Search Results - "Lieberman, M.A."
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1
From Fermi acceleration to collisionless discharge heating
Published in IEEE transactions on plasma science (01-06-1998)“…The heating of electrons by time-varying fields is fundamental to the operation of radio frequency (RF) and microwave discharges. Ohmic heating, in which the…”
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2
Analytical solution for capacitive RF sheath
Published in IEEE transactions on plasma science (01-12-1988)“…A self-consistent solution for the dynamics of a high voltage, capacitive radio frequency (RF) sheath driven by a sinusoidal current source is obtained under…”
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3
Dynamics of a collisional, capacitive RF sheath
Published in IEEE transactions on plasma science (01-04-1989)“…A self-consistent solution for the dynamics of a high-voltage, capacitive RF sheath driven by a sinusoidal current source is obtained, under the assumptions of…”
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4
Hydrogenation of polysilicon thin-film transistor in a planar inductive H/sub 2//Ar discharge
Published in IEEE electron device letters (01-05-1999)“…A planar inductive discharge is used to hydrogenate polysilicon thin-film transistors (poly-Si TFTs). Experimental results indicate that inductive discharges…”
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5
Nonlinearity And Waves In Capacitively-Coupled Plasma Processing Discharges
Published in 2021 IEEE International Conference on Plasma Science (ICOPS) (12-09-2021)“…Capacitively-coupled plasmas (CCP's) are widely used at low pressures for thin film etching on silicon substrates and, at higher pressures, for film deposition…”
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Conference Proceeding -
6
Model of magnetically enhanced, capacitive RF discharges
Published in IEEE transactions on plasma science (01-04-1991)“…Magnetically enhanced, capacitive RF discharges (called RF magnetrons or MERIE discharges) are playing an increasing role in thin film etching for integrated…”
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7
Sheath motion in a capacitively coupled radio frequency discharge
Published in IEEE transactions on plasma science (01-08-1991)“…The sheath motion in a capacitively coupled RF discharge is highly nonlinear. The voltage waveform on a cylindrical probe placed in the sheath region is…”
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8
Spatially averaged (global) model of time modulated high density argon plasmas
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-1995)“…The behavior of argon plasmas driven by time modulated power in ‘‘high density’’ plasma reactors is investigated using a global model. The time evolution of…”
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9
The effects of nursing home placement on family caregivers of patients with Alzheimer's disease
Published in The Gerontologist (01-12-2001)“…This study sought to determine the effects of nursing home placement (NHP) for patients with Alzheimer's disease, compared to maintaining community placement,…”
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10
Secure random number generation using chaotic circuits
Published in IEEE transactions on circuits and systems (01-09-1990)“…The authors suggest a class of circuits for generating secure pseudo-random numbers and estimate the security of these generators from the information loss…”
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11
A Longitudinal Study of Predictors of Nursing Home Placement for Patients With Dementia: The Contribution of Family Characteristics
Published in The Gerontologist (01-12-1999)“…The caregivers of elderly patients with dementia (N = 164) were followed for 2 years to determine if characteristics of the multigeneration family predicted…”
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12
Collisional ion energy distribution (IED) model for single frequency capacitive discharges
Published in 2009 IEEE International Conference on Plasma Science - Abstracts (01-06-2009)“…Summary form only given. The distributions of particles on substrate surfaces are very important for materials processing, and it is valuable to develop fast…”
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Conference Proceeding -
13
Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field
Published in Applied physics letters (06-09-2004)“…A large area (1020mm×830mm) inductively coupled plasma (ICP) source has been developed using an internal-type linear antenna with permanent magnets forming a…”
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14
Measurements of pulsed‐power modulated argon plasmas in an inductively coupled plasma source
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-1996)“…The behavior of pulsed‐power (square wave) modulated argon plasmas generated by an inductively coupled plasma (ICP) source is experimentally investigated. The…”
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15
Double layer formation in a two-region electronegative plasma
Published in 2009 IEEE International Conference on Plasma Science - Abstracts (01-06-2009)“…Summary form only given. We describe the formation of a double layer (DL) in a two- dimensional (2D) electronegative plasma with a source (heating) section…”
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Conference Proceeding -
16
Nonlinear resonance effects on electron heating in capacitive discharges
Published in 2008 IEEE 35th International Conference on Plasma Science (01-06-2008)“…In capacitive radio frequency discharges operated at gas pressures below 20 mTorr two mechanisms of electron heating play a major role: i) ohmic heating due to…”
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Conference Proceeding -
17
Global model of Ar, O[sub 2], Cl[sub 2], and Ar/O[sub 2] high-density plasma discharges
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-1995)“…We develop a global (volume averaged) model of high-density plasma discharges in molecular gases. For a specified discharge length and diameter, absorbed…”
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18
Fermi acceleration revisited-from cosmic rays to discharge heating
Published in International Conference on Plasma Science (papers in summary form only received) (1995)“…Summary form only given, as follows. The motion of a ball bouncing between a fixed and an oscillating wall was originally proposed by Fermi in 1949 as a model…”
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19
Tooth, face, and skull dimensions in different ethnic groups in Israel
Published in American journal of orthodontics (01-03-1974)Get more information
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20
Global model for high pressure electronegative radio-frequency discharges
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-1997)“…We develop a global model for high pressure (0.1–1 Torr) electronegative rf discharges and apply it to model a capacitively driven plasma etcher. The molecular…”
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