Search Results - "Kudryashov, V.A."

Resistance of microcrystalline and nanocrystalline Cu/Cr pseudo-alloys to vacuum discharge by Kuskov, K.V., Rogachev, A.S., Vadchenko, S.G., Shkodich, N.F., Rouvimov, S., Shchukin, A.S., Illarionova, E.V., Kudryashov, V.A., Mukasyan, A.S.

“…Microcrystalline and nanocrystalline Cu/Cr pseudo-alloy electrodes were prepared from elemental powders using high-energy ball milling and spark plasma…”
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A new ‘2D to 3D’ X-ray lithography technology for gray scale structures by Kudryashov, V.A., Lee, Sing

“…A new ‘2D to 3D’ technology for gray scale structure production developed originally for e-beam lithography is successfully extended to X-ray lithography. A…”
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A new e-beam method for grey scale 3D optical elements by Kudryashov, V.A., Prewett, P.D., Michette, A.G.

“…A new e-beam lithography grey scale method has been developed for phase shift optical elements production. It could be used only for 3D elements with lateral…”
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A simple new method for the investigation of process latitude in E-beam lithography with positive resists by Kudryashov, V.A., Prewett, P.D., Michette, A.G.

“…SEM linewidth measurement in the process latitude investigation procedure can be replaced with a resist reflow technique for PMMA and other positive resists…”
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Low voltage e-beam irradiation: a new tool for suppression of airborne contamination effects in positive chemically amplified resists by Kudryashov, V.A., Prewett, P.D., Michette, A.G.

“…An experimental investigation at energies of 2–6keV has been carried out on the positive chemically amplified resist AZPF 514. A new way of suppressing the…”
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Microfabrication of ultrathin free-standing platinum foils by Aristov, V.V, Kazmiruk, V.V, Kudryashov, V.A, Levashov, V.I, Red'kin, S.I, Hagen, C.W, Kruit, P

“…In this paper a process for the microfabrication of ultrathin (5 nm) free-standing Pt foils is described. A Pt foil is deposited by means of laser ablation on…”
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Low energy electron beam lithography: Pattern distortion by charge trapped in the resist by Kudryashov, V.A., Krasnov, V.V., Prewett, P.D., Hall, T.J.

“…Experimental investigation of low voltage beam deflection during thick PMMA resist layer exposure was carried out and a simple mathematical model of the…”
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Electron beam lithography using chemically-amplified resist: Resolution and profile control by Kudryashov, V.A., Krasnov, V.V., Huq, S.E., Prewett, P.D., Hall, T.J.

“…The effect of post exposure bake and softbake conditions on the sensitivity of AZPN114 has been investigated experimentally. A bilayer system for undercut…”
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Process latitude enhancement for 3D structure formation in e-beam lithography by Kudryashov, V.A., Krasnov, V.V., Prewett, P.D., Hall, T.J.

“…Investigation of the positive resist dissolution process under low-energy e-beam exposure has given rise to a new technology of 3D structure formation. This…”
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A novel low-voltage ballistic-electron-emission source by Hagen, C.W., van Bakel, G.P.E.M., Borgonjen, E.G., Kruit, P., Kazmiruk, V.V., Kudryashov, V.A.

“…A novel tunnel junction emitter based on ballistic electron transmission through ultra-thin metal foils is proposed as an electron source. From a simple planar…”
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