Search Results - "Lehrer, C."

Nanoscale effects in focused ion beam processing by Frey, L., Lehrer, C., Ryssel, H.

“…Focused ion beams with diameters of 8 to 50 nm are used for material processing in the nanoscale regime. In this paper, effects of the ion beam--solid…”
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Limitations of focused ion beam nanomachining by Lehrer, C., Frey, L., Petersen, S., Ryssel, H.

“…In this article, some limitations of the processing of structures with dimensions in the nanometer range by focused ion beams will be discussed. In order to…”
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Simulation of ion beam direct structuring for 3D nanoimprint template fabrication by Platzgummer, E., Biedermann, A., Langfischer, H., Eder-Kapl, S., Kuemmel, M., Cernusca, S., Loeschner, H., Lehrer, C., Frey, L., Lugstein, A., Bertagnolli, E.

“…A software tool (“Ionshaper™”) has been developed which allows calibrated high precision simulation of ion beam processing. The continuum model is based on a…”
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Utility of the Beck Depression Inventory in Patients with Chronic Kidney Disease Stage 4 without Kidney Replacement Therapy by Runner, Tonya R, Berryman, Jeri J, Lehrer, Julie C

“…Depression is undertreated in patients with chronic kidney disease (CKD) stage 4 without kidney replacement therapy (KRT), despite evidence showing its…”
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Integration of field emitters into scanning probe microscopy sensors using focused ion and electron beams by Lehrer, C., Frey, L., Petersen, S., Ryssel, H., Schäfer, M., Sulzbach, Th

“…Material processing by focused ion-beam milling and electron-beam-induced deposition was applied for the integration of field emitters into scanning probe…”
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Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiO x ) deposition by Lipp, S., Frey, L., Lehrer, C., Frank, B., Demm, E., Pauthner, S., Ryssel, H.

“…Focused ion beams are intensively used for device modification by local material removal and ion beam induced metal deposition. With shrinking dimensions on…”
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Field emitter array fabricated using focused ion and electron beam induced reaction by Yavas, O., Ochiai, C., Takai, M., Park, Y. K., Lehrer, C., Lipp, S., Frey, L., Ryssel, H., Hosono, A., Okuda, S.

“…A dual beam system consisting of focused ion and electron beams was used for manufacturing of Nb-gated silicon field emitter arrays. Gate opening was produced…”
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Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining by Lehrer, C., Frey, L., Petersen, S., Sulzbach, Th, Ohlsson, O., Dziomba, Th, Danzebrink, H.U., Ryssel, H.

“…Scanning near-field optical microscopy (SNOM) probes can be realized by aperture probes based on metal coated atomic force microscopy (AFM) sensors. The…”
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High‐resolution constant‐height imaging with apertured silicon cantilever probes by Dziomba, T., Danzebrink, H. U., Lehrer, C., Frey, L., Sulzbach, T., Ohlsson, O.

“…We present high‐resolution aperture probes based on non‐contact silicon atomic force microscopy (AFM) cantilevers for simultaneous AFM and near‐infrared…”
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A comparison of focused ion beam and electron beam induced deposition processes by Lipp, S., Frey, L., Lehrer, C., Demm, E., Pauthner, S., Ryssel, H.

“…Focused ion and electron beams are used for local deposition of conducting or insulating films. Major applications are integrated circuit design edit,…”
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Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams by Danzebrink, H. U., Dziomba, TH, Sulzbach, T., Ohlsson, O., Lehrer, C., Frey, L.

“…The near‐field probes described in this paper are based on metallized non‐contact atomic force microscope cantilevers made of silicon. For application in…”
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Fabrication of field emitter array using focused ion and electron beam induced reaction by Takai, M., Kishimoto, T., Morimoto, H., Park, Y.K., Lipp, S., Lehrer, C., Frey, L., Ryssel, H., Hosono, A., Kawabuchi, S.

“…A 30 keV dual beam system with focused ion and electron beams has been used to develop a fast fabrication process of field emitter arrays (FEAs). The gate…”
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Investigation of Cu films by focused ion beam induced deposition using nuclear microprobe by Park, Y.K, Takai, M, Lehrer, C, Frey, L, Ryssel, H

“…The localized Cu deposition on Si by 30 keV Ga+ focused ion beam (FIB) using precursor gas has been investigated by a 300 keV Be2+ nuclear microprobe with a…”
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Comparison of beam-induced deposition using ion microprobe by Park, Y.K, Nagai, T, Takai, M, Lehrer, C, Frey, L, Ryssel, H

“…The localized Pt deposition on Si by 30 keV Ga + focused ion beam (FIB), 10 keV electron beam (EB) or dual beams (FIB and EB) using precursor gas has been…”
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Impurity incorporation during beam assisted processing analyzed using nuclear microprobe by Park, Y.K, Takai, M, Lehrer, C, Frey, L, Ryssel, H

“…Impurity incorporation due to localized beam processing by focused ion beams (FIBs) and electron beams (EBs) such as physical sputtering, gas-assisted etching…”
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AFM and STM investigation of carbon nanotubes produced by high energy ion irradiation of graphite by Biró, L.P., Márk, G.I., Gyulai, J., Havancsák, K., Lipp, S., Lehrer, Ch, Frey, L., Ryssel, H.

“…Carbon nanotubes (CNT) were produced by high energy, heavy ion irradiation (215 MeV Ne, 246 MeV Kr, 156 MeV Xe) of graphite. On samples irradiated with Kr and…”
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Microanalysis of masklessly fabricated microstructures using nuclear microprobe by Park, Y.K., Takai, M., Nagai, T., Kishimoto, T., Seidl, A., Lehrer, C., Frey, L., Ryssel, H.

“…Contamination during localized etching using a 30 keV Ga + focused ion beam (FIB) has been investigated using a 300 keV Be 2+ nuclear microprobe with a beam…”
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The effect of hypothermia on gas exchange in anaesthetized rats in a confined atmosphere by Arieli, R, Lehrer, C, Gavriely, N

“…Both hypothermia and anaesthesia are known to prolong hypoxic survival. The combined effect of anaesthesia and hypothermia on survival in a confined atmosphere…”
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Hypothermia prolongs survival in a confined atmosphere by Arieli, R, Lehrer, C, Gavriely, N

“…Survival in a confined atmosphere where O2 is limited may be extended by hypothermia. Rats were placed in a thermoregulated sealed chamber which contained a…”
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Investigations on the topology of structures milled and etched by focused ion beams by Lipp, S., Frey, L., Lehrer, C., Frank, B., Demm, E., Ryssel, H.

“…For high precision micromachining of micro‐ and nanostructures by focused ion beams, the precision of the material removal process is of great importance. In…”
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