in photoelectrochemical cells: A review of the material characteristics, synthesis and recent applications by Pessoa, R.S., Fraga, M.A., Santos, L.V., Massi, M., Maciel, H.S.

“…In solar energy harvesting research, there is growing interest in the study of photoelectrochemical (PEC) properties of the following classes of semiconductor…”
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Scratch testing for micro- and nanoscale evaluation of tribocharging in DLC films containing silver nanoparticles using AFM and KPFM techniques by Vieira, L., Lucas, F.L.C., Fisssmer, S.F., dos Santos, L.C.D., Massi, M., Leite, P.M.S.C.M., Costa, C.A.R., Lanzoni, E.M., Pessoa, R.S., Maciel, H.S.

“…Scratch testing is a fast and effective method for the measurement of critical loads in order to determine the adhesion properties of coatings and their…”
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Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase during hollow cathode reactive ion etching plasma by Tezani, L.L., Pessoa, R.S., Maciel, H.S., Petraconi, G.

“…In this work, mass spectrometry and optical emission spectroscopy techniques were used to monitor the molecular and atomic neutral species during SF6/CF4,…”
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Optical and morphological properties of N-doped TiO2 thin films by GRIGOROV, K. G, OLIVEIRA, I. C, MACIEL, H. S, MASSI, M, OLIVEIRA, M. S, AMORIM, J, CUNHA, C. A

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The effect of oxygen concentration on the low temperature deposition of TiO2 thin films by TOKU, H, PESSOA, R. S, MACIEL, H. S, MASSI, M, MENGUI, U. A

“…The aim of this study was to investigate the influence of oxygen concentration in Ar/O2 gas mixture on the crystalline properties of TiO2 thin films obtained…”
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Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon by Tezani, L.L., Pessoa, R.S., Moraes, R.S., Medeiros, H.S., Martins, C.A., Maciel, H.S., Petraconi Filho, G., Massi, M., da Silva Sobrinho, A. S.

“…In this work is proposed the automation of a gas injection (mass flow) system in order to generate timemultiplex SF6/CH4 radiofrequency plasma applied for…”
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High textured AlN thin films grown by RF magnetron sputtering; composition, structure, morphology and hardness by Oliveira, I.C, Grigorov, K.G, Maciel, H.S, Massi, M, Otani, C

“…High quality thin aluminum nitride (AlN) films have been deposited onto a silicon (1 0 0) substrate by radio frequency magnetron sputtering of a pure Al target…”
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The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films by Guerino, M., Massi, M., Maciel, H.S., Otani, C., Mansano, R.D., Verdonck, P., Libardi, J.

“…In this work a carbon target was sputtered by a methane/argon/nitrogen plasma in order to produce nitrogenated diamond-like carbon films (a-C:H:N). As the N 2…”
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Comparative studies of the feed gas composition effects on the characteristics of DLC films deposited by magnetron sputtering by Libardi, J, Grigorov, K, Massi, M, Otani, C, Ravagnani, S.P, Maciel, H.S, Guerino, M, Ocampo, J.M.J

“…Mixtures of acetylene/argon and methane/argon with different volume percents of hydrocarbon were used as the precursor gas to grow DLC films, keeping constant…”
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Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering by Mansano, R.D, Massi, M, Zambom, L.S, Verdonck, P, Nogueira, P.M, Maciel, H.S, Otani, C

“…In this work, hydrogenated carbon films were sputter deposited at low temperatures using different Ar–CH 4 mixtures. The deposition rate of the films increases…”
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Effects of non-steady state discharge plasma on natural gas combustion: Flammability limits, flame behavior and hydrogen production by Sagás, J.C., Maciel, H.S., Lacava, P.T.

“…•The discharge is the main source of H2 molecules, which are burned in the flame.•The flame occurs in cycles in gliding arc assisted combustion.•Under plasma,…”
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Dielectric characteristics of AlN films grown by d.c.-magnetron sputtering discharge by Oliveira, I.C, Massi, M, Santos, S.G, Otani, C, Maciel, H.S, Mansano, R.D

“…Aluminium nitride(AlN) films have attracted much interest as a promising opto-electronic material. In this work, AlN films were deposited on p-type silicon by…”
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TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process by Pessoa, R.S., dos Santos, V.P., Cardoso, S.B., Doria, A.C.O.C., Figueira, F.R., Rodrigues, B.V.M., Testoni, G.E., Fraga, M.A., Marciano, F.R., Lobo, A.O., Maciel, H.S.

“…[Display omitted] •Low temperature ALD TiO2 film on polymeric substrate for biomedical applications.•A signature quality of ALD of TiO2 films was obtained for…”
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Etching of DLC films using a low intensity oxygen plasma jet by Urruchi, W.I., Massi, M., Maciel, H.S., Otani, C., Nishioka, L.N.

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Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass by Chiappim, W., Testoni, G.E., Moraes, R.S., Pessoa, R.S., Sagás, J.C., Origo, F.D., Vieira, L., Maciel, H.S.

“…TiO2 thin films were deposited on FTO glass by ALD technique using titanium tetrachloride and water as precursors. A thorough investigation of the TiO2/FTO…”
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Plasma in-Liquid Using Non-contact Electrodes: A Method of Pretreatment to Enhance the Enzymatic Hydrolysis of Biomass by Miranda, F. S., Rabelo, S. C., Pradella, J. G. C., Carli, C. Di, Petraconi, G., Maciel, H. S., Pessoa, R. S., Vieira, L.

“…Dielectric Barrier Discharge (DBD) can be used to produce a large volume of non-thermal plasma at atmospheric pressure. Such plasmas are sources of highly…”
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Experimental Studies on Low-Pressure Plane-Parallel Hollow Cathode Discharges by Pessoa, R. S., Sagás, J. C., Rodrigues, B. V. M., Galvão, N. K. A. M., Fraga, M. A., Petraconi, G., Maciel, H.S.

“…Hollow cathode discharge (HCD) is widely used in material processing and plasma emission spectroscopy due to several advantages over other plasma sources…”
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The effects of plasma nitriding pretreatment in steel substrates on the photocatalytic activity of TiO2 films by Irala, D.R., Fontana, L.C., Sagás, J.C., Maciel, H.S.

“…This paper presents a comparative study of TiO2 films deposited on plasma nitrided and non-nitrided carbon steel substrates. It is well known that plasma…”
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Optical and morphological properties of N-doped TiO 2 thin films by Grigorov, K.G., Oliveira, I.C., Maciel, H.S., Massi, M., Oliveira, M.S., Amorim, J., Cunha, C.A.

“…Nitrogen doped titanium dioxide (TiO 2) thin films were deposited by RF magnetron sputtering onto various substrates. The films were prepared in plasma of…”
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Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique by Medeiros, H.S., Pessoa, R.S., Sagás, J.C., Fraga, M.A., Santos, L.V., Maciel, H.S., Massi, M., Sobrinho, A.S. da Silva, da Costa, M.E.H. Maia

“…Amorphous silicon oxycarbonitride (SiCxNyOz) films have been deposited on Si substrates by low temperature reactive magnetron co-sputtering of silicon and…”
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