Search Results - "Kon’kov, O.I"

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  1. 1

    Modification of the structure and percolation of current in an array of single-walled carbon nanotubes by Prikhod’ko, A. V., Kon’kov, O. I.

    Published in Physics of the solid state (01-07-2014)
    “…Percolation and electrical instability processes in an array of single-walled carbon nanotubes have been studied experimentally. The experiment is based on…”
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  2. 2

    Percolation, self-organized criticality, and electrical instability in carbon nanostructures by Prikhod’ko, A. V., Kon’kov, O. I.

    Published in Physics of the solid state (01-11-2012)
    “…The processes of avalanche formation, percolation, and electrical instability have been investigated experimentally using multi-walled and single-walled carbon…”
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  3. 3

    On the collection of photocarriers in high-resistance silicon amorphous-crystalline heterostructures by Kotina, I. M., Danishevskii, A. M., Kon’kov, O. I., Terukov, E. I., Tuhkonen, L. M.

    Published in Semiconductors (Woodbury, N.Y.) (01-09-2014)
    “…The mechanism of electron transport in amorphous-crystalline heterostructures fabricated on the basis of high-resistivity p -Si is considered in order to…”
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  4. 4

    Carbon nanostructures as an example of the self-organized criticality by Prikhod’ko, A. V., Kon’kov, O. I.

    Published in Physics of the solid state (01-03-2012)
    “…The mechanism of self-organized criticality in the region of the nano- and microsizes has been studied experimentally using carbon multiwalled nanotubes and…”
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  5. 5

    I-V characteristics of high-voltage 4H-SiC diodes with a 1.1-eV Schottky barrier by Ivanov, P. A., Grekhov, I. V., Kon’kov, O. I., Potapov, A. S., Samsonova, T. P., Semenov, T. V.

    Published in Semiconductors (Woodbury, N.Y.) (01-10-2011)
    “…The I - V characteristics of high-voltage 4 H -SiC diodes with a Schottky barrier ∼1.1 eV in height are measured and analyzed. The forward I - V…”
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  6. 6

    High-voltage (3.3 kV) 4H-SiC JBS diodes by Ivanov, P. A., Grekhov, I. V., Il’inskaya, N. D., Kon’kov, O. I., Potapov, A. S., Samsonova, T. P., Serebrennikova, O. U.

    Published in Semiconductors (Woodbury, N.Y.) (01-05-2011)
    “…High-voltage 4 H -SiC junction-barrier Schottky (JBS) diodes have been fabricated and studied. The working area of the diodes (anode contact area) is 1.44 mm 2…”
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  7. 7

    Microdetermination of titanium on the developed silicon surface using cells made of perfluorinated proton-conducting membranes by Nikitin, S. E., Terukov, E. I., Kon’kov, O. I., Bobyl’, A. V., Timofeev, S. V.

    Published in Technical physics (01-05-2013)
    “…A technique for microdetermination of titanium on the developed silicon surface is suggested. In this technique, thin titanium layers are dissolved in an…”
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  8. 8

    Leakage currents in 4H-SiC JBS diodes by Ivanov, P. A., Grekhov, I. V., Potapov, A. S., Kon’kov, O. I., Il’inskaya, N. D., Samsonova, T. P., Korol’kov, O., Sleptsuk, N.

    Published in Semiconductors (Woodbury, N.Y.) (01-03-2012)
    “…Leakage currents in high-voltage 4 H -SiC diodes, which have an integrated ( p - n ) Schottky structure (Junction Barrier Schottky, JBS), have been studied…”
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  9. 9

    Excess leakage currents in high-voltage 4H-SiC Schottky diodes by Ivanov, P. A., Grekhov, I. V., Potapov, A. S., Samsonova, T. P., Il’inskaya, N. D., Kon’kov, O. I., Serebrennikova, O. Yu

    Published in Semiconductors (Woodbury, N.Y.) (01-05-2010)
    “…The high-voltage 4 H -SiC Schottky diodes are fabricated with a nickel barrier and a guard system in the form of “floating” planar p-n junctions. The analysis…”
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  10. 10

    Specific features of amorphous silicon layers grown by plasma-enhanced chemical vapor deposition with tetrafluorosilane by Vainshtein, J. S., Kon’kov, O. I., Kukin, A. V., El’tsina, O. S., Belyakov, L. V., Terukov, E. I., Sreseli, O. M.

