Search Results - "Liehr, M."

Refine Results
  1. 1

    Fetal heart rate variability reveals differential dynamics in the intrauterine development of the sympathetic and parasympathetic branches of the autonomic nervous system by Schneider, U, Schleussner, E, Fiedler, A, Jaekel, S, Liehr, M, Haueisen, J, Hoyer, D

    Published in Physiological measurement (01-02-2009)
    “…The aim of this study was to investigate the hypothesis that fetal beat-to-beat heart rate variability (fHRV) displays the different time scales of…”
    Get more information
    Journal Article
  2. 2

    Reconstruction of quasi-radial dipolar activity using three-component magnetic field measurements by Haueisen, J, Fleissig, K, Strohmeier, D, Elsarnagawy, T, Huonker, R, Liehr, M, Witte, O.W

    Published in Clinical neurophysiology (01-08-2012)
    “…Highlights ► Novel vector-biomagnetometers enable reconstruction of quasi-radial brain activity. ► We demonstrate this reconstruction of radial brain activity…”
    Get full text
    Journal Article
  3. 3

    The localization of focal heart activity via body surface potential measurements: tests in a heterogeneous torso phantom by Wetterling, F, Liehr, M, Schimpf, P, Liu, H, Haueisen, J

    Published in Physics in medicine & biology (21-09-2009)
    “…The non-invasive localization of focal heart activity via body surface potential measurements (BSPM) could greatly benefit the understanding and treatment of…”
    Get more information
    Journal Article
  4. 4

    Microwave PECVD for large area coating by Liehr, M., Dieguez-Campo, M.

    Published in Surface & coatings technology (01-10-2005)
    “…Microwave Plasma Enhanced Chemical Vapour Deposition (PECVD) of thin films is the method of choice when highest deposition rates and/or high fragmentation of…”
    Get full text
    Journal Article Conference Proceeding
  5. 5

    Large area microwave coating technology by Liehr, M., Wieder, S., Dieguez-Campo, M.

    Published in Thin solid films (28-04-2006)
    “…Microwave plasma enhanced chemical vapour deposition (PECVD) of thin films is the preferred technology when highest deposition rates are desirable. However,…”
    Get full text
    Journal Article Conference Proceeding
  6. 6

    Endoscopy in Barrett’s oesophagus: adherence to standards and neoplasia detection in the community practice versus hospital setting by Pohl, H., Aschenbeck, J., Drossel, R., Schröder, A., Mayr, M., Koch, M., Rothe, K., Anders, M., Voderholzer, W., Hoffmann, J., Schulz, H.‐J., Liehr, R.‐M., Gottschalk, U., Wiedenmann, B., Rösch, T.

    Published in Journal of internal medicine (01-10-2008)
    “… Objective.  Potential process differences between hospital and community‐based endoscopy for Barrett’s oesophagus have not been examined. We aimed at…”
    Get full text
    Journal Article
  7. 7

    Comprehensive analysis of charge pumping data for trap identification by Veksler, D, Bersuker, G, Koudymov, A, Young, C D, Liehr, M, Taylor, B

    “…Analysis methodology for the charge pumping (CP) data, which considers non-elastic electron/hole capturing and releasing processes, is proposed. It is shown…”
    Get full text
    Conference Proceeding
  8. 8

    FinFET parasitic resistance reduction by segregating shallow Sb, Ge and As implants at the silicide interface by Kenney, C. R., Ang, K.-W, Matthews, K., Liehr, M., Minakais, M., Pater, J., Rodgers, M., Kaushik, V., Novak, S., Gausepohl, S., Hobbs, C., Kirsch, P. D., Jammy, R.

    Published in 2012 Symposium on VLSI Technology (VLSIT) (01-06-2012)
    “…This paper reports a new contact technology comprising antimony (Sb) co-implantation and segregation to reduce Schottky barrier height (SBH) and parasitic…”
    Get full text
    Conference Proceeding
  9. 9

    Kinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor by LIEHR, M, GREENLIEF, C. M, KASI, S. R, OFFENBERG, M

    Published in Applied physics letters (12-02-1990)
    “…The equilibrium hydrogen surface coverage on Si(100) during silicon epitaxy using SiH4 has been measured in a rapid thermal chemical vapor deposition reactor…”
    Get full text
    Journal Article
  10. 10

    Kinetics of high‐temperature thermal decomposition of SiO2 on Si(100) by Liehr, M., Lewis, J. E., Rubloff, G. W.

