Search Results - "Münzel, N."

Health care utilization in persons with spinal cord injury: part 1—outpatient services by Gemperli, A, Ronca, E, Scheel-Sailer, A, Koch, H G, Brach, M, Trezzini, B

“…Study design: This was a cross-sectional questionnaire survey. Objectives: The objective of this study was to identify the care-seeking behavior of persons…”
Get full text

Evaluation of chemically amplified deep UV resist for micromachining using E-beam lithography and dry etching by HUDEK, P, RANGELOW, I. W, KOSTIC, I, MÜNZEL, N, DARAKTCHIEV, I

Get full text

The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists: Nanotechnology by NOVEMBRE, A. E, MÜNZEL, N

Get full text

Lithographic and pattern transfer of a novel deep-UV photoresist: ARCH2 by Falcigno, P., Münzel, N., Holzwarth, H., Schacht, H.-T., Mertesdorf, C., Bronner, W., Kaufel, G., Timko, A., Nalamasu, O.

“…We have developed a novel chemically amplified deep-UV photoresist called ARCH2. ARCH2 displays a resolution of<0.23μm with a DOF of 1.0μm at 0.25μm. This…”
Get full text

Evaluation of chemically amplified deep UV resis for micromachining using e-beam lithography and dry etching by Hudek, P., Rangelow, I.W., Kostic, I., Münzel, N., Daraktchiev, I.

“…The electron-beam response of new chemically amplified positive multi-component ARCH-resist family (ARCH and ARCH2) and the suitability of pattern transfer…”
Get full text

The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists by Novembre, Anthony E., Münzel, Norbert

“…The electron-beam and x-ray (α centered at 1.4 nm) lithographic performance of the single and multi-component chemically amplified (CA) resists termed CAMP and…”
Get full text