Search Results - "Kumar, M. Jagadesh"
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Novel Attributes of a Dual Material Gate Nanoscale Tunnel Field-Effect Transistor
Published in IEEE transactions on electron devices (01-02-2011)“…In this paper, we propose the application of a dual material gate (DMG) in a tunnel field-effect transistor (TFET) to simultaneously optimize the on-current,…”
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Controlling Ambipolar Current in Tunneling FETs Using Overlapping Gate-on-Drain
Published in IEEE journal of the Electron Devices Society (01-11-2014)“…In this paper, we have demonstrated that overlapping the gate on the drain can suppress the ambipolar conduction, which is an inherent property of a tunnel…”
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Dielectric-Modulated Impact-Ionization MOS Transistor as a Label-Free Biosensor
Published in IEEE electron device letters (01-12-2013)“…In this letter, we propose a dielectric-modulated impact-ionization MOS (DIMOS) transistor-based sensor for application in label-free detection of…”
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Vertical Bipolar Charge Plasma Transistor with Buried Metal Layer
Published in Scientific reports (19-01-2015)“…A self-aligned vertical Bipolar Charge Plasma Transistor (V-BCPT) with a buried metal layer between undoped silicon and buried oxide of the…”
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Impact of gate leakage considerations in tunnel field effect transistor design
Published in Japanese Journal of Applied Physics (01-07-2014)“…In this paper, we have presented the impact of the gate leakage through thin gate dielectrics (SiO2 and high-κ gate dielectric) on the subthreshold…”
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The Ground Plane in Buried Oxide for Controlling Short-Channel Effects in Nanoscale SOI MOSFETs
Published in IEEE transactions on electron devices (01-06-2008)“…The ground plane (GP) concept is one of the techniques used to reduce the drain-induced barrier lowering (DIBL) in nanoscale MOSFETs and is effective only when…”
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Compact Analytical Model of Dual Material Gate Tunneling Field-Effect Transistor Using Interband Tunneling and Channel Transport
Published in IEEE transactions on electron devices (01-06-2014)“…In this paper, we have developed a 2-D analytical model for surface potential and drain current for a long channel dual material gate (DMG)…”
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Doping-Less Tunnel Field Effect Transistor: Design and Investigation
Published in IEEE transactions on electron devices (01-10-2013)“…Using calibrated simulations, we report a detailed study of the doping-less tunnel field effect transistor (TFET) on a thin intrinsic silicon film using charge…”
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Compact Analytical Drain Current Model of Gate-All-Around Nanowire Tunneling FET
Published in IEEE transactions on electron devices (01-07-2014)“…In this paper, we propose a 2-D analytical model for surface potential and drain current for a long channel p-type gate-all-around nanowire tunneling field…”
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A pseudo 2-D surface potential model of a dual material double gate junctionless field effect transistor
Published in Journal of computational electronics (01-09-2015)“…In this paper, we have developed a pseudo two-dimensional (2-D) analytical model for the surface potential of a dual-material double-gate junctionless…”
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Bipolar Charge-Plasma Transistor: A Novel Three Terminal Device
Published in IEEE transactions on electron devices (01-04-2012)“…A distinctive approach for forming a lateral bipolar charge-plasma transistor (BCPT) is explored using 2-D simulations. Different metal work-function…”
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Schottky Collector Bipolar Transistor Without Impurity Doped Emitter and Base: Design and Performance
Published in IEEE transactions on electron devices (01-09-2013)“…In this brief, we report an alternative approach of implementing a Schottky collector bipolar transistor without doping the ultrathin silicon-on-insulator…”
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Recessed source concept in nanoscale vertical surrounding gate (VSG) MOSFETs for controlling short-channel effects
Published in Physica. E, Low-dimensional systems & nanostructures (01-02-2009)“…In the recent past, vertical surrounding gate (VSG) MOSFETs have gained importance since defining their nanoscale channel length no longer depends on…”
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Investigation of a new modified source/drain for diminished self-heating effects in nanoscale MOSFETs using computer simulation
Published in Physica. E, Low-dimensional systems & nanostructures (01-06-2006)“…In this paper, we demonstrate that by introducing a buried oxide in a bulk MOSFET only under the source and drain regions, i.e., using an oxygen implanted…”
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Compact Surface Potential Model for FD SOI MOSFET Considering Substrate Depletion Region
Published in IEEE transactions on electron devices (01-03-2008)“…In this paper, by solving the 1-D Poisson equation using appropriate boundary conditions, we report a closed-form surface potential solution for all the three…”
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Analytical drain current model for nanoscale strained-Si SiGe MOSFETs
Published in Compel (06-03-2009)“…Purpose - The purpose of this paper is to present an analytical drain current model for output characteristics of strained-Si SiGe bulk MOSFET.Design…”
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A New Buried-Oxide-In-Drift-Region Trench MOSFET With Improved Breakdown Voltage
Published in IEEE electron device letters (01-09-2009)“…In this letter, we propose a new trench-gate power MOSFET with buried oxide in its drift region that shows an improvement in the breakdown performance as…”
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Compact Analytical Threshold-Voltage Model of Nanoscale Fully Depleted Strained-Si on Silicon-Germanium-on-Insu lator (SGOI) MOSFETs
Published in IEEE transactions on electron devices (01-03-2007)“…In this paper, a physically based analytical threshold-voltage model is developed for nanoscale strained-Si on silicon-germanium-on-insulator MOSFETs for the…”
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Molecular diodes and applications
Published in Recent patents on nanotechnology (01-02-2007)“…Due to the huge power consumption and expensive fabrication methods required, down scaling silicon devices to sub-100 nm dimensions is becoming very…”
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