Search Results - "Kuniharu Nagashima, Kuniharu Nagashima"

IMPROVEMENT OF PROPERTY OF Pb(ZrxTi1-x)O3 THIN FILM PREPARED BY SOURCE GAS PULSE-INTRODUCED METALORGANIC CHEMICAL VAPOR DEPOSITION by Nagashima, K, Aratani, M, Funakubo, H

“…Pb(Zr, Ti)O3 (PZT) thin films with Zr/(Zr+Ti) of 0.42 were prepared on (111)Pt/Ti/SiO2/Si substrates at 620 C by MOCVD. Authors attempted the pulse…”
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COMPOSITION CONTROL OF Pb(ZrxTi1-x)O3 THIN FILMS PREPARED BY METALORGANIC CHEMICAL VAPOR DEPOSITION by Nagashima, K, Funakubo, H

“…PbO, ZrO2, TiO2 and Pb(ZrxTi1-x)O3 (PZT) films were prepared by MOCVD using Pb(C11H19O2)2, Zr(O*t-C4H9)4, Ti(O*i-C3H7)4 and O2 as source materials. The…”
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Simultaneous Observation of Ferroelectric Domain Patterns by Scanning Nonlinear Dielectric Microscope and Surface Morphology by Atomic Force Microscope by Hiroyuki Odagawa, Hiroyuki Odagawa, Yasuo Cho, Yasuo Cho, Hiroshi Funakubo, Hiroshi Funakubo, Kuniharu Nagashima, Kuniharu Nagashima

“…A new type of scanning nonlinear dielectric microscope (SNDM), with an additional function of simultaneous observations of surface morphology, has been…”
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Epitaxially grown ferroelectric thin films for memory applications (ferroelectric random access memories) by Funakubo, Hiroshi, Oikawa, Takahiro, Yokoyama, Shintaro, Nagashima, Kuniharu, Nakaki, Hiroshi, Fujisawa, Takashi, Ikariyama, Rikyu, Yasui, Shintaro, Saito, Keisuke, Morioka, Hitoshi, Han, Hee, Baik, Sunggi, Kim, Yong Kwan, Suzuki, Toshimasa

“…Tetragonal Pb(Zr, Ti)O 3 films were epitaxially grown on SrRuO 3 -coated SrTiO 3 substrates by metal organic chemical vapor deposition. Perfect…”
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PREPARATION OF Pb(Zrx, Ti1-x)O3 THIN FILMS BY SOURCE GAS PULSE-INTRODUCED METALORGANIC CHEMICAL VAPOR DEPOSITION by Aratani, M, Nagashima, K, Funakubo, H

“…Authors prepared Pb(Zrx, Ti1-x)O3 [PZT] thin films on (111)Pt/Ti/SiO2/Si substrates at 620 C by MOCVD. PZT [Zr/(Zr+Ti)=0.68] thin films of different…”
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Super-multipoint thickness measurement technology using optical macro inspection system by Hamada, Takayuki, Nagashima, Kuniharu, Kanda, Naoki, Sato, Nao, Takeda, Kuniaki, Kawano, Junya

“…In this report, a new technology of entire wafer surface film thickness measurement is explained. The technology provides an extra-fine map of entire wafer…”
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PREPARATION OF Al-DOPED PbTiO3 THIN FILMS BY METALORGANIC CHEMICAL VAPOR DEPOSITION AND THEIR CHARACTERIZATION by Aratani, M, Nagashima, K, Iijima, T, Mizuhira, M, Funakubo, H

“…Al-doped PbTiO3, Pb(Al, Ti)O3, thin films were prepared by MOCVD from the Pb(C11H19O2)2-Al(O.n-C3H7)3-Ti(O.i-C3H7)4-O2 system. Al content of the film could be…”
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Improvement of Property of Pb(Zr x Ti 1-x )O 3 Thin Film Prepared by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition by Nagashima, Kuniharu, Aratani, Masanori, Funakubo, Hiroshi

“…Pb(Zr, Ti)O 3 (PZT) thin films with Zr/(Zr+Ti) of 0.42 were prepared on (111)Pt/Ti/SiO 2 /Si substrates at 620°C by metalorganic chemical vapor deposition…”
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Composition Control of Pb(Zr x Ti 1-x )O 3 Thin Films Prepared by Metalorganic Chemical Vapor Deposition by Nagashima, Kuniharu, Funakubo, Hiroshi

“…PbO, ZrO 2 , TiO 2 and Pb(Zr x Ti 1- x )O 3 (PZT) films were prepared by metalorganic chemical vapor deposition (MOCVD) using Pb(C 11 H 19 O 2 ) 2 , Zr(O·t-C 4…”
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Preparation of Pb(Zr x , Ti 1-x )O 3 Thin Films by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition by Aratani, Masanori, Nagashima, Kuniharu, Funakubo, Hiroshi

“…We prepared Pb(Zr x , Ti 1- x )O 3 [PZT] thin films on (111)Pt/Ti/SiO 2 /Si substrates at 620°C by metalorganic chemical vapor deposition (MOCVD). PZT…”
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Comparison of deposition behavior of Pb(Zr, Ti)O3 films and its end-member-oxide films prepared by MOCVD by FUNAKUBO, H, NAGASHIMA, K, SHINOZAKI, K, MIZUTANI, N

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Comparison of deposition behavior of Pb(Zr,Ti)O 3 films and its end-member-oxide films prepared by MOCVD by Funakubo, Hiroshi, Nagashima, Kuniharu, Shinozaki, Kazuo, Mizutani, Nobuyasu

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Comparison of deposition behavior of Pb(Zr,Ti)O sub(3) films and its end-member-oxide films prepared by MOCVD by Funakubo, Hiroshi, Nagashima, Kuniharu, Shinozaki, Kazuo, Mizutani, Nobuyasu

“…Pb(Zr,Ti)O sub(3)(PZT) and end-member single oxide, PbO, ZrO sub(2) and TiO sub(2), films were deposited by metalorganic chemical vapor deposition (MOCVD) from…”
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Preparation of Al-doped PbTiO 3 Thin Films by Metalorganic Chemical Vapor Deposition and Their Characterization by Aratani, Masanori, Nagashima, Kuniharu, Iijima, Takashi, Mizuhira, Manabu, Funakubo, Hiroshi

“…Alminium-doped PbTiO 3 , Pb(Al, Ti)O 3 , thin films were prepared by metalorganic chemical vapor deposition from the Pb(C 11 H 19 O 2 ) 2 –Al(O·n-C 3 H 7 ) 3…”
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