Search Results - "Leroy, W.P."

Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films by Van Steenberge, S., Leroy, W.P., Depla, D.

“…An in depth understanding of the influence of the deposition parameters on the texture and microstructure of sputtered ceria thin films could pave the way…”
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The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering by Boydens, F., Leroy, W.P., Persoons, R., Depla, D.

“…The effect of the target surface morphology on the sputter deposition flux and the energy flux is investigated by comparing solid targets to pressed powder…”
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Influence of target–substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films by Lamas, J.S., Leroy, W.P., Depla, D.

“…The use of yttria-stabilized zirconia (YSZ) thin films calls for a controlled deposition with full understanding on the influence of deposition parameters on…”
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Sputter deposited transition metal nitrides as back electrode for CIGS solar cells by Mahieu, S., Leroy, W.P., Van Aeken, K., Wolter, M., Colaux, J., Lucas, S., Abadias, G., Matthys, P., Depla, D.

“…Transition metal nitrides such as TiN and ZrN have a potential use as back electrodes in Cu(In,Ga)S2 or Cu(In,Ga)Se2 solar cells. Important properties of the…”
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Magnetron sputter deposition as visualized by Monte Carlo modeling by Depla, D., Leroy, W.P.

“…The Monte Carlo code SIMTRA, simulating the transport of atoms from the source to the substrate during physical vapor deposition (PVD), is used in several case…”
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Corrigendum to Modeling reactive magnetron sputtering: Fixing the parameter set Surf. Coat. Technol. 206(17) (2012) 3666–3675 by Strijckmans, K., Leroy, W.P., De Gryse, R., Depla, D.

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Thirty years of rotatable magnetrons by De Gryse, R., Haemers, J., Leroy, W.P., Depla, D.

“…Rotating cylindrical magnetrons differ in design from the well known planar magnetrons. The cylindrical target rotates around a stationary magnet configuration…”
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Modeling reactive magnetron sputtering: Fixing the parameter set by Strijckmans, K., Leroy, W.P., De Gryse, R., Depla, D.

“…The total pressure was measured as a function of the oxygen gas flow during reactive magnetron sputtering of two different target materials, namely yttrium and…”
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The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films by Lamas, J.S., Leroy, W.P., Depla, D.

“…The fundamental study of the microstructural and textural evolution of yttria-stabilized zirconia (YSZ) thin films is of great importance given that the…”
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Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: The method and results by Leroy, W.P., Mahieu, S., Persoons, R., Depla, D.

“…Reactive Magnetron Sputtering is a complex process and huge efforts are made addressing the understanding of its fundamental phenomena and the simulation of…”
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Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films by LAMAS, J. S, LEROY, W. P, LU, Y.-G, VERBEECK, J, VAN TENDELOO, G, DEPLA, D

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The barrier height inhomogeneity in identically prepared Au/n-GaAs Schottky barrier diodes by Leroy, W.P., Opsomer, K., Forment, S., Van Meirhaeghe, R.L.

“…We have prepared small Au/n-GaAs Schottky barrier diodes (SBDs) using e-beam lithography (EBL), and obtained their effective barrier heights (BHs) and ideality…”
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