Search Results - "MATSUNO, Noriaki"
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Low-Power Widely Tunable Gm-C Filter Employing an Adaptive DC-blocking, Triode-Biased MOSFET Transconductor
Published in IEEE transactions on circuits and systems. I, Regular papers (01-01-2014)“…We propose a transconductor capable of providing a wide continuous-tuning-range filter applicable to Bluetooth, W-CDMA, LTE, and IEEE 802.11a/b/g W-LANs…”
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2
A widely tunable CMOS Gm-C filter with a negative source degeneration resistor transconductor
Published in ESSCIRC 2004 - 29th European Solid-State Circuits Conference (IEEE Cat. No.03EX705) (2003)“…We propose a new negative source degeneration resistor (NSDR) transconductor to achieve a wide continuous-tuning range gm-C filter applicable for…”
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Conference Proceeding -
3
A 22nm 0.84mm2 BLE Transceiver With Self IQ-Phase Correction Achieving 39dB Image Rejection and on-Chip Antenna Impedance Tuning
Published in 2022 IEEE International Solid- State Circuits Conference (ISSCC) (20-02-2022)“…The IoT crucially requires a large number of low-cost and low-power wireless sensor nodes. BLE is a strong candidate for their wireless interface. Much effort…”
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Conference Proceeding -
4
Optical properties and structrue of SiO2 films prepared by ion-beam sputtering
Published in Thin solid films (01-11-1996)Get full text
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Transmission Electron Microscopy Observation and Third-Order Optical Nonlinearity of CdSe-Doped Glass Thin Films Prepared by Ion-Beam Sputtering Method
Published in Japanese Journal of Applied Physics (01-05-1996)“…The structure of CdSe-doped silica glass thin films prepared by ion-beam sputtering (IBS) method was investigated by transmission electron microscopy (TEM) and…”
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6
Properties of the CdSe-doped glass thin films prepared by ion-beam sputtering method
Published in Japanese Journal of Applied Physics (1995)“…CdSe-doped silica glass thin films were prepared by the ion-beam sputtering (IBS) method and the ion-assisted deposition method (IAD). Properties of the doped…”
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7
Low-power-consumption direct-conversion CMOS transceiver for multi-standard 5-GHz wireless LAN systems with channel bandwidths of 5-20 MHz
Published in IEEE journal of solid-state circuits (01-02-2006)“…This paper describes a low-power-consumption direct-conversion CMOS transceiver for WLAN systems operating at 4.9-5.95 GHz. Its power consumption is reduced by…”
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8
A Low-Power Dual-Band Triple-Mode WLAN CMOS Transceiver
Published in IEEE journal of solid-state circuits (01-11-2006)“…This paper describes a 0.18-mum CMOS direct-conversion dual-band triple-mode wireless LAN transceiver. The transceiver has a concurrent dual-band low-noise…”
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9
A Low-Voltage −204 dBc/Hz FoMT 1.8-2.7 GHz LC-VCO using 55nm SOTB Technology
Published in 2020 IEEE International Symposium on Radio-Frequency Integration Technology (RFIT) (01-09-2020)“…A low-voltage, low-power, low-phase-noise, and wide-frequency-tuning-range (FTR) LC-VCO for Internet of Things (IoT) has been implemented in the 55nm Silicon…”
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Conference Proceeding -
10
A New DC-Offset and I/Q-Mismatch Compensation Technique for a CMOS Direct-Conversion WLAN Transmitter
Published in 2007 IEEE/MTT-S International Microwave Symposium (01-06-2007)“…This paper presents a novel DC-offset and I/Q-mismatch compensation technique with short convergence time, high accuracy, and low-circuit-complexity. In this…”
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Conference Proceeding -
11
Performance of Ku-Band on-chip matched Si monolithic amplifiers using 0.18-micron-gatelength MOSFETs
Published in IEEE transactions on microwave theory and techniques (01-06-2001)“…We demonstrated Ku-band (12-20 GHz) Si MOSFET monolithic amplifiers with on-chip matching networks. In these amplifiers, we used 3-micron-thick Al-metal…”
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12
A 0.18-μm CMOS Low-spurious Local Signal Generator for MB-OFDM UWB Radio
Published in 2007 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium (01-06-2007)“…This paper presents a new single PLL and single SSB-mixer architecture for a local signal generator of the Mode-1 MB-OFDM UWB systems. Using a VCO running at…”
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Conference Proceeding -
13
Performance of Ku-band on-chip matched Si monolithic amplifiers using 0.18-μm-gatelength MOSFETs
Published in IEEE transactions on microwave theory and techniques (01-06-2001)“…We demonstrated Ku-band (12-20 GHz) Si MOSFET monolithic amplifiers with on-chip matching networks. In these amplifiers, we used 3- mu m-thick Al-metal…”
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14
Optical properties and structrue of SiO 2 films prepared by ion-beam sputtering
Published in Thin solid films (1996)“…SiO 2 films were prepared by an ion-beam sputtering (IBS) method and their properties were studied using visible-UV absorption spectroscopy, X-ray…”
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Journal Article -
15
Optical properties and structure of SiO sub(2) films prepared by ion-beam sputtering
Published in Thin solid films (01-01-1996)“…SiO sub(2) films were prepared by an ion-beam sputtering (IBS) method and their properties were studied using visible-UV absorption spectroscopy, X-ray…”
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16
An accurate HJFET current–voltage model including temperature dependence for a circuit simulator
Published in Solid-state electronics (1999)“…We present a new hetero-junction FET (HJFET) current–voltage ( I– V) model intended for implementation with a large signal simulator. The developed model takes…”
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17
A 500-mW high-efficiency Si MOS MMIC amplifier for 900-MHz-band use
Published in IEEE transactions on microwave theory and techniques (01-08-2000)“…A 500-mW monolithic-microwave integrated-circuit (MMIC) amplifier using a 0.6-/spl mu/m Si MOSFET for 900-MHz-band use has been developed. The input matching…”
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18
A direct-conversion CMOS transceiver for 4.9-5.95GHz multi-standard WLANs
Published 2004Get full text
Conference Proceeding -
19
A wide supply voltage and low-rx noise envelope tracking supply modulator IC for LTE handset power amplifiers
Published in 2012 42nd European Microwave Conference (01-10-2012)“…A high efficiency envelope tracking supply modulator IC for LTE handset use is presented. It is fabricated using 0.35 μm CMOS with optional 6-V-MOSFETs, and…”
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Conference Proceeding -
20
0.2-μm fully-self-aligned Y-shaped gate HJFET's with reduced gate-fringing capacitance fabricated using collimated sputtering and electroless Au-plating
Published in IEEE transactions on electron devices (01-08-1998)“…This paper reports on new fully-self-aligned gate technology for 0.2- mu m, high-aspect-ratio, Y-shaped-gate heterojunction-FET's (HJFET's) with about half the…”
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Journal Article