Search Results - "Langan, J.G."

Ion energy distribution in NF/sub 3/ based process chamber cleaning discharges by Hsueh, H.P., Felker, B.S., McGrath, R.T., Langan, J.G.

“…Summary form only given. NF/sub 3/ based discharges are commonly used for cleaning residual silicon dioxide and nitride from plasma enhanced chemical vapor…”
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The role of diluent in NF/sub 3/ RF plasmas by Langan, J.G., Beck, S.E., Felker, B.S.

“…Summary form only given. Optical emission spectroscopy (OES) and a Langmuir probe were used to study the chemical and physical state of NF/sub 3/ RF plasma…”
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Materials selection for HBr service by Smudde, G.H., Bailey, W.I., Felker, B.S., George, M.A., Langan, J.G.

“…This study was undertaken to determine the compatibility of hydrogen bromide (HBr) with common materials of construction used for specialty gas delivery…”
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A process for removing moisture from metal surfaces and inhibiting water from readsorbing using organosilanes by Fine, S.M., Johnson, A.D., Langan, J.G., Pearce, R.V.

“…Summary form only given. The storage of ultra-high purity (UHP) gases is a critical issue to the electronics industry. To prepare a storage vessel or delivery…”
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Primary anorectal melanoma: an update by Carcoforo, P, Raiji, M T, Palini, G M, Pedriali, M, Maestroni, U, Soliani, G, Detroia, A, Zanzi, M V, Manna, A L, Crompton, J G, Langan, R C, Stojadinovic, A, Avital, I

“…The anorectum is a rare anatomic location for primary melanoma. Mucosal melanoma is a distinct biological and clinical entity from the more common cutaneous…”
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Examining process induced contamination: plasma etching and chemical vapor deposition reactors coupled to an in situ surface analytical capability by Bohling, D.A., George, M.A., Langan, J.G.

“…A comprehensive approach developed for the systematic examination of process induced contamination and reaction mechanisms seen during electronics processing…”
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