Search Results - "MIRENGHI, L"

Improved properties of TiAlN coatings through the multilayer structure by Rizzo, A., Mirenghi, L., Massaro, M., Galietti, U., Capodieci, L., Terzi, R., Tapfer, L., Valerini, D.

“…TiAlN/AlN multilayers are attracting great interest for the possibility to modulate their mechanical and tribological properties through the variation of…”
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Thin films of Co–B prepared by pulsed laser deposition as efficient catalysts in hydrogen producing reactions by Patel, N., Guella, G., Kale, A., Miotello, A., Patton, B., Zanchetta, C., Mirenghi, L., Rotolo, P.

“…Hydrogen generation by catalytic hydrolysis of sodium borohydride (NaBH 4) is studied by using Co–B-based thin film catalyst synthesized by pulsed laser…”
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Synthesis and characterization of titanium and zirconium oxynitride coatings by Rizzo, A., Signore, M.A., Mirenghi, L., Di Luccio, T.

“…Thin films of zirconium oxynitride (ZrNO) and titanium oxynitride (TiNO) have been deposited onto Si(100) substrates at room temperature by radiofrequency…”
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Characterization of zirconium oxynitride films obtained by radio frequency magnetron reactive sputtering by Signore, M.A., Rizzo, A., Mirenghi, L., Tagliente, M.A., Cappello, A.

“…Thin ZrN x O y films are deposited on Si (100) substrates by radio frequency (RF) reactive magnetron sputtering of a zirconium target in an…”
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Sputtering deposition and characterization of zirconium nitride and oxynitride films by Rizzo, A., Signore, M.A., Mirenghi, L., Tapfer, L., Piscopiello, E., Salernitano, E., Giorgi, R.

“…The interest about zirconium oxynitrides is growing with the attention for zirconium nitrides phase at high zirconium content. In recent years a great progress…”
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Nano-crystalline Zr2ON2 thin films deposited by reactive magnetron sputtering by RIZZO, A, SIGNORE, M. A, MIRENGHI, L, CAPPELLO, A, TAPFER, L

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Nano-micro MgH2-Mg2NiH4 composites : Tayloring a multichannel system with selected hydrogen sorption properties by MONTONE, A, GRBOVIC NOVAKOVIC, J, VITTORI ANTISARI, M, BASSETTI, A, BONETTI, E, FIORINI, A. L, PASQUINI, L, MIRENGHI, L, ROTOLO, P

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Microstructure, surface properties and hydrating behaviour of Mg–C composites prepared by ball milling with benzene by Montone, A., Grbović, J., Bassetti, A., Mirenghi, L., Rotolo, P., Bonetti, E., Pasquini, L., Antisari, M. Vittori

“…Mg–graphite composites, suitable for hydrogen storage, have been synthesized by ball milling metallic Mg with different amounts of graphite and benzene. The…”
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Deposition and properties of ZrNx films produced by radio frequency reactive magnetron sputtering by Rizzo, A., A. Signore, M., Mirenghi, L., Dimaio, D.

“…Thin ZrNx films have been prepared by reactive radio frequency magnetron sputtering. The radio frequency power has been chosen as a sputtering parameter and…”
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Structural characterization of CdS nanoparticles grown in polystyrene matrix by thermolytic synthesis by Antolini, F., Pentimalli, M., Di Luccio, T., Terzi, R., Schioppa, M., Re, M., Mirenghi, L., Tapfer, L.

“…Cadmium sulfide nanoparticles embedded in a polystyrene matrix (CdS/PS) were successfully prepared by in situ thermolysis of a cadmium thiolate precursor…”
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Properties of ZrNx films with x>1 deposited by reactive radiofrequency magnetron sputtering by Rizzo, A., Signore, M.A., Mirenghi, L., Serra, E.

“…Thin ZrNx films have been prepared by reactive radiofrequency magnetron sputtering varying the nitrogen partial pressure in the range 0–3.26 Pa. The films have…”
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Tungsten trioxide (WO3) sputtered thin films for a NOx gas sensor by Penza, M, Tagliente, M.A, Mirenghi, L, Gerardi, C, Martucci, C, Cassano, G

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Direct synthesis of II-VI compound nanocrystals in polymer matrix by Antolini, F., Di Luccio, T., Laera, A. M., Mirenghi, L., Piscopiello, E., Re, M., Tapfer, L.

“…The production of II–VI semiconductor compound – polymer matrix nanocomposites by a direct in‐situ thermolysis process is described. Metal‐thiolate precursor…”
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SIMS study of TiN carbon implanted at high-fluences by Mello, D., Mirenghi, L., Falcone, R., Esposito, C.

“…Ion implantation of titanium nitrite (TiN) coatings attracts a great deal of attention because of the improvement of tribological resistance of the coating…”
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Physical characterization of hafnium oxide thin films and their application as gas sensing devices by Capone, S., Leo, G., Rella, R., Siciliano, P., Vasanelli, L., Alvisi, M., Mirenghi, L., Rizzo, A.

“…Thin films of hafnium oxide have been prepared by using a dual ion beam sputtering system. A study of their physical properties is reported. In particular,…”
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GaN thin films deposition by laser ablation of liquid Ga target in nitrogen reactive atmosphere by Dinescu, M., Verardi, P., Boulmer-Leborgne, C., Gerardi, C., Mirenghi, L., Sandu, V.

“…GaN thin films were deposited by laser ablation of liquid Ga target in nitrogen reactive atmosphere. An Nd-YAG laser ( λ=1.06 μm, τ FWHM=10 ns) of 0.35 J…”
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An XPS and XRD study of physical and chemical homogeneity of Pb(Zr,Ti)O 3 thin films obtained by pulsed laser deposition by Verardi, P., Craciun, F., Mirenghi, L., Dinescu, M., Sandu, V.

“…Pb(Zr,Ti)O 3 (PZT) oriented films deposited by laser ablation on Au(111)/Si(111) have been tested by different techniques for their physico-chemical…”
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Reactive bipolar pulsed dual magnetron sputtering of ZrN films: The effect of duty cycle by Rizzo, A., Valerini, D., Capodieci, L., Mirenghi, L., Di Benedetto, F., Protopapa, M.L.

“…•The ZrN coatings are realized by Reactive Bipolar Pulsed Magnetron Sputtering at 1.5kW-power.•Varying the value of the duty cycle from 50% to 20%, the IN/IZr…”
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Boron carbon nitride films deposited by sequential pulses laser deposition by Dinescu, M., Perrone, A., Caricato, A.P., Mirenghi, L., Gerardi, C., Ghica, C., Frunza, L.

“…In this paper, we report the successful growth of c-BCN thin films by reactive pulsed laser ablation (RPLA) of a rotating target (3 Hz) formed of two…”
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Low temperature growth of r.f. reactively planar magnetron-sputtered AlN films by Penza, M., De Riccardis, M.F., Mirenghi, L., Tagliente, M.A., Verona, E.

“…Polycrystalline AlN films were deposited on Si(100) and Si(111) substrates by sputtering in an N 2 + Ar gas mixture at a substrate temperature in the range…”
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