Search Results - "Kuzum, D"
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1
On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates
Published in IEEE transactions on electron devices (01-02-2008)“…ldquoConventionalrdquo techniques and related capacitance-voltage characteristic interpretation were established to evaluate interface trap density on Si…”
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Journal Article -
2
Ge (100) and (111) N- and P-FETs With High Mobility and Low- T Mobility Characterization
Published in IEEE transactions on electron devices (01-04-2009)“…In this paper, we demonstrate high-mobility bulk Ge N- and P-FETs with GeON gate dielectric. The highest electron mobility to date in Ge is reported, and two…”
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Journal Article -
3
Ge-Interface Engineering With Ozone Oxidation for Low Interface-State Density
Published in IEEE electron device letters (01-04-2008)“…Passivation of Ge has been a critical issue for Ge MOS applications in future technology nodes. In this letter, we introduce ozone oxidation to engineer…”
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Journal Article -
4
Silicon Germanium CMOS Optoelectronic Switching Device: Bringing Light to Latch
Published in IEEE transactions on electron devices (01-12-2007)“…We propose a novel semiconductor optoelectronic (OE) switch that is a fusion of a Ge optical detector and a Si metal-oxide-semiconductor (MOS) field-effect…”
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Journal Article -
5
The Future of Holistic Neural Interfaces: 2D Materials, Neuromorphic Computing, and Computational Co-Design
Published in 2022 International Electron Devices Meeting (IEDM) (03-12-2022)“…The next leap in implantable neural interfaces requires technological advances in materials, devices, and computing paradigms. Holistic approaches integrating…”
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Conference Proceeding -
6
Synaptic electronics: materials, devices and applications
Published in Nanotechnology (27-09-2013)“…In this paper, the recent progress of synaptic electronics is reviewed. The basics of biological synaptic plasticity and learning are described. The material…”
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Journal Article -
7
An Electronic Synapse Device Based on Metal Oxide Resistive Switching Memory for Neuromorphic Computation
Published in IEEE transactions on electron devices (01-08-2011)“…The multilevel capability of metal oxide resistive switching memory was explored for the potential use as a single-element electronic synapse device. TiN/HfO x…”
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Journal Article -
8
Low-Energy Robust Neuromorphic Computation Using Synaptic Devices
Published in IEEE transactions on electron devices (01-12-2012)“…Brain-inspired computing is an emerging field, which aims to reach brainlike performance in real-time processing of sensory data. The challenges that need to…”
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Journal Article -
9
Investigation of Trap Spacing for the Amorphous State of Phase-Change Memory Devices
Published in IEEE transactions on electron devices (01-12-2011)“…The subthreshold conduction in the amorphous state of the phase-change material is dominated by the hopping of the carriers through the trap states or…”
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Journal Article -
10
Ge (100) and (111) N- and P-FETs With High Mobility and Low-[Formula Omitted] Mobility Characterization
Published in IEEE transactions on electron devices (01-04-2009)“…In this paper, we demonstrate high-mobility bulk Ge N- and P-FETs with GeON gate dielectric. The highest electron mobility to date in Ge is reported, and two…”
Get full text
Journal Article -
11
N-Channel Germanium MOSFET Fabricated Below 360 ^\hbox by Cobalt-Induced Dopant Activation for Monolithic Three-Dimensional-ICs
Published in IEEE electron device letters (01-03-2011)“…Below 360°C, we demonstrate germanium (Ge) n+/p junction diode and n-channel Ge metal-oxide-semiconductor field-effect transistor (MOSFET) with a low…”
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Journal Article -
12
Phase Change Memory: Scaling and applications
Published in Proceedings of the IEEE 2012 Custom Integrated Circuits Conference (01-09-2012)“…Phase Change Memory (PCM) technology is a promising candidate for the future non-volatile memory applications. Scaling of PCM into the sub-10 nm regime has…”
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Conference Proceeding -
13
Novel Si-based Optoelectronic Switching Device: Light to Latch
Published in 2007 Conference on Lasers and Electro-Optics (CLEO) (01-05-2007)“…A novel, high performance optoelectronic switch is introduced. The device is a Si- MOSFET with Ge gate that can be fabricated at the nanoscale with very low…”
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Conference Proceeding -
14
Experimental demonstration of high mobility Ge NMOS
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01-12-2009)“…The highest electron mobility in Ge NMOS to-date, ~1.5 times the universal Si mobility, is demonstrated experimentally. Gate stack engineered with…”
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Conference Proceeding -
15
Direct Measurement of Trap Spacing in Phase Change Memory Cells Using ATE Devices
Published in 2011 3rd IEEE International Memory Workshop (IMW) (01-05-2011)“…The electrical conduction in the amorphous state of the phase change material is through the localized states. The density of these trap states or the trap…”
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Conference Proceeding -
16
Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and high-k/metal gate stack for monolithic 3D integration
Published in 2008 IEEE International Electron Devices Meeting (01-12-2008)“…We demonstrate high performance, 3D IC compatible, Ge n and p-MOSFETs fabricated at very low temperatures, below 380degC. The low temperature gate stack…”
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Conference Proceeding -
17
Novel Si-based CMOS Optoelectronic Switching Device Operating in the Near Infrared
Published in OFC/NFOEC 2007 - 2007 Conference on Optical Fiber Communication and the National Fiber Optic Engineers Conference (01-03-2007)“…A novel, high performance optoelectronic switch is introduced. The device is a Si-MOSFET with Ge gate that can be fabricated at the nanoscale with very low…”
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Conference Proceeding