Search Results - "Lucatorto, TB"

Spontaneous coherent microwave emission and the sawtooth instability in a compact storage ring by Arp, U., Fraser, G. T., Hight Walker, A. R., Lucatorto, T. B., Lehmann, K. K., Harkay, K., Sereno, N., Kim, K.-J.

“…Strong evidence for self-excited emission of coherent synchrotron radiation in the microwave spectral region was observed at the Synchrotron Ultraviolet…”
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Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography by Tarrio, Charles, Grantham, Steven, Squires, Matthew B, Vest, Robert E, Lucatorto, Thomas B

“…Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each…”
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Precision Spectroscopy in He as a Test of QED by Bergeson, S D, Balakrishnan, A, Baldwin, K G H, Lucatorto, T B, Marangos, J P, McIlrath, T J, O'Brian, T R, Rolston, S L, Sansonetti, C J, Wen, Jesse, Westbrook, N, Cheng, C H, Eyler, E E

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Efficient Laser Production of a Na + Ground-State Plasma Column: Absorption Spectroscopy and Photoionization Measurement of Na by Lucatorto, T. B., McIlrath, T. J.

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Measurement of CO pressures in the ultrahigh vacuum regime using resonance‐enhanced multiphoton‐ionization time‐of‐flight mass spectroscopy by Looney, J. Patrick, Harrington, Joel E., Smyth, Kermit C., O’Brian, Thomas R., Lucatorto, Thomas B.

“…An evaluation is made of measurements of CO pressures in the UHV regime using resonance‐enhanced multiphoton ionization coupled with time‐of‐flight mass…”
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A novel approach to resonance ionization mass spectrometry employing a glow discharge atom source by Xiong, X., Hutchinson, J.M.R., Hess, K.R., Fassett, J.D., Lucatorto, T.B.

“…This paper reports on preliminary efforts to design and implement a novel combination of a laser, a glow discharge atom source, and a magnetic sector mass…”
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Laser Excitation and Ionization in a Dense Li Vapor: Observation of the Even-Parity, Core-Excited Autoionizing States by McIlrath, T. J., Lucatorto, T. B.

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Accurate reflectometry for extreme-ultraviolet lithography at the National Institute of Standards and Technology by Grantham, S., Tarrio, C., Lucatorto, T. B.

“…The most demanding application of extreme ultraviolet multilayer optics is in lithography. The optics in current alpha-class tools are large, and the…”
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Laser ablation and resonance ionization spectrometry for trace analysis of solids by Mayo, Santos, Lucatorto, T. B, Luther, G. G

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Multiphoton excitation of autoionizing states of Mg: Line-shape studies of the 3p2 1S state by Bonanno, RE, Clark, CW, Lucatorto, TB

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Influence of Increasing Nuclear Charge on the Rydberg Spectra of Xe, Cs + , and Ba + + : Correlation, Term Dependence, and Autoionization by Hill, W. T., Cheng, K. T., Johnson, W. R., Lucatorto, T. B., McIlrath, T. J., Sugar, J.

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Verification of the ponderomotive approximation for the ac Stark shift in Xe Rydberg levels by O'Brian, TR, Kim, J, Lan, G, McIlrath, TJ, Lucatorto, TB

“…We report direct measurements of the ac Stark shifts of Xe Rydberg levels in high-intensity laser fields (up to 6 GW/cm[sup 2]), demonstrating the expected…”
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Marked differences in the 3p photoabsorption between the Cr and Mn+ isoelectronic pair: reasons for the unique structure observed in Cr by COOPER, J. W, CLARK, C. W, CROMER, C. L, LUCATORTO, T. B, SONNTAG, B. F, KENNEDY, E. T, COSTELLO, J. T

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Analysis of the 5p6-->5p5nl (J=1) Rydberg series in Ba2 by Hill, 3rd, WT, Sugar, J, Lucatorto, TB, Cheng, KT

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Measurement of isotope shifts of two-photon transitions in beryllium by Wen, J, Travis, JC, Lucatorto, TB, Johnson, BC, Clark, CW

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Resonant structure in 3p-subshell absorption of excited and ionized manganese by Cooper, JW, Clark, CW, Cromer, CL, Lucatorto, TB, Sonntag, BF, Tomkins, FS

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Optics go to extremes in EUV lithography by Grantham, Steve, Tarrio, Charles, Hill, Shannon B, Lucatorto, Thomas B

“…The features on integrated circuits continue to shrink according to Moore's Law. Extreme-UV lithography is considered by many to be the "next-generation"…”
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Improved dose metrology in optical lithography by Cromer, Christopher L, Lucatorto, Thomas B, O'Brian, Thomas R, Walhout, Matthew

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