Search Results - "Kuo-Hsing Kao"
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Direct and Indirect Band-to-Band Tunneling in Germanium-Based TFETs
Published in IEEE transactions on electron devices (01-02-2012)“…Germanium is a widely used material for tunnel FETs because of its small band gap and compatibility with silicon. Typically, only the indirect band gap of Ge…”
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2
Fabrication of Vertically Stacked Nanosheet Junctionless Field-Effect Transistors and Applications for the CMOS and CFET Inverters
Published in IEEE transactions on electron devices (01-09-2020)“…In this study, conventional CMOS and complementary field-effect transistor (CFET) inverters based on a vertically stacked-nanosheet (NS) structure were…”
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3
A Dopingless FET With Metal-Insulator-Semiconductor Contacts
Published in IEEE electron device letters (01-01-2017)“…By adopting the charge-plasma concept, dopingless FETs with metal-semiconductor and metal-insulator-semiconductor (MIS) contacts in parallel at the…”
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4
Subthreshold Swing Saturation of Nanoscale MOSFETs Due to Source-to-Drain Tunneling at Cryogenic Temperatures
Published in IEEE electron device letters (01-09-2020)“…According to quantum transport simulations, source-to-drain tunneling (SDT) has been recognized as the main cause leading to subthreshold swing (SS) saturation…”
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5
Optimization of Gate-on-Source-Only Tunnel FETs With Counter-Doped Pockets
Published in IEEE transactions on electron devices (01-08-2012)“…We investigate a promising tunnel FET configuration having a gate on the source only, which is simultaneously exhibiting a steeper subthreshold slope and a…”
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6
Device simulations with A U-Net model predicting physical quantities in two-dimensional landscapes
Published in Scientific reports (13-01-2023)“…Although Technology Computer-Aided Design (TCAD) simulation has paved a successful and efficient way to significantly reduce the cost of experiments under the…”
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7
Impacts of the Shell Doping Profile on the Electrical Characteristics of Junctionless FETs
Published in IEEE transactions on electron devices (01-11-2015)“…This paper presents the impacts of an advanced shell doping profile (SDP) on the electrical characteristics of a junctionless (JL) FET in terms of OFF-current,…”
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8
Quantum Mechanical Performance Predictions of p-n-i-n Versus Pocketed Line Tunnel Field-Effect Transistors
Published in IEEE transactions on electron devices (01-07-2013)“…The tunnel field-effect transistor (TFET) is a promising candidate to replace the metal-oxide-semiconductor field-effect transistor in advanced technology…”
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9
First Demonstration of Ferroelectric Tunnel Thin-Film Transistor Nonvolatile Memory With Polycrystalline-Silicon Channel and HfZrO } Gate Dielectric
Published in IEEE transactions on electron devices (01-11-2022)“…In this work, the nonvolatile memory constructed on the tunnel thin-film transistors (tunnel-TFTs) using polycrystalline-silicon channel featuring…”
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10
Impact of Nanosheet Thickness on Performance and Reliability of Polycrystalline-Silicon Thin-Film Transistors With Double-Gate Operation
Published in IEEE transactions on nanotechnology (2023)“…In this work, the polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) with double gates and nanosheet (NSH) channel structures were fabricated to…”
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11
Inherent Dipole Layer Formation Driven by Surface Energy at Nonplanar Dielectric Interface
Published in IEEE transactions on electron devices (01-01-2021)“…This work investigates the correlation between dipole formation and surface energy at a nonplanar dielectric interface on a Si nanowire (NW) by means of…”
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12
Significance of Multivalley and Nonparabolic Band Structure for GeSn TFET Simulation
Published in IEEE transactions on electron devices (01-10-2018)“…It is well known that there is a critical Sn content for a GeSn alloy, at which the conduction band edges at <inline-formula> <tex-math notation="LaTeX">{L}…”
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13
Counterdoped Pocket Thickness Optimization of Gate-on-Source-Only Tunnel FETs
Published in IEEE transactions on electron devices (01-01-2013)“…The optimized tunnel field-effect transistor with a gate electrode overlapping the source region exhibits a steeper subthreshold swing (SS) and a higher…”
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14
Undoped and Doped Junctionless FETs: Source/Drain Contacts and Immunity to Random Dopant Fluctuation
Published in IEEE electron device letters (01-06-2017)“…By using numerical simulations, we demonstrate that a proper source/drain contacting strategy not only boosts the on-currents, but also eliminates random…”
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15
Insight into Latchup Risk in 28nm Planar Bulk Technology for Quantum Computing Applications
Published in 2024 IEEE International Reliability Physics Symposium (IRPS) (14-04-2024)“…In this work, impact of cryogenic operation temperatures on latchup in 28nm planar bulk CMOS technology is discussed for quantum computing applications…”
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Conference Proceeding -
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Impact of Semiconductor Permittivity Reduction on Electrical Characteristics of Nanoscale MOSFETs
Published in IEEE transactions on electron devices (01-06-2019)“…The dielectric screening property of a semiconductor is very crucial for the electrical characteristics of a MOSFET, and which can be described mathematically…”
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17
Improving the Electrical Performance of a Quantum Well FET With a Shell Doping Profile by Heterojunction Optimization
Published in IEEE transactions on electron devices (01-09-2017)“…This paper investigates the impacts of typical semiconductor material properties-electron affinity, bandgap, and dielectric constant, on the electrical…”
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18
Modeling the impact of junction angles in tunnel field-effect transistors
Published in Solid-state electronics (01-03-2012)“…► Modeling the dominant tunnel path length of tunnel-FETs for various junction angles. ► Large tunnel areas predominate the improvement for junction angles…”
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19
Reliability Mechanisms of LTPS-TFT With [Formula Omitted] Gate Dielectric: PBTI, NBTI, and Hot-Carrier Stress
Published in IEEE transactions on electron devices (01-05-2008)“…In this paper, a comprehensive study of the reliability mechanisms of high-performance low-temperature polycrystalline-Si thin-film transistor (LTPS-TFT) with…”
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20
Characteristics of PBTI and Hot Carrier Stress for LTPS-TFT With High- \kappa Gate Dielectric
Published in IEEE electron device letters (01-02-2008)“…In this letter, the characteristics of positive bias temperature instability (PBTI) and hot carrier stress (HCS) for the low-temperature poly-Si thin-film…”
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Journal Article