Process-Induced Variability of Nb/Al/AlOx/Nb Junctions in Superconductor Integrated Circuits and Protection Against It

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Bibliographic Details
Published in:	IEEE transactions on applied superconductivity Vol. 19; no. 3; pp. 135 - 139
Main Authors:	TOLPYGO, Sergey K, AMPARO, Denis, YOHANNES, Daniel T, MECKBACH, Max, KIRICHENKO, Alex F
Format:	Conference Proceeding
Language:	English
Published:	New York, NY Institute of Electrical and Electronics Engineers 01-06-2009
Subjects:	Applied sciences Design. Technologies. Operation analysis. Testing Electrical engineering. Electrical power engineering Electromagnets Electronics Exact sciences and technology Integrated circuits Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Superconducting devices Testing, measurement, noise and reliability Various equipment and components Interfacial layer Critical current density Impurity Josephson junction Hydrogen Superconductor circuit Multiple layer Josephson device fabrication Wiring Transport process Superconducting integrated circuits Manufacturing process Integrated circuit Testing equipment Nb/AlOx/Nb tunnel junctions Electrodiffusion Tunnel junction Gain Wafer Damaging Via hole
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Description
ISSN:	1051-8223 1558-2515
DOI:	10.1109/TASC.2009.2018253