Search Results - "Kreindl, G."

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  1. 1

    Fully automated hot embossing processes utilizing high resolution working stamps by Glinsner, T., Veres, T., Kreindl, G., Roy, E., Morton, K., Wieser, T., Thanner, C., Treiblmayr, D., Miller, R., Lindner, P.

    Published in Microelectronic engineering (01-05-2010)
    “…Nanoimprint lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometer down to few nanometers range. This paper…”
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    Journal Article Conference Proceeding
  2. 2

    Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp by MUEHIBERGER, M, BOEHM, M, PLATZGUMMER, E, LOESCHNER, H, JOECHL, P, EDER-KAPI, S, NARZT, T, LAUSECKER, E, FROMHERZ, T, BERGMAIR, I, CHOUIKI, M, SCHOEFTNER, R, KREINDL, G, KAST, M, TREIBLMAYR, D, GLINSNER, T, MILLER, R

    Published in Microelectronic engineering (01-08-2011)
    “…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp - working…”
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    Conference Proceeding Journal Article
  3. 3

    High accuracy step-and-repeat uv imprint lithography for wafer level camera master manufacturing by Kreindl, G, Glinsner, T, Födisch, R, Treiblmayr, D, Miller, R

    “…This work demonstrates unmatched needs for wafer-level camera applications like lateral lens to lens position accuracies of <; ± 200 nm on arbitrary x and y…”
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    Conference Proceeding
  4. 4

    Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nmhp by Muehlberger, M., Boehm, M., Bergmair, I., Chouiki, M., Schoeftner, R., Kreindl, G., Kast, M., Treiblmayr, D., Glinsner, T., Miller, R., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Narzt, T., Lausecker, E., Fromherz, T.

    Published in Microelectronic engineering (01-08-2011)
    “…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp – working…”
    Get full text
    Journal Article
  5. 5

    High throughput parallel micro and nano-scale replication - a low cost alternative for the fabrication of electronic-, optic- and microfluidic devices by Kreindl, G., Miller, R., Thanner, C., Schachinger, M., Hangweier, P.

    “…Nanoimprint Lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometers down to a few nanometers. This paper…”
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    Conference Proceeding
  6. 6

    CMOS image sensor wafer-level packaging by Matthias, T., Kreindl, G., Dragoi, V., Wimplinger, M., Lindner, P.

    “…This article presents the advances in wafer-level processing and integration techniques for CMOS image sensor module manufacturing. CMOS image sensors gave…”
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    Conference Proceeding
  7. 7

    Method for the simultaneous determination of traces of atrazine, pyrazon and lindane for monitoring potable water supplies by Kreindl, T G, Malissa, H, Winsauer, K

    Published in Mikrochimica acta (1966) (01-01-1986)
    “…In an analytical procedure developed for the simultaneous determination of atrazine, lindane and pyrazon in groundwater, trace levels of these pesticides were…”
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    Journal Article
  8. 8

    Low temperature packaging of BioMEMS and Lab-on-chip devices by Matthias, T., Miller, R., Thanner, C., Burgstaller, D., Kreindl, G., Dragoi, V., Kettner, P., Lindner, P.

    “…BioMEMS in general and specifically Lab-on-chip devices for point-of-care diagnostics offer tremendous potential to improve the health care situation in…”
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    Conference Proceeding
  9. 9