Search Results - "Kovalgin, Alexei yu"
-
1
Remote plasma-enhanced CVD of silicon nitride films: effects of diluting nitrogen with argon. Part I: effect on nitrogen plasma parameters studied by emission spectroscopy
Published in Advanced materials for optics and electronics (01-01-1998)“…In a series of two papers we describe the effect of argon dilution of the nitrogen passed through the RF discharge region on the plasma composition, growth…”
Get full text
Journal Article -
2
Remote plasma-enhanced CVD of silicon nitride films: effects of diluting nitrogen with argon. Part II: effect of nitrogen plasma parameters on layer characteristics
Published in Advanced materials for optics and electronics (01-01-1998)“…In Part I we reported the results of an emission spectroscopic study of the plasma obtained in an SiH4–N2–Ar mixture. It was shown that argon in metastable…”
Get full text
Journal Article