    Published in Semiconductors (Woodbury, N.Y.) (01-03-2011)
    “…Hydrogenated amorphous silicon layers with crystalline nanoparticles have been produced by plasma-enhanced chemical vapor deposition, with tetrafluorosilane…”
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  11. 11

    Lithium insertion into amorphous silicon thin-film electrodes by Kulova, T.L., Skundin, A.M., Pleskov, Yu.V., Terukov, E.I., Kon’kov, O.I.

    “…The electrochemical lithium insertion into a-Si:H thin-film electrodes, CVD-grown on stainless-steel substrates at 100 and 250 °C, is studied using…”
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  12. 12

    Dynamic characteristics of 4H-SiC drift step recovery diodes by Ivanov, P. A., Kon’kov, O. I., Samsonova, T. P., Potapov, A. S., Grekhov, I. V.

    Published in Semiconductors (Woodbury, N.Y.) (01-11-2015)
    “…The dynamic characteristics of 4 H -SiC p + – p – n 0 – n + diodes are experimentally studied in the pulsed modes characteristic of the operation of drift step…”
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  13. 13

    Effect of the femtosecond laser treatment of hydrogenated amorphous silicon films on their structural, optical, and photoelectric properties by Emelyanov, A. V., Kazanskii, A. G., Kashkarov, P. K., Konkov, O. I., Terukov, E. I., Forsh, P. A., Khenkin, M. V., Kukin, A. V., Beresna, M., Kazansky, P.

    Published in Semiconductors (Woodbury, N.Y.) (01-06-2012)
    “…The effect of the femtosecond laser treatment of hydrogenated amorphous silicon ( a -Si:H) films on their structural, optical, and photoelectric properties is…”
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  14. 14

    Resistance of 4H-SiC Schottky barriers at high forward-current densities by Ivanov, P. A., Samsonova, T. P., Il’inskaya, N. D., Serebrennikova, O. Yu, Kon’kov, O. I., Potapov, A. S.

    Published in Semiconductors (Woodbury, N.Y.) (01-07-2015)
    “…The resistance of Schottky barriers based on 4 H -SiC is experimentally determined at high forward-current densities. The measured resistance is found to be…”
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    Iron disilicide formed in a-Si〈Fe〉 thin films by magnetron co-sputtering by Kudoyarova, V.Kh, Terukov, E.I, Kon’kov, O.I, Gusev, O.B, Davydov, V.Yu, Mosina, G.N

    Published in Physica. B, Condensed matter (31-12-2003)
    “…The formation of β-FeSi2 precipitates was observed for the first time in microcrystalline Si films. The Fe-doped amorphous Si films (a-Si:Fe) were obtained…”
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  17. 17

    Erbium incorporation in plasma-deposited amorphous silicon by Terukov, E.I., Konkov, O.I., Kudoyarova, V.Kh, Koughia, K.V., Weiser, G., Kühne, H., Kleider, J.P., Longeaud, C., Brüggemann, R.

    Published in Journal of non-crystalline solids (01-05-2000)
    “…Erbium doped amorphous silicon has been prepared by the evaporation of Er containing metallo-organics inside the plasma of a plasma enhanced chemical vapor…”
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    Electronic properties of Erbium doped amorphous silicon by Kleider, J.P., Longeaud, C., Meaudre, R., Meaudre, M., Vignoli, S., Koughia, K.V., Terukov, E.I., Konkov, O.I.

    “…The electronic properties of Er doped PECVD a-Si:H films, produced by the evaporation of an Er containing metal-organic compound into the glow discharge have…”
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