Search Results - "Langner, G. O."

PREVAIL — Evolution and properties of large area reduction projection electron optics by Stickel, W., Langner, G.O.

“…The large area reduction projection optics with beam scanning of the PREVAIL proof-of-concept system is described as the result of an evolution of a variable…”
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Variable axis lens for electron beams by Pfeiffer, H. C., Langner, G. O., Sturans, M.

“…An electron optical focusing and deflection system for electron beam lithography has been developed which eliminates off-axis aberrations up to the third order…”
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PREVAIL: Theory of the proof of concept column electron optics by Stickel, W., Langner, G. O.

“…The PREVAIL proof-of-concept (POC) system is described elsewhere in these proceedings. For theoretical as well as practical reasons, the operating conditions…”
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Application of the generalized curvilinear variable axis lens to electron projection by Stickel, W., Langner, G. O.

“…The concept of the curvilinear variable axis lens (CVAL) has been introduced for the optics of projection reduction exposure with variable axis immersion…”
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Edge contrast: A new definition for comparative lithography tool characterization by Stickel, W., Langner, G. O.

“…A new definition called ‘‘edge contrast’’ is proposed for realistic resolution comparisons between tools of different beam technology. This new quantity does…”
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