Search Results - "Kong, W.M.T."

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  1. 1

    50-nm Metamorphic High-Electron-Mobility Transistors With High Gain and High Breakdown Voltages by Dong Xu, Kong, W.M.T., Xiaoping Yang, Mohnkern, L., Seekell, P., Mt. Pleasant, L., Duh, K.G., Smith, P.M., Pane-Chane Chao

    Published in IEEE electron device letters (01-08-2009)
    “…We report the design, fabrication, and characterization of ultrahigh-gain metamorphic high-electron-mobility transistors (MHEMTs) with significantly enhanced…”
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    Journal Article
  2. 2

    Asymmetrically Recessed 50-nm Gate-Length Metamorphic High Electron-Mobility Transistor With Enhanced Gain Performance by Dong Xu, Kong, W.M.T., Xiaoping Yang, Smith, P.M., Dugas, D., Chao, P.C., Cueva, G., Mohnkern, L., Seekell, P., Pleasant, L.Mt, Schmanski, B., Duh, K.H.G., Karimy, H., Immorlica, A., Komiak, J.J.

    Published in IEEE electron device letters (01-01-2008)
    “…We report the design, fabrication and characterization of ultrahigh gain metamorphic high electron-mobility transistors. In this letter, a high-yield 50-nm…”
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    Journal Article
  3. 3

    Design and fabrication of a wideband 56- to 63-GHz monolithic power amplifier with very high power-added efficiency by Tang, O.S.A., Liu, S.M.J., Chao, P.C., Kong, W.M.T., Hwang, K.C., Nichols, K., Heaton, J.

    Published in IEEE journal of solid-state circuits (01-09-2000)
    “…This paper describes the design, fabrication, and measurement of a wideband 60 GHz monolithic microwave integrated circuit (MMIC) power amplifier that has…”
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    Journal Article
  4. 4

    Very high efficiency V-band power InP HEMT MMICs by Kong, W.M.T., Wang, S.C., Pane-Chane Chao, Der-Wei Tu, Kuichul Hwang, Tang, O.S.A., Shih-Ming Liu, Pin Ho, Nichols, K., Heaton, J.

    Published in IEEE electron device letters (01-11-2000)
    “…State-of-the-art power performance of a V-band InP HEMT MMIC is reported using a slot via process for reducing source inductance and a fully selective gate…”
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    Journal Article
  5. 5

    Scaling behaviors of 25-NM asymmetrically recessed metamorphic high electron-mobility transistors by Dong Xu, Kong, W.M.T., Xiaoping Yang, Seekell, P., Mohnkern, L., Pleasant, L.M., Karimy, H., Duh, K.H.G., Smith, P.M., Chao, P.C.

    “…This paper reports the scaling behaviors of 25-nm asymmetrically recessed metamorphic high electron-mobility transistors. By employing an optimized epitaxial…”
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    Conference Proceeding