Search Results - "Kyu-Jeong Choi"
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Scaling Benefits for Active and Gate Insulator of Vertical Channel Thin-Film Transistors Using Atomic Layer Deposited InGaZnO Channel
Published in IEEE electron device letters (01-03-2024)“…In-Ga-Zn-O (IGZO) vertical-channel thin-film transistors (VTFTs) were fabricated with thickness scaling of the channel (<inline-formula> <tex-math…”
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Performance Enhancement of Self-Aligned Coplanar TFTs with ALD-IGZO Channels via Effective Doping from Interlayer Dielectric
Published in IEEE electron device letters (01-07-2023)“…A doping technique to form the conductive source/drain regions of self-aligned coplanar thin-film transistors (TFTs) employing In-Ga-Zn-O (IGZO) channels…”
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Device Feasibility of 60-nm-Scaled Vertical-Channel Memory Transistors Using InGaZnO Channel and ZnO Charge-Trap Layers
Published in IEEE transactions on electron devices (01-03-2024)“…A 60-nm channel length vertical-channel charge-trap memory (V-CTM) using oxide semiconductor channel was demonstrated for advanced memory applications…”
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Improvement in Short-Channel Effects of the Thin-Film Transistors Using Atomic-Layer Deposited In-Ga-Sn-O Channels With Various Channel Compositions
Published in IEEE transactions on electron devices (01-10-2022)“…In-Ga-Sn-O (IGTO) thin-film transistors (TFTs) were fabricated with channel lengths from <inline-formula> <tex-math notation="LaTeX">3 \mu \text{m}…”
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Geometrical and Structural Design Schemes for Trench-Shaped Vertical Channel Transistors Using Atomic-Layer Deposited In-Ga-Zn-O
Published in IEEE electron device letters (01-11-2022)“…Trench-structured In-Ga-Zn-O vertical thin-film transistors (T-VTFT) was fabricated with a channel length of 400 nm. T-VTFTs showed channel width-dependent…”
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Impact of Strategic Approaches for Improving the Device Performance of Mesa-shaped Nanoscale Vertical-Channel Thin-Film Transistors Using Atomic-Layer Deposited In–Ga–Zn–O Channel Layers
Published in Electronic materials letters (01-05-2022)“…The effect of two strategic approaches, such as modification of active layer geometry and control of active channel composition, were investigated to improve…”
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Insights on Asymmetrical Electrode Geometric Effect to Enhance Gate-Drain-Bias Stability of Vertical-Channel InGaZnO Thin-Film Transistor
Published in Electronic materials letters (01-11-2024)“…The asymmetrical gate-drain bias stress (GDBS) stability of a mesa-shaped vertical-channel thin-film transistors (VTFTs) was investigated using an In-Ga-Zn–O…”
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Thermomechanical properties and mechanical stresses of Ge2Sb2Te5 films in phase-change random access memory
Published in Thin solid films (28-11-2008)Get full text
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Sb-Se-based phase-change memory device with lower power and higher speed operations
Published in IEEE electron device letters (01-06-2006)“…A phase-change material of Sb/sub 65/Se/sub 35/ was newly proposed for the nonvolatile memory applications. The fabricated phase-change memory device using…”
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The effect of antimony-doping on Ge2Sb2Te5, a phase change material
Published in Thin solid films (01-10-2008)Get full text
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11
Polycrystalline silicon-germanium heating layer for phase-change memory applications
Published in Applied physics letters (31-07-2006)“…This letter reports on the performance improvement of phase-change memory (PCM) cells by applying silicon-germanium (SiGe) alloys as resistive heating layers…”
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12
Weighted-Sum Operation of Three-Terminal Synapse Transistors in Array Configuration Using Spin-Coated Li-Doped ZrO2 Electrolyte Gate Insulator
Published in ACS applied materials & interfaces (29-11-2023)“…Artificial synapses with ideal functionalities are essential in hardware neural networks to allow for energy-efficient analog computing. Electrolyte-gated…”
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13
Synergic strategies of composition-modified bilayer channel configuration and ozone-processed gate stacks for atomic-layer deposited In-Ga-Zn-O thin-film transistors
Published in Journal of alloys and compounds (15-06-2022)“…Composition-modified bilayer channel configuration was introduced for enhancing the device performance of In-Ga-Zn-O (IGZO) thin film transistors (TFTs), which…”
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14
Roles of Oxygen Interstitial Defects in Atomic-Layer Deposited InGaZnO Thin Films with Controlling the Cationic Compositions and Gate-Stack Processes for the Devices with Subμm Channel Lengths
Published in ACS applied materials & interfaces (13-07-2022)“…Roles of oxygen interstitial defects located in the In–Ga–Zn-O (IGZO) thin films prepared by atomic layer deposition were investigated with controlling the…”
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Combination of InZnO/InGaZnO Bi-layered channels prepared by atomic layer deposition and ozone-based gate-stack formation for guaranteeing high field-effect mobility and long-term stability of thin film transistors
Published in Ceramics international (15-07-2022)“…Bi-layered channel structures comprising In–Zn–O (IZO) prompt and In–Ga–Zn-O (IGZO) prime layers were introduced to enhance the carrier mobility of oxide thin…”
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Impact of Al2O3 spacers on the improvement in short-channel effects for the mesa-shaped vertical-channel In-Ga-Zn-O thin-film transistors with a channel length below 100 nm
Published in Materials science in semiconductor processing (01-03-2024)“…To achieve a channel length scaling and an improvement in short-channel effect (SCE) for the mesa-shaped vertical thin-film transistors (VTFTs) using…”
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Impact of channel thickness on device scaling in vertical InGaZnO channel charge-trap memory transistors with ALD Al2O3 tunneling layer
Published in Materials science in semiconductor processing (01-08-2024)“…This study investigates the impact of channel thickness (TCH) variation on memory performance and its physical origins in vertical channel charge trap memory…”
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Ferroelectric YMnO3 thin films grown by metal-organic chemical vapor deposition for metal/ferroelectric/semiconductor field-effect transistors
Published in Thin solid films (01-03-2001)Get full text
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Analysis on Contact Resistance and Effective Channel Length of Thin Film Transistors Using Composition-Modified In–Ga–Zn‑O Active Channels Prepared with Atomic Layer Deposition and Various Electrode Materials
Published in ACS applied electronic materials (27-12-2022)“…To verify the effects of process conditions for the TFTs employing In–Ga–Zn-O (IGZO) channels prepared by atomic layer deposition (ALD), such as cationic…”
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Optical and electrical properties of transparent conducting gallium-doped ZnO electrodes prepared by atomic layer deposition for application in organic solar cells
Published in Thin solid films (01-11-2013)“…Transparent and conducting gallium-doped ZnO electrodes were fabricated by means of atomic layer deposition. The electrode showed the lowest resistivity of…”
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