Search Results - "Lausecker, E"

UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays by Lausecker, E., Brehm, M., Grydlik, M., Hackl, F., Bergmair, I., Mühlberger, M., Fromherz, T., Schäffler, F., Bauer, G.

“…We use UV nanoimprint lithography for the pit-patterning of silicon substrates. Ordered silicon-germanium islands are grown inside these pits by molecular-beam…”
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Self-aligned imprint lithography for top-gate amorphous silicon thin-film transistor fabrication by Lausecker, E., Huang, Y., Fromherz, T., Sturm, J. C., Wagner, S.

“…We developed self-aligned imprint lithography (SAIL) for top-gate amorphous silicon (a-Si) thin-film transistors (TFTs). Our SAIL process enables a device…”
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Anisotropic remastering for reducing feature sizes on UV nanoimprint lithography replica molds by Lausecker, E, Grydlik, M, Brehm, M, Bergmair, I, Mühlberger, M, Fromherz, T, Bauer, G

“…We present an approach that uses existing nanoimprint molds and reduces the size of the resulting features significantly via a remastering process utilizing…”
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Excitation Intensity Driven PL Shifts of SiGe Islands on Patterned and Planar Si(001) Substrates: Evidence for Ge-rich Dots in Islands by Brehm, M, Grydlik, M, Hackl, F, Lausecker, E, Fromherz, T, Bauer, G

“…For randomly nucleated SiGe/Si(001) islands, a significantly stronger blue-shift of the PL spectra as a function of the excitation intensity is observed when…”
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Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp by MUEHIBERGER, M, BOEHM, M, PLATZGUMMER, E, LOESCHNER, H, JOECHL, P, EDER-KAPI, S, NARZT, T, LAUSECKER, E, FROMHERZ, T, BERGMAIR, I, CHOUIKI, M, SCHOEFTNER, R, KREINDL, G, KAST, M, TREIBLMAYR, D, GLINSNER, T, MILLER, R

“…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp - working…”
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Excitation Intensity Driven PL Shifts of SiGe Islands on Patterned and Planar Si(001) Substrates: Evidence for Ge-rich Dots in Islands by Brehm, M, Grydlik, M, Hackl, F, Lausecker, E, Fromherz, T, Bauer, G

“…For randomly nucleated SiGe/Si(001) islands, a significantly stronger blue-shift of the PL spectra as a function of the excitation intensity is observed when…”
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Excitation intensity dependence of photoluminescence spectra of SiGe quantum dots grown on prepatterned Si substrates: Evidence for biexcitonic transition by Klenovský, P., Brehm, M., Křápek, V., Lausecker, E., Munzar, D., Hackl, F., Steiner, H., Fromherz, T., Bauer, G., Humlíček, J.

“…The pumping intensity (I) dependence of the photoluminescence (PL) spectra of perfectly laterally two-dimensionally ordered SiGe quantum dots on Si(001)…”
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Nanoimprinted superlattice metallic photonic crystal as ultraselective solar absorber by Rinnerbauer, V., Lausecker, E., Schäffler, F., Reininger, P., Strasser, G., Geil, R. D., Joannopoulos, J. D., Soljačić, M., Celanovic, I.

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Amorphous silicon: The other silicon by Sturm, J C, Huang, Y, Han, L, Liu, T, Hekmatshoar, B, Cherenack, K, Lausecker, E, Wagner, S

“…While crystalline silicon FET's are the key enablers for the integrated circuit field, amorphous silicon thin film transistors are the key semiconductor of the…”
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Nanoimprinted superlattice metallic photonic crystal as ultraselective solar absorber by Rinnerbauer, Veronika, Lausecker, E., Schaffler, F., Reininger, P., Strasser, G., Geil, R. D., Joannopoulos, J. D., Soljacic, M., Celanovic, I.

“…Here, a two-dimensional superlattice metallic photonic crystal (PhC) and its fabrication by nanoimprint lithography on tantalum substrates are presented. The…”
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UV nanoimprint lithography for the realization of large-area orderedSiGe/Si(001) island arrays by Lausecker, E., Brehm, M., Grydlik, M., Hackl, F., Bergmair, I., Mühlberger, M., Fromherz, T., Schäffler, F., Bauer, G.

“…We use UV nanoimprint lithography for the pit-patterning of silicon substrates. Ordered silicon-germanium islands are grown inside these pits by molecular-beam…”
Get full text

Nanoimprinted superlattice metallic photonic crystal as ultraselective solar absorber by Rinnerbauer, V., Lausecker, E., Schäffler, F., Reininger, P., Strasser, G., Geil, R. D., Joannopoulos, J. D., Soljačić, M., Celanovic, I.

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Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nmhp by Muehlberger, M., Boehm, M., Bergmair, I., Chouiki, M., Schoeftner, R., Kreindl, G., Kast, M., Treiblmayr, D., Glinsner, T., Miller, R., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Narzt, T., Lausecker, E., Fromherz, T.

“…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp – working…”
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Excitation intensity dependence of photoluminescence spectra of SiGe quantum dots grown on prepatterned Si substrates: Evidence for biexcitonic transition by Klenovský, P, Brehm, M, Křápek, V, Lausecker, E, Munzar, D, Hackl, F, Steiner, H, Fromherz, T, Bauer, G, Humlíček, J

“…Physical Review B 86, 115305 (2012) The pumping intensity (I) dependence of the photoluminescence (PL) spectra of perfectly laterally two-dimensionally ordered…”
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