Transparent, amorphous and organics-free ZnO thin films produced by chemical solution deposition at 150A degree C

We have studied the low-temperature processing of ZnO by chemical solution deposition. A transparent, stable precursor solution prepared from zinc acetate dihydrate dissolved in 2-methoxyethanol was spin-coated on SiO x /Si, soda-lime glass and polymer substrates and heated at 150A degree C. Selecte...

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Bibliographic Details
Published in:Thin solid films Vol. 518; no. 18; pp. 5134 - 5139
Main Authors: Tellier, J, KusAeer, D, MaliAe, B, Cilensek, J, Aakarabot, M, KovaAe, J, Goncalves, G, MuseviAe, I, Kosec, M
Format: Journal Article
Language:English
Published: 01-07-2010
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Summary:We have studied the low-temperature processing of ZnO by chemical solution deposition. A transparent, stable precursor solution prepared from zinc acetate dihydrate dissolved in 2-methoxyethanol was spin-coated on SiO x /Si, soda-lime glass and polymer substrates and heated at 150A degree C. Selected thin films deposited on SiO x /Si were additionally heated at 450A degree C. Microstructural and chemical analyses showed that the thin films heated at 150A degree C in air were amorphous, contained no organic residues and had a root mean square roughness of 0.7nm. The films deposited on SiO x /Si and heated at 450A degree C were crystallised and consisted of randomly oriented grains with a diameter of about 20nm. All thin films were transparent, exhibiting a transmission of over 80% in the visible range. The resistivity of the 120-nm thick ZnO films processed at 150A degree C was 57MI[copycm and upon heating at 450A degree C it decreased to 1.9kI.
Bibliography:ObjectType-Article-2
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ISSN:0040-6090
DOI:10.1016/j.tsf.2010.03.010