Search Results - "LEE, Joonmyoung"
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Investigation of State Stability of Low-Resistance State in Resistive Memory
Published in IEEE electron device letters (01-05-2010)“…We investigated the state stability of the low-resistance state (LRS) in a resistive switching memory having a Pt/Cu:MoO x /GdO x /Pt structure. Various…”
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Improved Switching Uniformity and Speed in Filament-Type RRAM Using Lightning Rod Effect
Published in IEEE electron device letters (01-01-2011)“…Improved switching uniformity and speed were demonstrated using a filament-type resistive memory. By using a gradual reset operation, a leaky high resistance,…”
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3
Parallel memristive filaments model applicable to bipolar and filamentary resistive switching
Published in Applied physics letters (12-09-2011)“…The concept of memristive filaments (MFs) is introduced, which is based on the memristors developed by the Hewlett-Packard group. The effects of key parameters…”
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Effect of Program/Erase Speed on Switching Uniformity in Filament-Type RRAM
Published in IEEE electron device letters (01-07-2011)“…We investigated the effect of program/erase speed on switching uniformity in filament-type resistive memory with Mo/SiO x /Pt structure. The RRAM device…”
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Excellent State Stability of Cu/SiC/Pt Programmable Metallization Cells for Nonvolatile Memory Applications
Published in IEEE electron device letters (01-05-2011)“…We have investigated silicon carbide (SiC) as a new programmable metallization cell material for nonvolatile memory applications. Our Cu/SiC/Pt devices showed…”
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Operation Voltage Control in Complementary Resistive Switches Using Heterodevice
Published in IEEE electron device letters (01-04-2012)“…For the high-density memory application of resistive random access memory (ReRAM), we study the complementary resistive switch (CRS) behavior of a HfO x -based…”
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Materials and process aspect of cross-point RRAM (invited)
Published in Microelectronic engineering (01-07-2011)“…A survey of non-volatile and highly scalable cross-point memory in nanoscale resistive switching device is introduced. We present the basic operation of…”
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Journal Article Conference Proceeding -
8
New Set/Reset Scheme for Excellent Uniformity in Bipolar Resistive Memory
Published in IEEE electron device letters (01-03-2011)“…We proposed a new set/reset operation scheme to improve the switching uniformity of filament-type resistive memory. By controlling the magnitude of the sweep…”
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Nanoscale Resistive Switching of a Copper-Carbon-Mixed Layer for Nonvolatile Memory Applications
Published in IEEE electron device letters (01-03-2009)“…The nanoscale resistance switching property of copper-carbon-mixed (Cu-C) layer was investigated for nonvolatile memory applications. The Cu-C layer of the…”
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Improved switching uniformity of a carbon-based conductive-bridge type ReRAM by controlling the size of conducting filament
Published in Microelectronic engineering (01-06-2011)“…We investigated the resistive switching properties of a amorphous carbon-based ReRAM device. In order to minimize the fluctuations of switching parameters, we…”
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Noise-Analysis-Based Model of Filamentary Switching ReRAM With \hbox/\hbox Stacks
Published in IEEE electron device letters (01-07-2011)“…In this letter, we propose a model based on noise analysis for the filamentary switching mechanism in resistance random access memory having ZrOx/HfOx bilayer…”
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12
Effect of \hbox\hbox\hbox Thermal Barrier on Reset Operations in Filament-Type Resistive Memory
Published in IEEE electron device letters (01-11-2011)“…We have investigated the effect of a Ge 2 Sb 2 Te 5 (GST) thermal barrier on the reset operations in TiN/Cu/SiC/Pt devices. When the GST film was introduced as…”
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13
Excellent Selector Characteristics of Nanoscale \hbox for High-Density Bipolar ReRAM Applications
Published in IEEE electron device letters (01-11-2011)“…We herein present a nanoscale vanadium oxide (VO 2 ) device with excellent selector characteristics such as a high on/off ratio (>; 50), fast switching speed…”
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14
Proton Irradiation Effects on Resistive Random Access Memory With ZrO /HfO Stacks
Published in IEEE transactions on nuclear science (01-12-2011)“…In this study, we investigated proton irradiation effects on resistive random access memory (ReRAM) comprising ZrO x /HfO x stacks. After irradiation, changes…”
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Multibit Operation of \hbox -Based ReRAM by Schottky Barrier Height Engineering
Published in IEEE electron device letters (01-04-2011)“…We demonstrated multibit operation using a 250-nm Ir/TiO x / TiN resistive random access memory by Schottky barrier height engineering. A Schottky barrier was…”
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Feasibility Study of \hbox/\hbox Resistive Random Access Memory in an Inverter Circuit for FPGA Applications
Published in IEEE electron device letters (01-12-2011)“…We proposed a Mo/SiO x /Pt resistive random access memory (RRAM) device as an alternative to static random access memory (SRAM) devices for field-programmable…”
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Analysis of copper ion filaments and retention of dual-layered devices for resistance random access memory applications
Published in Microelectronic engineering (01-07-2009)“…For improvement of switching uniformity, we propose a dual-layer structure with different resistance values in each layer. During the forming process, a…”
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Journal Article Conference Proceeding -
18
Effect of Fast Components in Threshold-Voltage Shift on Bias Temperature Instability in High- k MOSFETs
Published in IEEE electron device letters (01-04-2010)“…The effect of fast components in the threshold-voltage shift (¿V th ) induced by electrical stress on the lifetime of bias temperature instability (BTI) is…”
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19
Novel cross-point resistive switching memory with self-formed schottky barrier
Published in 2010 Symposium on VLSI Technology (01-06-2010)“…By characterizing the resistive switching state in Al/PCMO device, we propose, for the first time, the feasibility of cross-point memory without any selection…”
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Conference Proceeding -
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Impact of oxygen incorporation at the Si3N4∕Al2O3 interface on retention characteristics for nonvolatile memory applications
Published in Applied physics letters (14-07-2008)“…The correlation between properties of the Si3N4∕Al2O3 interface and retention degradation was investigated for metal-alumina-nitride-oxide-silicon-type flash…”
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