Search Results - "Kudriavtsev, V.V."

Computational study of SF/sub 6//Ar plasma at low pressure etch regime by Kolobov, V.I., Kudriavtsev, V.V.

“…Summary form only given, as follows. Sulfur hexafluoride plasma discharges are presently used for a variety of plasma etch applications, ranging from MEMS…”
Get full text

Carbonization behaviour of some polyimide resins reinforced with carbon fibers by Yudin, V.E., Goykhman, M.Ya, Balik, K., Glogar, P., Gubanova, G.N., Kudriavtsev, V.V.

“…It was shown that the low weight loss makes the polyimide resins based on acetyl derivatives of aromatic diamines a promising candidate for carbon–carbon…”
Get full text

Thermally stable polyimide binders from aromatic dianhydrides and acetyl derivatives of aromatic diamines: Formation mechanism by Goykhman, M. Ya, Svetlichnyi, V. M., Kudriavtsev, V. V., Antonov, N. G., Panov, Yu. N., Gribanov, A. V., Yudin, V. E.

“…Polyimide resins based on dianhydrides of aromatic tetracarboxylic acids and acetyl derivatives of aromatic diamines have been developed for impregnating…”
Get full text