    “…The decomposition of oxide films of 50 to 500 Å on Si(100) during ultrahigh vacuum anneal has been studied in a scanning Auger microscope. The decomposition of…”
    Get full text
    Journal Article
  11. 11

    Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality by KASI, S. R, LIEHR, M, THIRY, P. A, DALLAPORTA, H, OFFENBERG, M

    Published in Applied physics letters (01-07-1991)
    “…The surface reactivity of hydrogen-passivated, HF-cleaned Si(100) towards hydrocarbon adsorption is examined by surface analysis; most hydrocarbons adsorb on…”
    Get full text
    Journal Article
  12. 12

    Vapor phase hydrocarbon removal for Si processing by KASI, S. R, LIEHR, M

    Published in Applied physics letters (12-11-1990)
    “…Ultraviolet/Oxygen (UV/O2) based vapor phase cleaning of Si(100) surfaces dosed with specific organic molecules has been studied by surface and gas phase…”
    Get full text
    Journal Article
  13. 13

    Integrated thermal chemical vapor deposition processing for Si technology by Liehr, M.

    “…A multichamber integrated ultrahigh vacuum processing and analysis facility is described that addresses issues of chemical growth processes in terms of…”
    Get full text
    Journal Article
  14. 14

    Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4 by Liehr, M., Greenlief, C. M., Offenberg, M., Kasi, S. R.

    “…Epitaxial silicon has been grown on Si(100) wafers using SiH4 in a rapid thermal chemical vapor deposition reactor in the temperature regime from 450–700 °C…”
    Get full text
    Journal Article
  15. 15

    Chemistry of fluorine in the oxidation of silicon by KASI, S. R, LIEHR, M, COHEN, S

    Published in Applied physics letters (24-06-1991)
    “…The chemical environment of fluorine in the oxide layer of metal-oxide-semiconductor (MOS) structures has been examined by surface analytical spectroscopies…”
    Get full text
    Journal Article
  16. 16

    Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics by Kasi, S. R., Liehr, M.

    “…SiO2/Si interfaces with minimal defect densities will be required for the proper functioning of field effect transistors (FET) and device isolation schemes in…”
    Get full text
    Conference Proceeding Journal Article
  17. 17

    Cholecystokinin suppresses food intake by a nonendocrine mechanism in rats by Reidelberger, R.D. (Creighton University School of Medicine, Omaha, NE.), Varga, G, Liehr, R.M, Castellanos, D.A, Rosenquist, G.L, Wong, H.C, Walsh, J.H

    Published in The American journal of physiology (01-10-1994)
    “…A cholecystokinin monoclonal antibody (CCK MAb) was used to immunoneutralize CCK to test the hypothesis that CCK produces satiety by an endocrine mechanism. We…”
    Get full text
    Journal Article
  18. 18

    Low pressure chemical vapor deposition of oxide from SiH4/O2 : chemistry and effects on electrical properties by LIEHR, M, COHEN, S. A

    Published in Applied physics letters (13-01-1992)
    “…The low pressure chemical vapor deposition (CVD) process of SiO2 from SiH4 and O2 has been analyzed. For deposition at pressures ranging from 10−3 to 3 Torr,…”
    Get full text
    Journal Article
  19. 19

    Defect formation in SiO2/Si(100) by metal diffusion and reaction by LIEHR, M, DALLAPORTA, H, LEWIS, J. E

    Published in Applied physics letters (15-08-1988)
    “…The decomposition of SiO2 films on Si(100) during ultrahigh vacuum anneal is found to be strongly enhanced by monolayer amounts of impurities deposited on the…”
    Get full text
    Journal Article
  20. 20

    Septic shock due to Vibrio vulnificus serogroup 04 wound infection acquired from the Baltic Sea by Hoyer, J, Engelmann, E, Liehr, R M, Distler, A, Hahn, H, Shimada, T

    “…Vibrio vulnificus was first isolated by the Centers for Disease Control in 1964 and given its name in 1979. It belongs to the family of Vibrionaceae. Vibrio…”
    Get full text
    Journal Article