Bandgap Restructuring of the Layered Semiconductor Gallium Telluride in Air
A giant bandgap reduction in layered GaTe is demonstrated. Chemisorption of oxygen to the Te‐terminated surfaces produces significant restructuring of the conduction band resulting in a bandgap below 0.8 eV, compared to 1.65 eV for pristine GaTe. Localized partial recovery of the pristine gap is ach...
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Published in: | Advanced materials (Weinheim) Vol. 28; no. 30; pp. 6465 - 6470 |
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Main Authors: | , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Germany
Blackwell Publishing Ltd
01-08-2016
Wiley Blackwell (John Wiley & Sons) |
Subjects: | |
Online Access: | Get full text |
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Summary: | A giant bandgap reduction in layered GaTe is demonstrated. Chemisorption of oxygen to the Te‐terminated surfaces produces significant restructuring of the conduction band resulting in a bandgap below 0.8 eV, compared to 1.65 eV for pristine GaTe. Localized partial recovery of the pristine gap is achieved by thermal annealing, demonstrating that reversible band engineering in layered semiconductors is accessible through their surfaces. |
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Bibliography: | ark:/67375/WNG-82WF6KCK-S National Science Foundation Graduate Research Fellowships Program - No. DGE-1106400 Director, Office of Science, Office of Basic Energy Sciences, and Materials Sciences and Engineering Division of the U.S. Department of Energy - No. DE-AC02-05CH11231 istex:AF01F5B4D14843462515D19A4489A7936566E261 ArticleID:ADMA201601151 Present address: Department of Materials Science and Engineering, Arizona State University, Tempe, Arizona 85287, USA ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 DE‐AC02‐05CH11231 USDOE |
ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.201601151 |