Search Results - "Li, Sikun"

A novel in situ compression method for CFD data based on generative adversarial network by Liu, Yang, Wang, Yueqing, Deng, Liang, Wang, Fang, Liu, Fang, Lu, Yutong, Li, Sikun

“…As one of the main technologies of in situ visualization, data compression plays a key role in solving I/O bottleneck and has been intensively studied…”
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Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network by Liao, Lufeng, Li, Sikun, Che, Yongqiang, Shi, Weijie, Wang, Xiangzhao

“…As the designed feature size of integrated circuits (ICs) continues to shrink, the lithographic printability of the design has become one of the important…”
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Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition by Li, Sikun, Su, Xianyu, Chen, Wenjing, Xiang, Liqun

“…Empirical mode decomposition is introduced into Fourier transform profilometry to extract the zero spectrum included in the deformed fringe pattern without the…”
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Equivalence checking between SLM and TLM using coverage directed simulation by HU, Jian, LI, Tun, LI, Sikun

“…The increasing complexity of digital systems makes designers begin to design using abstract system level modeling （SLM）. However, SLM brings new challenges for…”
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Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry by Li, Sikun, Su, Xianyu, Chen, Wenjing

“…A Hilbert assisted wavelet transform (HWT) method is presented for phase reconstruction of 3D profilometry and interferometry. A rigorous mathematical…”
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Inferring Assertion for Complementary Synthesis by Shen, ShengYu, Qin, Ying, Wang, KeFei, Pang, ZhengBin, Zhang, JianMin, Li, SiKun

“…Complementary synthesis can automatically synthesize the decoder circuit of an encoder. However, its user needs to manually specify an assertion on some…”
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Synthesizing Complementary Circuits Automatically by Shen, ShengYu, Qin, Ying, Wang, KeFei, Xiao, LiQuan, Zhang, JianMin, Li, SiKun

“…One of the most difficult jobs in designing communication and multimedia chips is to design and verify the complex complementary circuit pair ( E , E -1 ), in…”
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Sorting unorganized photo sets for urban reconstruction by Wan, Guowei, Snavely, Noah, Cohen-Or, Daniel, Zheng, Qian, Chen, Baoquan, Li, Sikun

“…[Display omitted] ► We compute a piecewise-planar model from unorganized building photos. ► We compute initial camera poses. ► We introduce a “façade graph” to…”
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A Halting Algorithm to Determine the Existence of the Decoder by Shen, ShengYu, Qin, Ying, Xiao, LiQuan, Wang, KeFei, Zhang, JianMin, Li, SiKun

“…Complementary synthesis automatically synthesizes the decoder circuit of an encoder. It determines the existence of the decoder by checking whether the…”
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Feature-based adaptive texture visualization for vector field by Xu, HuaXun, Li, SiKun, Zeng, Liang, Cai, Xun

“…An adaptive sparse texture rendering method is proposed to solve for occlusion effects when visualizing 3D flows, building on an extensible fuzzy feature…”
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An incremental extremely random forest classifier for online learning and tracking by Aiping Wang, Guowei Wan, Zhiquan Cheng, Sikun Li

“…Decision trees have been widely used for online learning classification. Many approaches usually need large data stream to finish decision trees induction, as…”
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ProDFA: Accelerating Domain Applications with a Coarse-Grained Runtime Reconfigurable Architecture by Ming Yan, Ziyu Yang, Lei Liu, Sikun Li

“…With the on-chip resources largely increased, modern architectures are much different from traditional ones. The relation between temporal computing and…”
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Source mask optimization using the covariance matrix adaptation evolution strategy by Chen, Guodong, Li, Sikun, Wang, Xiangzhao

“…Source mask optimization (SMO) is one of the indispensable resolution enhancement techniques to guarantee the image fidelity and process robustness for the…”
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Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling by Chen, Guodong, Li, Sikun, Wang, Xiangzhao

“…Optical proximity correction (OPC) is a widely used resolution enhancement technique (RET) in optical lithography to improve the image fidelity and process…”
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Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm by Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei, Qi, Yuejing

“…Extreme ultraviolet (EUV) lithography plays a vital role in the advanced technology nodes of integrated circuits manufacturing. Source mask optimization (SMO)…”
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Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling by Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei

“…Extreme ultraviolet (EUV) lithography is essential in the advanced technology nodes. Source mask optimization (SMO) for EUV lithography, especially the…”
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Radial period extraction method employing frequency measurement for quantitative collimation testing by Li, Sikun, Wang, Xiangzhao

“…A radial period extraction method employing frequency measurement is proposed for quantitative collimation testing using spiral gratings. The radial period of…”
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Providing Responsiveness Requirement Based Consistency in DVE by Wei Zhang, Hangjun Zhou, Yuxing Peng, Sikun Li

“…Consistency and responsiveness are two important factors in providing the sense of reality in Distributed Virtual Environment (DVE). However, it is not easy to…”
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Exploiting Parallelism through High Level Optimization on a Heterogeneous Multicore SoC by Ming Yan, Peng Zhao, Ziyu Yang, Sikun Li

“…This paper describes a heterogeneous multicore SoC named EVMP-SoC, which is composed of a RISC host processor and two minor-different SIMD synergistic…”
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Critical pattern selection method for full-chip source and mask optimization by Liao, Lufeng, Li, Sikun, Wang, Xiangzhao, Zhang, Libin, Gao, Pengzheng, Wei, Yayi, Shi, Weijie

“…Source and mask optimization (SMO) is one of the most important resolution enhancement techniques for integrated circuit manufacturing in 2X nm technology node…”
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