Search Results - "Kuzum, D."

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  1. 1

    On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates by Martens, K., Chi On Chui, Brammertz, G., De Jaeger, B., Kuzum, D., Meuris, M., Heyns, M., Krishnamohan, T., Saraswat, K., Maes, H.E., Groeseneken, G.

    Published in IEEE transactions on electron devices (01-02-2008)
    “…ldquoConventionalrdquo techniques and related capacitance-voltage characteristic interpretation were established to evaluate interface trap density on Si…”
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    Journal Article
  2. 2

    Ge (100) and (111) N- and P-FETs With High Mobility and Low- T Mobility Characterization by Kuzum, D., Pethe, A.J., Krishnamohan, T., Saraswat, K.C.

    Published in IEEE transactions on electron devices (01-04-2009)
    “…In this paper, we demonstrate high-mobility bulk Ge N- and P-FETs with GeON gate dielectric. The highest electron mobility to date in Ge is reported, and two…”
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    Journal Article
  3. 3

    Ge-Interface Engineering With Ozone Oxidation for Low Interface-State Density by Kuzum, D., Krishnamohan, T., Pethe, A.J., Okyay, A.K., Oshima, Y., Yun Sun, McVittie, J.P., Pianetta, P.A., McIntyre, P.C., Saraswat, K.C.

    Published in IEEE electron device letters (01-04-2008)
    “…Passivation of Ge has been a critical issue for Ge MOS applications in future technology nodes. In this letter, we introduce ozone oxidation to engineer…”
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    Journal Article
  4. 4

    Silicon Germanium CMOS Optoelectronic Switching Device: Bringing Light to Latch by Okyay, A.K., Kuzum, D., Latif, S., Miller, D.A.B., Saraswat, K.C.

    Published in IEEE transactions on electron devices (01-12-2007)
    “…We propose a novel semiconductor optoelectronic (OE) switch that is a fusion of a Ge optical detector and a Si metal-oxide-semiconductor (MOS) field-effect…”
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    Journal Article
  5. 5

    The Future of Holistic Neural Interfaces: 2D Materials, Neuromorphic Computing, and Computational Co-Design by Wilson, M., Ramezani, M., Kim, J., Kuzum, D.

    “…The next leap in implantable neural interfaces requires technological advances in materials, devices, and computing paradigms. Holistic approaches integrating…”
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    Conference Proceeding
  6. 6

    Synaptic electronics: materials, devices and applications by Kuzum, Duygu, Yu, Shimeng, Wong, H-S Philip

    Published in Nanotechnology (27-09-2013)
    “…In this paper, the recent progress of synaptic electronics is reviewed. The basics of biological synaptic plasticity and learning are described. The material…”
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    Journal Article
  7. 7

    An Electronic Synapse Device Based on Metal Oxide Resistive Switching Memory for Neuromorphic Computation by Shimeng Yu, Yi Wu, Jeyasingh, R., Kuzum, D., Wong, H. P.

    Published in IEEE transactions on electron devices (01-08-2011)
    “…The multilevel capability of metal oxide resistive switching memory was explored for the potential use as a single-element electronic synapse device. TiN/HfO x…”
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    Journal Article
  8. 8

    Low-Energy Robust Neuromorphic Computation Using Synaptic Devices by Kuzum, D., Jeyasingh, R. G. D., Shimeng Yu, Wong, H.-S P.

    Published in IEEE transactions on electron devices (01-12-2012)
    “…Brain-inspired computing is an emerging field, which aims to reach brainlike performance in real-time processing of sensory data. The challenges that need to…”
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    Journal Article
  9. 9

    Investigation of Trap Spacing for the Amorphous State of Phase-Change Memory Devices by Jeyasingh, R. G. D., Kuzum, D., Wong, H-S P.

    Published in IEEE transactions on electron devices (01-12-2011)
    “…The subthreshold conduction in the amorphous state of the phase-change material is dominated by the hopping of the carriers through the trap states or…”
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    Journal Article
  10. 10

    Ge (100) and (111) N- and P-FETs With High Mobility and Low-[Formula Omitted] Mobility Characterization by Kuzum, D, Pethe, A.J, Krishnamohan, T, Saraswat, K.C

    Published in IEEE transactions on electron devices (01-04-2009)
    “…In this paper, we demonstrate high-mobility bulk Ge N- and P-FETs with GeON gate dielectric. The highest electron mobility to date in Ge is reported, and two…”
    Get full text
    Journal Article
  11. 11

    N-Channel Germanium MOSFET Fabricated Below 360 ^\hbox by Cobalt-Induced Dopant Activation for Monolithic Three-Dimensional-ICs by Jin-Hong Park, Kuzum, D, Woo-Shik Jung, Saraswat, K C

    Published in IEEE electron device letters (01-03-2011)
    “…Below 360°C, we demonstrate germanium (Ge) n+/p junction diode and n-channel Ge metal-oxide-semiconductor field-effect transistor (MOSFET) with a low…”
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    Journal Article
  12. 12

    Phase Change Memory: Scaling and applications by Jeyasingh, R., Jiale Liang, Caldwell, M. A., Kuzum, D., Wong, H.-S P.

    “…Phase Change Memory (PCM) technology is a promising candidate for the future non-volatile memory applications. Scaling of PCM into the sub-10 nm regime has…”
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    Conference Proceeding
  13. 13

    Novel Si-based Optoelectronic Switching Device: Light to Latch by Okyay, A.K., Pethe, A.J., Kuzum, D., Latif, S., Miller, D.A.B., Saraswat, K.C.

    “…A novel, high performance optoelectronic switch is introduced. The device is a Si- MOSFET with Ge gate that can be fabricated at the nanoscale with very low…”
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    Conference Proceeding
  14. 14

    Experimental demonstration of high mobility Ge NMOS by Kuzum, D., Krishnamohan, T., Nainani, A., Yun Sun, Pianetta, P.A., Wong, H.S.-P., Saraswat, K.C.

    “…The highest electron mobility in Ge NMOS to-date, ~1.5 times the universal Si mobility, is demonstrated experimentally. Gate stack engineered with…”
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    Conference Proceeding
  15. 15

    Direct Measurement of Trap Spacing in Phase Change Memory Cells Using ATE Devices by Jeyasingh, R G D, Kuzum, D, Wong, H.-S P

    “…The electrical conduction in the amorphous state of the phase change material is through the localized states. The density of these trap states or the trap…”
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    Conference Proceeding
  16. 16

    Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and high-k/metal gate stack for monolithic 3D integration by Jin-Hong Park, Tada, M., Kuzum, D., Kapur, P., Hyun-Yong Yu, Wong, H.-S.P., Saraswat, K.C.

    “…We demonstrate high performance, 3D IC compatible, Ge n and p-MOSFETs fabricated at very low temperatures, below 380degC. The low temperature gate stack…”
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    Conference Proceeding
  17. 17

    Novel Si-based CMOS Optoelectronic Switching Device Operating in the Near Infrared by Okyay, A.K., Pethe, A.J., Kuzum, D., Latif, S., Miller, D.A.A., Saraswat, A.K.C.

    “…A novel, high performance optoelectronic switch is introduced. The device is a Si-MOSFET with Ge gate that can be fabricated at the nanoscale with very low…”
    Get full text
    Conference Proceeding